Abstract: A colored device casing includes a base, a color layer and a bonding layer. The base has at least one smooth region, and the color layer is located over the smooth region of the base. The color layer includes titanium, and has a value for L* in the range from 51.55 to 52.55, a value for a* in the range from 13.12 to 14.12 and a value for b* in the range from 6.27 to 7.27 according to the Commission Internationale del'Eclairage, (CIE, International Commission on Illumination) LAB system. The bonding layer is located between the substrate and the color layer, providing adhesion therebetween. A surface-treating method for fabricating the colored casing is also provided.

Abstract: A colored device casing includes a base, a color layer and a bonding layer. The base has at least one smooth region. The bonding layer is positioned between the base and the color layer and bonds the base and color layer together. The color layer includes at least one metal layer. A portion of the color layer corresponding to and located over the smooth region has a value of L* in a range from about 32.51 to about 34.51, a value of a* in a range from about ?8.74 to about ?7.74 and a value of b* in a range from about ?12.39 to about ?11.39 according to the Commission Internationale del'Eclairage LAB system. A surface-treating method for fabricating the colored casing is also provided.

Abstract: An exemplary magnetron sputtering device includes a target, a magnet arrangement, and a driving system. The target defines a magnet-receiving space therein. The magnet arrangement is received within the magnet-receiving space. The driving system is configured for driving the magnet arrangement to spin and move back and forth.

Abstract: A sputtering deposition method is utilized by a sputtering deposition apparatus including a first chamber, a second chamber, a first carrier, and a second carrier. Some first substrates are positioned in the first carriers in the first chamber for heating. The first carriers in the first chamber and the second carriers in the second chamber are exchanged. The first substrates in the second chamber are sputtered. The second carriers in the first chamber and the first carriers in the second chamber are exchanged. The first substrates in the first chamber are taken out.

Abstract: An apparatus for manufacturing carbon nanotubes includes: a reaction chamber having an inlet at a bottom and an opposite outlet at a top thereof, and a substrate region configured for accommodating a substrate for growing carbon nanotubes thereon; an electric field generating device configured for generating an electric field around the substrate region, the electric field being substantially perpendicular to the substrate; and a magnetic field generating device configured for generating a magnetic field around the substrate region, the magnetic field being substantially perpendicular to the substrate.

Abstract: A method for removing a protective film from a surface of an article is provided. The protective film includes a primary protective layer (e.g., a diamond-like carbon layer) and a transition layer, the transition layer being formed directly upon the surface of the article and thereby facilitating an attachment/bond of the protective film to the article. The method includes the step of: disposing/placing the article having the protective film in a reaction chamber; bombarding the protective film (especially, the primary protective layer) with oxidative plasma beams along an edge portion of the protective film, the bombarding occurring until the transition layer in particular is exposed; and bombarding the transition layer with oxidative plasma beams to damage a configuration of the transition layer, thereby making it possible to remove the protective film.

Abstract: A rolling machine includes a first clipping component, a second clipping component, a lifting component, and a holding assembly. The first clipping component has a first surface and a second surface opposite to the first surface. The second clipping component has a third surface configured to contact the first surface and a fourth surface opposite to the third surface. The lifting component is connected to the first clipping component and configured to drive the first clipping component to move back and forth. The holding assembly has a first and second holders configured to be symmetrically positioned on both sides of the first clipping component.

Abstract: An exemplary film coating device includes a film coating holder and a film coating cover. The film coating holder includes a plurality of through holes defined therein for receiving workpieces to be coated. The film coating cover includes a first cover body and a second cover body. The first cover body includes a frame and a plurality of arms. A plurality of shelter pieces is set on the inner side of each arm. Each shelter piece is spatially arranged corresponding to one of the plurality of through holes. The second cover body is configured for covering the first cover body. The height of the second cover body is no less than that of the first cover body.

Abstract: A method for manufacturing carbon nanotubes with a desired length includes the steps of: providing an array of carbon nanotubes; placing a mask having at least an opening defined therein on the array of carbon nanotubes, with at least one portion of the array of carbon nanotubes being at least partially exposed through a corresponding opening of the mask; forming a protective film on at least one exposed portion of the array of carbon nanotubes; removing the mask from the array of the carbon nanotubes, with the carbon nanotubes being compartmentalized into at least a first portion covered by the protective film and at least one uncovered second portion; breaking/separating the first portion from the second portion of the array of the carbon nanotubes using a chemical method, thereby obtaining at least a carbon nanotube segment with a protective film covered thereon; and removing the protective film from the carbon nanotube segment.

Abstract: An apparatus for manufacturing carbon nanotubes is provided. The apparatus includes: a reaction chamber having an inlet and a outlet; a heater for elevating an interior temperature of the reaction chamber; and a gas guiding member coupled to the inlet and configured for introducing a carbon-containing gas into the reaction chamber, the gas guiding member including a gas-exiting portion arranged in the reaction chamber, the gas-exiting portion having a cavity defined therein and a flat perforated top wall, the perforated top wall being configured for supporting a substrate thereon and defining a route allowing the introduced carbon-containing gas to flow in a direction substantially perpendicular to a main plane of the substrate.

Abstract: A method for manufacturing carbon nanotubes with a desired length includes the steps of: providing an array of carbon nanotubes; placing a mask having at least an opening defined therein on the array of carbon nanotubes, with at least one portion of the array of carbon nanotubes being at least partially exposed through a corresponding opening of the mask; forming a protective film on at least one exposed portion of the array of carbon nanotubes; removing the mask from the array of the carbon nanotubes, with the carbon nanotubes being compartmentalized into at least a first portion covered by the protective film and at least one uncovered second portion; breaking/separating the first portion from the second portion of the array of the carbon nanotubes using a chemical method, thereby obtaining at least a carbon nanotube segment with a protective film covered thereon; and removing the protective film from the carbon nanotube segment.

Abstract: An apparatus for manufacturing carbon nanotubes is provided. The apparatus includes: a reaction chamber having an inlet and a outlet; a heater for elevating an interior temperature of the reaction chamber; and a gas guiding member coupled to the inlet and configured for introducing a carbon-containing gas into the reaction chamber, the gas guiding member including a gas-exiting portion arranged in the reaction chamber, the gas-exiting portion having a cavity defined therein and a flat perforated top wall, the perforated top wall being configured for supporting a substrate thereon and defining a route allowing the introduced carbon-containing gas to flow in a direction substantially perpendicular to a main plane of the substrate.

Abstract: An exemplary apparatus for washing one or more optical elements includes an upper portion (10) and a lower portion (20). The upper portion includes a plurality of upper washing holes (14) defined therein. The lower portion cooperates with the upper portion to form a washing chamber (30). The lower portion includes a plurality of lower washing holes (24) defined therein. The washing chamber is configured for holding the optical elements.

Abstract: An apparatus for manufacturing carbon nanotubes includes: a reaction chamber having an inlet at a bottom and an opposite outlet at a top thereof, and a substrate region configured for accommodating a substrate for growing carbon nanotubes thereon; an electric field generating device configured for generating an electric field around the substrate region, the electric field being substantially perpendicular to the substrate; and a magnetic field generating device configured for generating a magnetic field around the substrate region, the magnetic field being substantially perpendicular to the substrate.

Abstract: A method for removing a protective film from a surface of an article is provided. The protective film includes a primary protective layer (e.g., a diamond-like carbon layer) and a transition layer, the transition layer being formed directly upon the surface of the article and thereby facilitating an attachment/bond of the protective film to the article. The method includes the step of: disposing/placing the article having the protective film in a reaction chamber; bombarding the protective film (especially, the primary protective layer) with oxidative plasma beams along an edge portion of the protective film, the bombarding occurring until the transition layer in particular is exposed; and bombarding the transition layer with oxidative plasma beams to damage a configuration of the transition layer, thereby making it possible to remove the protective film.

Abstract: An exemplary portable communication device (100) includes a main body (10), an electrically conductive layer (20), and an electrochromic layer (30). The main body has an outer surface. The electrically conductive layer is coated onto the outer surface of the main body. The electrochromic layer contains an electrochromic material. The electrochromic layer is coated onto the electrically conductive layer, and is electrically connected with the main body across the electrically conductive layer.

Abstract: An optical filter for screening out infrared and ultraviolet light includes a transparent substrate and a film stack formed on the substrate. The film stack includes a number of high refractive index layers and a number of low refractive index layers alternately stacked one on another. The film stack is represented as follows: (3.5H3.5L)7(2.5H2.5L)7(HL)6(0.76H0.76L)6, wherein, H represents a high refractive index layer having a base optical thickness equal to one fourth of a reference wavelength associated with the optical filter, L represents a low refractive index layer having a base optical thickness equal to one fourth of a reference wavelength associated with the optical filter, expressions enclosed in each parenthesis represent filter cavities, and superscripts represents the number of repetitions of the expression enclosed in that parenthesis.

Abstract: An optical filter includes a transparent substrate, a first film stack and a second film stack. The first and second film stacks each includes a number of high refractive index layers and a number of low refractive index layers alternately stacked one on another. The first film stack is defined as (HL)7(0.76H0.76L)6, and the second film stack is defined as 0.5(HL)(1.3H1.3L)9(HL)8, wherein, H represents a high refractive index layer having a base optical thickness equal to one fourth of a first reference wavelength associated with the optical filter, L represents a low refractive index layer having a base optical thickness equal to one fourth of a first reference wavelength associated with the optical filter, the expression enclosed in each parenthesis represents a filter cavity, and the superscript represents the number of repetition of the expression enclosed in that parenthesis.

Abstract: An exemplary apparatus facilitating the synthesis of chiral carbon nanotubes includes a reaction chamber, and a first electrode and a second electrode disposed in the reaction chamber. The first electrode and the second electrode are spaced apart from each other and define a space therebetween. The space is configured for receiving a catalyst therein. The first electrode is rotatable around an axis to thereby generate an electric field between the first electrode and the second electrode with a periodic variation in direction when a voltage is applied between the first electrode and the second electrode. The axis is substantially perpendicular to a surface of the second electrode facing toward the first electrode. Methods facilitating the synthesis of chiral carbon nanotubes are also provided.

Abstract: An apparatus for synthesizing nanotubes is provided. The apparatus includes a reactor, a first electrode and a second electrode, and an actuator. The reactor is configured for receiving a catalyst used for growing nanotubes. The first electrode and the second electrode are disposed in the reactor and configured for generating an electric field therebetween. The second electrode is spaced apart from the first electrode and movable relative to the first electrode along a direction perpendicular to another direction oriented from the first electrode to the second electrode. The actuator is configured for adjusting a direction of the electric field generated by the first electrode and the second electrode.