Patents by Inventor Chin-Hsien Hung

Chin-Hsien Hung has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11996630
    Abstract: An antenna structure includes a ground element, a first radiation element, a second radiation element, a third radiation element, and a nonconductive support element. The first radiation element is coupled to a first grounding point on the ground element. The second radiation element has a feeding point. The second radiation element is adjacent to the first radiation element. The third radiation element is coupled to a second grounding point on the ground element. The third radiation element is adjacent to the second radiation element. The first radiation element, the second radiation element, and the third radiation element are disposed on the nonconductive support element. The second radiation element is at least partially surrounded by the first radiation element. The third radiation element is at least partially surrounded by the second radiation element.
    Type: Grant
    Filed: September 2, 2022
    Date of Patent: May 28, 2024
    Assignee: QUANTA COMPUTER INC.
    Inventors: Yu-Chen Zhao, Chung-Ting Hung, Chin-Lung Tsai, Ying-Cong Deng, Kuan-Hsien Lee, Yi-Chih Lo, Kai-Hsiang Chang, Chun-I Cheng, Yan-Cheng Huang
  • Patent number: 11996633
    Abstract: A wearable device includes a ground element, a first radiation element, a second radiation element, a third radiation element, a fourth radiation element, and a fifth radiation element. The first radiation element has a feeding point, and is coupled to a first grounding point on the ground element. A slot region is surrounded by the first radiation element and the ground element. The second radiation element is coupled to a second grounding point on the ground element. The third radiation element is coupled to the second grounding point. The third radiation element and the second radiation element substantially extend in opposite directions. The fourth radiation element and the fifth radiation element are disposed inside the slot region. An antenna structure is formed by the first radiation element, the second radiation element, the third radiation element, the fourth radiation element, and the fifth radiation element.
    Type: Grant
    Filed: September 6, 2022
    Date of Patent: May 28, 2024
    Assignee: QUANTA COMPUTER INC.
    Inventors: Chun-I Cheng, Chung-Ting Hung, Chin-Lung Tsai, Kuan-Hsien Lee, Yu-Chen Zhao, Kai-Hsiang Chang
  • Publication number: 20220288075
    Abstract: Provided are methods and compositions for prevention or treatment of pain, e.g., stress-related pain. Also provided is a method for producing a non-human animal model for pain, the non-human animal model produced therefrom, and a method of screening an agent pharmaceutically active in prevention or treatment of pain using such non-human animal model.
    Type: Application
    Filed: July 10, 2020
    Publication date: September 15, 2022
    Inventors: Chin-Cheng Chen, Chin-Hsien HUNG
  • Patent number: 11345813
    Abstract: A resin composition is provided.
    Type: Grant
    Filed: May 31, 2019
    Date of Patent: May 31, 2022
    Assignee: TAIWAN UNION TECHNOLOGY CORPORATION
    Inventors: Shur-Fen Liu, Chin-Hsien Hung
  • Patent number: 11312829
    Abstract: A prepreg is provided. The prepreg is prepared by impregnating a liquid crystal polymer non-woven fabric with a thermal-curable resin composition or by coating a thermal-curable resin composition onto a liquid crystal polymer non-woven fabric and drying the impregnated or coated liquid crystal polymer non-woven fabric, wherein the thermal-curable resin composition includes: (A) an unsaturated monomer; and (B) a cyclic olefin copolymer including the following repeating units: (B-1) a repeating unit of formula (I), (B-2) a repeating unit of formula (II), and (B-3) a repeating unit of formula (III), R1 to R22, m, n, o, and p in formulas (I) to (III) are as defined in the specification, wherein based on the total moles of the repeating units (B-1) to (B-3), the content of the repeating unit (B-2) is 19 mol % to 36 mol %, and wherein the weight ratio of the cyclic olefin copolymer (B) to the unsaturated monomer (A) is 0.5 to 7.
    Type: Grant
    Filed: April 10, 2019
    Date of Patent: April 26, 2022
    Assignee: TAIWAN UNION TECHNOLOGY CORPORATION
    Inventors: Shur-Fen Liu, Chin-Hsien Hung
  • Patent number: 11124614
    Abstract: A halogen-free low dielectric resin composition is provided.
    Type: Grant
    Filed: December 10, 2018
    Date of Patent: September 21, 2021
    Assignee: TAIWAN UNION TECHNOLOGY CORPORATION
    Inventors: Shur-Fen Liu, Chin-Hsien Hung, Meng-Huei Chen
  • Patent number: 11124613
    Abstract: A resin composition and uses of the same are provided. The resin composition includes the following components: (A) a cross-linking agent of the following formula (I): (B) a polyphenylene ether resin, wherein the terminal ends of the polyphenylene ether resin are independently modified by a substituent with a carbon-carbon double bond; and (C) a catalyst, wherein, R1 in formula (I) is a C6 to C16 alkyl or a C6 to C16 alkenyl, and the weight ratio of the polyphenylene ether resin (B) to the cross-linking agent (A) ranges from 0.5 to 5.
    Type: Grant
    Filed: September 19, 2019
    Date of Patent: September 21, 2021
    Assignee: TAIWAN UNION TECHNOLOGY CORPORATION
    Inventors: Shur-Fen Liu, Chin-Hsien Hung
  • Patent number: 11015052
    Abstract: A halogen-free low dielectric resin composition is provided. The halogen-free low dielectric resin composition comprises: (A) a resin system, which includes: (a1) a polyphenylene ether resin with unsaturated functional groups, and (a2) a polyfunctional vinyl aromatic copolymer; and (B) an allyl cyclophosphazene compound represented by the following formula (I): in formula (I), t is an integer ranging from 2 to 6, wherein, the polyfunctional vinyl aromatic copolymer (a2) is prepared by copolymerizing one or more divinyl aromatic compounds and one or more monovinyl aromatic compounds.
    Type: Grant
    Filed: February 15, 2019
    Date of Patent: May 25, 2021
    Assignee: TAIWAN UNION TECHNOLOGY CORPORATION
    Inventors: Shur-Fen Liu, Chin-Hsien Hung
  • Publication number: 20200377676
    Abstract: A resin composition and uses of the same are provided. The resin composition includes the following components: (A) a cross-linking agent of the following formula (I): (B) a polyphenylene ether resin, wherein the terminal ends of the polyphenylene ether resin are independently modified by a substituent with a carbon-carbon double bond; and (C) a catalyst, wherein, R1 in formula (I) is a C6 to C16 alkyl or a C6 to C16 alkenyl, and the weight ratio of the polyphenylene ether resin (B) to the cross-linking agent (A) ranges from 0.5 to 5.
    Type: Application
    Filed: September 19, 2019
    Publication date: December 3, 2020
    Inventors: Shur-Fen LIU, Chin-Hsien HUNG
  • Patent number: 10836919
    Abstract: A solvent-free resin composition is provided. The solvent-free resin composition includes: (A) an epoxy resin component, including at least two multi-functional epoxy resins, each of which has at least three epoxy groups in a molecule; (B) an epoxy resin hardener; and (C) inorganic fillers, including a hollow filler and a non-hollow spherical filler, wherein the weight ratio of the hollow filler to the non-hollow spherical filler is from 1:5 to 6:1.
    Type: Grant
    Filed: January 16, 2019
    Date of Patent: November 17, 2020
    Assignee: TAIWAN UNION TECHNOLOGY CORPORATION
    Inventors: Shur-Fen Liu, Chin-Hsien Hung
  • Publication number: 20200216626
    Abstract: A prepreg is provided. The prepreg is prepared by impregnating a liquid crystal polymer non-woven fabric with a thermal-curable resin composition or by coating a thermal-curable resin composition onto a liquid crystal polymer non-woven fabric and drying the impregnated or coated liquid crystal polymer non-woven fabric, wherein the thermal-curable resin composition includes: (A) an unsaturated monomer; and (B) a cyclic olefin copolymer including the following repeating units: (B-1) a repeating unit of formula (I), (B-2) a repeating unit of formula (II), and (B-3) a repeating unit of formula (III), R1 to R22, m, n, o, and p in formulas (I) to (III) are as defined in the specification, wherein based on the total moles of the repeating units (B-1) to (B-3), the content of the repeating unit (B-2) is 19 mol % to 36 mol %, and wherein the weight ratio of the cyclic olefin copolymer (B) to the unsaturated monomer (A) is 0.5 to 7.
    Type: Application
    Filed: April 10, 2019
    Publication date: July 9, 2020
    Inventors: Shur-Fen LIU, Chin-Hsien HUNG
  • Publication number: 20200181402
    Abstract: A halogen-free low dielectric resin composition is provided. The halogen-free low dielectric resin composition comprises: (A) a resin system, which includes: (a1) a polyphenylene ether resin with unsaturated functional groups, and (a2) a polyfunctional vinyl aromatic copolymer; and (B) an allyl cyclophosphazene compound represented by the following formula (I): in formula (I), t is an integer ranging from 1 to 6, wherein, the polyfunctional vinyl aromatic copolymer (a2) is prepared by copolymerizing one or more divinyl aromatic compounds and one or more monovinyl aromatic compounds.
    Type: Application
    Filed: February 15, 2019
    Publication date: June 11, 2020
    Inventors: SHUR-FEN LIU, CHIN-HSIEN HUNG
  • Patent number: 10662352
    Abstract: An adhesive composition is provided including the following components: (A) an unsaturated monomer; and (B) an olefin copolymer comprising the following repeating units: (B-1) a repeating unit of formula (I), (B-2) a repeating unit of formula (II), and (B-3) a repeating unit of formula (III), R1 to R21, m, n, o, and p in formulas (I) to (III) are as defined in the specification, wherein based on the total moles of the repeating units (B-1), (B-2) and (B-3), the amount of the repeating unit (B-2) ranges from 19 mol % to 36 mol %; and wherein the weight ratio of the olefin copolymer (B) to the unsaturated monomer (A) ranges from 2 to 20.
    Type: Grant
    Filed: April 19, 2018
    Date of Patent: May 26, 2020
    Assignee: TAIWAN UNION TECHNOLOGY CORPORATION
    Inventors: Shur-fen Liu, Chin-Hsien Hung
  • Publication number: 20200115572
    Abstract: A solvent-free resin composition is provided. The solvent-free resin composition includes: (A) an epoxy resin component, including at least two multi-functional epoxy resins, each of which has at least three epoxy groups in a molecule; (B) an epoxy resin hardener; and (C) inorganic fillers, including a hollow filler and a non-hollow spherical filler, wherein the weight ratio of the hollow filler to the non-hollow spherical filler is from 1:5 to 6:1.
    Type: Application
    Filed: January 16, 2019
    Publication date: April 16, 2020
    Inventors: Shur-Fen LIU, Chin-Hsien HUNG
  • Publication number: 20200071477
    Abstract: A halogen-free low dielectric resin composition is provided.
    Type: Application
    Filed: December 10, 2018
    Publication date: March 5, 2020
    Inventors: Shur-Fen LIU, Chin-Hsien HUNG, Meng-Huei CHEN
  • Patent number: 10575401
    Abstract: A dielectric composite is provided. The dielectric composite includes: at least one first dielectric layer; and at least one second dielectric layer, wherein the first dielectric layer has a thermal coefficient of dielectric constant (TCDk) not higher than ?150 ppm/° C., and the second dielectric layer has a TCDK not lower than 50 ppm/° C.; and the dielectric composite has a dielectric constant (Dk) not lower than 4, and a TCDk ranging from 0 to ?150 ppm/° C.
    Type: Grant
    Filed: September 28, 2018
    Date of Patent: February 25, 2020
    Assignee: TAIWAN UNION TECHNOLOGY CORPORATION
    Inventors: Shur-Fen Liu, Chin-Hsien Hung, Wei-Jung Yang, Chang-Chih Liu
  • Publication number: 20200053877
    Abstract: A dielectric composite is provided. The dielectric composite includes: at least one first dielectric layer; and at least one second dielectric layer, wherein the first dielectric layer has a thermal coefficient of dielectric constant (TCDk) not higher than ?150 ppm/° C., and the second dielectric layer has a TCDK not lower than 50 ppm/° C.; and the dielectric composite has a dielectric constant (Dk) not lower than 4, and a TCDk ranging from 0 to ?150 ppm/° C.
    Type: Application
    Filed: September 28, 2018
    Publication date: February 13, 2020
    Inventors: Shur-Fen LIU, Chin-Hsien HUNG, Wei-Jung YANG, Chang-Chih LIU
  • Publication number: 20190367727
    Abstract: A resin composition is provided.
    Type: Application
    Filed: May 31, 2019
    Publication date: December 5, 2019
    Inventors: Shur-Fen LIU, Chin-Hsien HUNG
  • Publication number: 20190194505
    Abstract: An adhesive composition is provided including the following components: (A) an unsaturated monomer; and (B) an olefin copolymer comprising the following repeating units: (B-1) a repeating unit of formula (I), (B-2) a repeating unit of formula (II), and (B-3) a repeating unit of formula (III), R1 to R21, m, n, o, and p in formulas (I) to (III) are as defined in the specification, wherein based on the total moles of the repeating units (B-1), (B-2) and (B-3), the amount of the repeating unit (B-2) ranges from 19 mol % to 36 mol %; and wherein the weight ratio of the olefin copolymer (B) to the unsaturated monomer (A) ranges from 2 to 20.
    Type: Application
    Filed: April 19, 2018
    Publication date: June 27, 2019
    Inventors: Shur-fen LIU, Chin-Hsien HUNG
  • Patent number: 10246588
    Abstract: A solvent-free thermosetting filling resin composition is provided. The resin composition comprises the following components: (A) a benzoxazine resin of formula (I), (B) an epoxy resin with an alicyclic skeleton; (C) an epoxy resin hardener; (D) a benzoxazine resin hardener; and (E) a modified filler, wherein, A, B, R, and n in formula (I) are as defined in the specification.
    Type: Grant
    Filed: November 21, 2017
    Date of Patent: April 2, 2019
    Assignee: TAIWAN UNION TECHNOLOGY CORPORATION
    Inventors: Shur-Fen Liu, Chin-Hsien Hung