Patents by Inventor Chin-Cheng Chiang

Chin-Cheng Chiang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240113199
    Abstract: A method of manufacturing a semiconductor device includes forming a gate electrode structure over a channel region, wherein the gate electrode structure includes a gate dielectric layer disposed over the first channel region, a gate electrode disposed over the gate dielectric layer, and insulating spacers disposed over opposing sidewalls of the gate electrode, wherein the gate dielectric layer is disposed over opposing sidewalls of the gate electrode. An interlayer dielectric layer is formed over opposing sidewalls of the insulating spacers. The insulating spacers are removed from an upper portion of the opposing sidewalls of the gate electrode to form trenches between the opposing sidewalls of the upper portion of the gate electrode and the interlayer dielectric layer, and the trenches are filled with an insulating material.
    Type: Application
    Filed: February 7, 2023
    Publication date: April 4, 2024
    Inventors: Jia-Chuan YOU, Chia-Hao Chang, Kuo-Cheng Chiang, Chin-Hao Wang
  • Patent number: 10312406
    Abstract: Provided is a method of forming gigantic quantum dots including following steps. A first precursor by mixing zinc acetate (Zn(ac)2), cadmium oxide (CdO), a surfactant, and a solvent together and then performing a first heat treatment is provided. The first precursor includes Zn-complex having the surfactant and Cd-complex having the surfactant. A second precursor containing elements S and Se and trioctylphosphine (TOP) is added into the first precursor to form a reaction mixture. A second heat treatment is performed on the reaction mixture and then cooling the reaction mixture to form the gigantic quantum dots in the reaction mixture.
    Type: Grant
    Filed: February 2, 2018
    Date of Patent: June 4, 2019
    Assignee: Unique Materials Co., Ltd.
    Inventors: Pi-Tai Chou, Shang-Wei Chou, Yu-Min Lin, Chin-Cheng Chiang, Chia-Chun Hsieh
  • Publication number: 20180342645
    Abstract: Provided is a method of forming gigantic quantum dots including following steps. A first precursor by mixing zinc acetate (Zn(ac)2), cadmium oxide (CdO), a surfactant, and a solvent together and then performing a first heat treatment is provided. The first precursor includes Zn-complex having the surfactant and Cd-complex having the surfactant. A second precursor containing elements S and Se and trioctylphosphine (TOP) is added into the first precursor to form a reaction mixture. A second heat treatment is performed on the reaction mixture and then cooling the reaction mixture to form the gigantic quantum dots in the reaction mixture.
    Type: Application
    Filed: February 2, 2018
    Publication date: November 29, 2018
    Applicant: Unique Materials Co., Ltd.
    Inventors: Pi-Tai Chou, Shang-Wei Chou, Yu-Min Lin, Chin-Cheng Chiang, Chia-Chun Hsieh
  • Patent number: 10096743
    Abstract: Provided are Gigantic quantum dots and a method of forming gigantic quantum dots. Each of the gigantic quantum dots includes a core constituted of CdSe, a shell constituted of ZnS, and an alloy configured between the core and the shell. The core is wrapped by the shell. The alloy constituted of Cd, Se, Zn and S, wherein a content of the Cd and Se gradually decreases from the core to the shell and a content of the Zn and S gradually increases from the core to the shell. A particle size of each of the gigantic quantum dots is equal to or more than 10 nm.
    Type: Grant
    Filed: May 26, 2017
    Date of Patent: October 9, 2018
    Assignee: Unique Materials Co., Ltd.
    Inventors: Pi-Tai Chou, Shang-Wei Chou, Yu-Min Lin, Chin-Cheng Chiang, Chia-Chun Hsieh
  • Patent number: 6313195
    Abstract: The present invention provides a naturally disintegratable cushion material and the process for making the material. The cushion material is non-toxic and environmental protective that it can be disintegrated naturally after being discarded. The cushion material is made from main material powder of grain shells, added with fillers (such as calcium carbonate), binders (such as polyvinyl alcohol) in suitable percentages, and further mixed with softeners (such as trimethylolpropane, polyethylene glycol or glycerine), water and other assistances (such as wax and boric acid) to form into a composite which includes moisture. Then the composite is heated and extruded by an extruder to vaporize the moisture in the composite and foamed. The foamed material is finally dried into cushion materials of desired shapes.
    Type: Grant
    Filed: June 15, 2000
    Date of Patent: November 6, 2001
    Assignee: Chun-Huei Chen
    Inventor: Chin-Cheng Chiang