Patents by Inventor Chin Moo Cho

Chin Moo Cho has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9923047
    Abstract: The inventive concepts provide semiconductor devices and methods for manufacturing the same in which the method includes forming a capacitor including a bottom electrode, a dielectric layer and a top electrode sequentially stacked on a substrate, and also where formation of the top electrode includes forming a first metal nitride layer on the dielectric layer, and forming a second metal nitride layer on the first metal nitride layer, in which the first metal nitride layer is disposed between the dielectric layer and the second metal nitride layer, and the first metal nitride layer is formed at a temperature lower than a temperature at which the second metal nitride layer is formed.
    Type: Grant
    Filed: December 14, 2015
    Date of Patent: March 20, 2018
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Se Hoon Oh, Seongyul Park, Chin Moo Cho, Yunjung Choi, Gyu-Hee Park, Youn-Joung Cho, Younsoo Kim, Jae Hyoung Choi
  • Patent number: 9455259
    Abstract: A semiconductor device includes a capacitor with reduced oxygen defects at an interface between a dielectric layer and an electrode of the capacitor. The semiconductor device includes a lower metal layer; a dielectric layer on the lower metal layer and containing a first metal; a sacrificial layer on the dielectric layer and containing a second metal; and an upper metal layer on the sacrificial layer. An electronegativity of the second metal in the sacrificial layer is greater than an electronegativity of the first metal in the dielectric layer.
    Type: Grant
    Filed: May 19, 2015
    Date of Patent: September 27, 2016
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Han-Jin Lim, Youn-Soo Kim, Hyun Park, Soon-Gun Lee, Eun-Ae Cho, Chin-Moo Cho, Sung-Jin Kim, Seok-Woo Nam
  • Patent number: 9437419
    Abstract: A trialkylsilane-based silicon precursor compound may be expressed by Si(Ri)X, i=1-3, where each of “R1”, “R2”, and “R3” is a hydrogen or an alkyl having 1-5 carbon(s), all of “R1”, “R2”, and “R3” are not hydrogen, “X” is one of hydrogen, a hydroxyl group, an amide group, an alkoxide group, a halide group, or Si(R*)3, and “R*” is a hydrogen or an alkyl group having 1˜5 carbon(s).
    Type: Grant
    Filed: February 5, 2014
    Date of Patent: September 6, 2016
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Younsoo Kim, Sangyeol Kang, Hiroki Sato, Tsubasa Shiratori, Naoki Yamada, Chayoung Yoo, Younjoung Cho, Chin Moo Cho, Jaehyoung Choi
  • Publication number: 20160197136
    Abstract: The inventive concepts provide semiconductor devices and methods for manufacturing the same in which the method includes forming a capacitor including a bottom electrode, a dielectric layer and a top electrode sequentially stacked on a substrate, and also where formation of the top electrode includes forming a first metal nitride layer on the dielectric layer, and forming a second metal nitride layer on the first metal nitride layer, in which the first metal nitride layer is disposed between the dielectric layer and the second metal nitride layer, and the first metal nitride layer is formed at a temperature lower than a temperature at which the second metal nitride layer is formed.
    Type: Application
    Filed: December 14, 2015
    Publication date: July 7, 2016
    Inventors: Se Hoon Oh, Seongyul Park, Chin Moo Cho, Yunjung Choi, Gyu-Hee Park, Youn-Joung Cho, Younsoo Kim, Jae Hyoung Choi
  • Publication number: 20160079247
    Abstract: A semiconductor device includes a capacitor with reduced oxygen defects at an interface between a dielectric layer and an electrode of the capacitor. The semiconductor device includes a lower metal layer; a dielectric layer on the lower metal layer and containing a first metal; a sacrificial layer on the dielectric layer and containing a second metal; and an upper metal layer on the sacrificial layer. An electronegativity of the second metal in the sacrificial layer is greater than an electronegativity of the first metal in the dielectric layer.
    Type: Application
    Filed: May 19, 2015
    Publication date: March 17, 2016
    Inventors: Han-Jin Lim, Youn-Soo Kim, Hyun Park, Soon-Gun Lee, Eun-Ae Cho, Chin-Moo Cho, Sung-Jin Kim, Seok-Woo Nam
  • Publication number: 20140273512
    Abstract: A trialkylsilane-based silicon precursor compound may be expressed by the following chemical formula 1. In the chemical formula 1, each of “R1”, “R2”, and “R3” is a hydrogen or an alkyl having 1˜5 carbon(s), all of “R1”, “R2”, and “R3” are not hydrogen, “X” is one of hydrogen, a hydroxyl group, an amide group, an alkoxide group, a halide group, or Si(R*)3, and “R*” is a hydrogen or an alkyl group having 1˜5 carbon(s).
    Type: Application
    Filed: February 5, 2014
    Publication date: September 18, 2014
    Inventors: Younsoo KIM, Sangyeol KANG, Hiroki SATO, Tsubasa SHIRATORI, Naoki YAMADA, Chayoung YOO, Younjoung CHO, Chin Moo CHO, Jaehyoung CHOI
  • Patent number: 8603936
    Abstract: Disclosed herein is a light-responsive photocatalyst composition, which is a composite oxide semiconductor containing tungsten, and which can efficiently absorb visible light emitted from the sun and light emitted from interior lamps, such as fluorescent lamps, etc., and a method of preparing the light-responsive photocatalyst composition. The visible light-responsive photocatalyst composition can decompose volatile organic compounds or harmful organic matter causing sick house syndrome, even indoors, because it can be activated by visible light outdoors and can respond to light emitted from interior lamps, such as fluorescent lamps, etc.
    Type: Grant
    Filed: March 26, 2008
    Date of Patent: December 10, 2013
    Assignee: Seoul National University R&DB Foundation
    Inventors: In Sun Cho, Sang Wook Lee, Jun Hong Noh, Shin Tae Bae, Dong Wook Kim, Chin Moo Cho, Chae Hyun Kwak, Tae Hoon Noh, Duk Kyu Lee, Kug Sun Hong
  • Publication number: 20090192032
    Abstract: Disclosed herein is a light-responsive photocatalyst composition, which is a composite oxide semiconductor containing tungsten, and which can efficiently absorb visible light emitted from the sun and light emitted from interior lamps, such as fluorescent lamps, etc., and a method of preparing the light-responsive photocatalyst composition. The visible light-responsive photocatalyst composition can decompose volatile organic compounds or harmful organic matter causing sick house syndrome, even indoors, because it can be activated by visible light outdoors and can respond to light emitted from interior lamps, such as fluorescent lamps, etc.
    Type: Application
    Filed: March 26, 2008
    Publication date: July 30, 2009
    Applicant: Seoul National University Industry Foundation
    Inventors: In Sun Cho, Sang Wook Lee, Jun Hong Noh, Shin Tae Bae, Dong Wook Kim, Chin Moo Cho, Chae Hyun Kwak, Tae Hoon Noh, Duk Kyu Lee, Kug Sun Hong
  • Publication number: 20090114604
    Abstract: The present invention relates to a method and system for photocatalytically decomposing organic pollutants using the electromotive force of a solar cell. The present invention provides a method and system for decomposing organic pollutants, which can greatly increase the rate of decomposition of organic pollutants at low cost by combining a photocatalytic organic pollutant decomposition device, capable of decomposing organic pollutants using light energy, with a solar cell, capable of applying an external voltage to the photocatalytic organic pollutant decomposition device using light energy.
    Type: Application
    Filed: January 7, 2008
    Publication date: May 7, 2009
    Applicant: SEOUL NATIONAL UNIVERSITY INDUSTRY FOUNDATION
    Inventors: Shin Tae Bae, Kug Sun Hong, Sang Wook Lee, In Sun Cho, Jun Hong Noh, Chin Moo Cho, Dong Wook Kim, Tae Hoon Noh, Chae Hyun Kwak