Patents by Inventor Ching-Feng Huang

Ching-Feng Huang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12002710
    Abstract: A semiconductor structure and method of forming the same are provided. The method includes: forming a plurality of mandrel patterns over a dielectric layer; forming a first spacer and a second spacer on sidewalls of the plurality of mandrel patterns, wherein a first width of the first spacer is larger than a second width of the second spacer; removing the plurality of mandrel patterns; patterning the dielectric layer using the first spacer and the second spacer as a patterning mask; and forming conductive lines laterally aside the dielectric layer.
    Type: Grant
    Filed: July 9, 2020
    Date of Patent: June 4, 2024
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Yu-Hsin Chan, Jiing-Feng Yang, Kuan-Wei Huang, Meng-Shu Lin, Yu-Yu Chen, Chia-Wei Wu, Chang-Wen Chen, Wei-Hao Lin, Ching-Yu Chang
  • Patent number: 11996323
    Abstract: A semiconductor device includes a plurality of gate electrodes over a substrate, and a source/drain epitaxial layer. The source/drain epitaxial layer is disposed in the substrate and between two adjacent gate electrodes, wherein a bottom surface of the source/drain epitaxial layer is buried in the substrate to a depth less than or equal to two-thirds of a spacing between the two adjacent gate electrodes.
    Type: Grant
    Filed: July 27, 2022
    Date of Patent: May 28, 2024
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Chia-Chung Chen, Chi-Feng Huang, Victor Chiang Liang, Chung-Hao Chu, Ching-Yu Yang
  • Publication number: 20240145597
    Abstract: A method of forming a semiconductor device includes: forming a gate structure over a fin that protrudes above a substrate; forming source/drain regions over the fin on opposing sides of the gate structure; forming a first dielectric layer and a second dielectric layer successively over the source/drain regions; performing a first etching process to form an opening in the first dielectric layer and in the second dielectric layer, where the opening exposes an underlying electrically conductive feature; after performing the first etching process, performing a second etching process to enlarge a lower portion of the opening proximate to the substrate; and forming a contact plug in the opening after the second etching process.
    Type: Application
    Filed: January 2, 2024
    Publication date: May 2, 2024
    Inventors: Yu-Lien Huang, Guan-Ren Wang, Ching-Feng Fu, Yun-Min Chang
  • Publication number: 20240110976
    Abstract: An electronic device and a method for performing clock gating in the electronic device are provided. The electronic device includes at least one function circuit, a device under test (DUT) circuit and at least one gating circuit. The function circuit is configured to operate according to at least one primary clock, and the DUT circuit is configured to operate according to at least one secondary clock. In addition, the clock gating circuit is configured to control whether to enable the primary clock according to at least one primary enable signal, and control whether to enable the secondary clock according to the primary enable signal and a secondary enable signal.
    Type: Application
    Filed: October 3, 2023
    Publication date: April 4, 2024
    Applicant: Realtek Semiconductor Corp.
    Inventors: Ching-Feng Huang, Yu-Cheng Lo
  • Patent number: 11944412
    Abstract: A blood pressure detection device manufactured by a semiconductor process includes a substrate, a microelectromechanical element, a gas-pressure-sensing element, a driving-chip element, an encapsulation layer and a valve layer. The substrate includes inlet apertures. The microelectromechanical element and the gas-pressure-sensing element are stacked and integrally formed on the substrate. The encapsulation layer is encapsulated and positioned on the substrate. A flowing-channel space is formed above the microelectromechanical element and the gas-pressure-sensing element. The encapsulation layer includes an outlet aperture in communication with an airbag. The driving-chip element controls the microelectromechanical element, the gas-pressure-sensing element and valve units to transport gas.
    Type: Grant
    Filed: June 2, 2021
    Date of Patent: April 2, 2024
    Assignee: MICROJET TECHNOLOGY CO., LTD.
    Inventors: Hao-Jan Mou, Ying-Lun Chang, Ching-Sung Lin, Chi-Feng Huang, Yung-Lung Han, Chang-Yen Tsai, Wei-Ming Lee, Chun-Yi Kuo, Tsung-I Lin
  • Patent number: 11935920
    Abstract: In an embodiment, a device includes: a first source/drain region; a second source/drain region; an inter-layer dielectric (ILD) layer over the first source/drain region and the second source/drain region; a first source/drain contact extending through the ILD layer, the first source/drain contact connected to the first source/drain region; a second source/drain contact extending through the ILD layer, the second source/drain contact connected to the second source/drain region; and an isolation feature between the first source/drain contact and the second source/drain contact, the isolation feature including a dielectric liner and a void, the dielectric liner surrounding the void.
    Type: Grant
    Filed: July 27, 2022
    Date of Patent: March 19, 2024
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Yu-Lien Huang, Guan-Ren Wang, Ching-Feng Fu
  • Publication number: 20240087960
    Abstract: A method may include forming a mask layer on top of a first dielectric layer formed on a first source/drain and a second source/drain, and creating an opening in the mask layer and the first dielectric layer that exposes portions of the first source/drain and the second source/drain. The method may include filling the opening with a metal layer that covers the exposed portions of the first source/drain and the second source/drain, and forming a gap in the metal layer to create a first metal contact and a second metal contact. The first metal contact may electrically couple to the first source/drain and the second metal contact may electrically couple to the second source/drain. The gap may separate the first metal contact from the second metal contact by less than nineteen nanometers.
    Type: Application
    Filed: November 13, 2023
    Publication date: March 14, 2024
    Inventors: Yu-Lien HUANG, Ching-Feng FU, Huan-Just LIN, Fu-Sheng LI, Tsai-Jung HO, Bor Chiuan HSIEH, Guan-Xuan CHEN, Guan-Ren WANG
  • Publication number: 20240080984
    Abstract: A package structure, including a circuit board, multiple circuit structure layers, at least one bridge structure, and at least one supporting structure, is provided. The circuit structure layer is disposed on the circuit board. The bridge structure is connected between the two adjacent circuit structure layers. The supporting structure is located between the two adjacent circuit structure layers, and the supporting structure has a first end and a second end opposite to each other and respectively connecting the bridge structure and the circuit board.
    Type: Application
    Filed: January 3, 2023
    Publication date: March 7, 2024
    Applicant: Industrial Technology Research Institute
    Inventors: Yu-Wei Huang, Ching-Feng Yu, Chih-Cheng Hsiao
  • Patent number: 11916147
    Abstract: A method of forming a semiconductor device includes: forming a gate structure over a fin that protrudes above a substrate; forming source/drain regions over the fin on opposing sides of the gate structure; forming a first dielectric layer and a second dielectric layer successively over the source/drain regions; performing a first etching process to form an opening in the first dielectric layer and in the second dielectric layer, where the opening exposes an underlying electrically conductive feature; after performing the first etching process, performing a second etching process to enlarge a lower portion of the opening proximate to the substrate; and forming a contact plug in the opening after the second etching process.
    Type: Grant
    Filed: June 29, 2022
    Date of Patent: February 27, 2024
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD
    Inventors: Yu-Lien Huang, Guan-Ren Wang, Ching-Feng Fu, Yun-Min Chang
  • Publication number: 20230376394
    Abstract: The present disclosure discloses a multi-core processing circuit having power-stabilizing test mechanism that includes a plurality of core-processing circuits arranged in an order and a self-test scheduling circuit. Each of the core-processing circuits includes a memory built-in self-test circuit. The self-test scheduling circuit receives a main activation signal to activate the memory built-in self-test circuit of one of the core-processing circuits every delay time in the order based on signal handshake to perform self-test, wherein one of the activated core-processing circuits has a largest average power draining amount in a predetermined range within the delay time.
    Type: Application
    Filed: May 12, 2023
    Publication date: November 23, 2023
    Inventors: CHING-FENG HUANG, YU-CHENG LO
  • Publication number: 20230296112
    Abstract: A motor module and a water-cooling pump having motor module are provided. The motor module has a combined first shell and second shell, a driving shaft mounted on the first shell and second shell, the stator assembly is mounted in the first shell, and the rotor assembly is mounted on the driving shaft. An opening of the first shell forms a first mounting portion, which can be mounted on or detached from a second mounting portion of the second shell via easy means. The modularized motor module can be mounted into a water machine via an opening of a shell and then a motor cover is mounted on the opening of the shell, and a drawing mechanism and pressured housing can be mounted at another end, so the assembling process is easy.
    Type: Application
    Filed: September 15, 2022
    Publication date: September 21, 2023
    Applicant: WALRUS PUMP CO., LTD.
    Inventor: Ching Feng HUANG
  • Publication number: 20190334597
    Abstract: An antenna switching system is provided. The system includes a radio frequency (RF) circuit for transmitting and receiving signals, a first antenna, a second antenna, a first switch, a first switch assembly, a second switch assembly, and a power divider. The first switch electrically connected to the RF circuit. The first switch assembly electrically connected between the first switch and the first antenna. The second switch assembly electrically connected between the first switch and the second antenna. The power divider electrically connected between the first switch and the first switch assembly and between the first switch and the second switch assembly. When the first switch is switched to the power divider, the signals are transmitted by the first antenna and the second antenna.
    Type: Application
    Filed: April 26, 2018
    Publication date: October 31, 2019
    Inventors: YUNG-JINN CHEN, CHING-FENG HUANG, TSUNG-TSUNG HUANG, YU-MENG YEN
  • Patent number: 10454549
    Abstract: An antenna switching system is provided. The system includes a radio frequency (RF) circuit for transmitting and receiving signals, a first antenna, a second antenna, a first switch, a first switch assembly, a second switch assembly, and a power divider. The first switch electrically connected to the RF circuit. The first switch assembly electrically connected between the first switch and the first antenna. The second switch assembly electrically connected between the first switch and the second antenna. The power divider electrically connected between the first switch and the first switch assembly and between the first switch and the second switch assembly. When the first switch is switched to the power divider, the signals are transmitted by the first antenna and the second antenna.
    Type: Grant
    Filed: April 26, 2018
    Date of Patent: October 22, 2019
    Assignee: WISTRON NEWEB CORPORATION
    Inventors: Yung-Jinn Chen, Ching-Feng Huang, Tsung-Tsung Huang, Yu-Meng Yen
  • Patent number: 10389420
    Abstract: An antenna switching system is provided. The system includes a radio frequency (RF) circuit for transceiving signals, N antennas, a master switch, N switches, and N power dividers. The signals may be transmitted by one of the N antennas, or the signals are transmitted by the antennas of the N antennas.
    Type: Grant
    Filed: April 26, 2018
    Date of Patent: August 20, 2019
    Assignee: WISTRON NEWEB CORPORATION
    Inventors: Ching-Feng Huang, Yung-Jinn Chen, Tsung-Tsung Huang, Yu-Meng Yen
  • Patent number: 9825606
    Abstract: A wireless communication device and a filter are provided. The filter has an input end and an output end and includes a first energy storage element, a first series resonant circuit, a second series resonant circuit, a first parallel resonant circuit and a second parallel resonant circuit. The first and the second series resonant circuits respectively have a first capacitor and a first inductor connected in series. The first and the second parallel resonant circuits respectively have a second capacitor and a second inductor connected in parallel. The first series resonant circuit and the first parallel resonant circuit are electrically connected in cascade between a first end of the first energy storage element and a ground, and the second series resonant circuit and the second parallel resonant circuit are electrically connected in cascade between a second end of the first energy storage element and the ground.
    Type: Grant
    Filed: February 1, 2016
    Date of Patent: November 21, 2017
    Assignee: Wistron NeWeb Corp.
    Inventors: Ching-Feng Huang, Meng-Luen Lee
  • Publication number: 20080192907
    Abstract: A dual-mode telecommunication device and its driving method are disclosed. The dual-mode telecommunication device electrically connects with a voice input/output communication unit for transmitting/receiving an analog voice signal. In addition, the dual-mode telecommunication device comprises a processor and a switch, wherein the processor is used for detecting/transforming the signal type and generating a control signal based on a detection result. The switch is used for assisting the voice input/output communication unit performing an Internet telecommunication mode or a PSTN (Public Switched Telephone Network) telecommunication mode, alternatively based on the control signal. The driving method is used for determining whether assisting the voice input/output communication unit to electrically connect with the Internet or not by the switch based on detecting a signal which contains an IP, a status result and a dial-tone result of the voice input/output communication unit.
    Type: Application
    Filed: June 22, 2007
    Publication date: August 14, 2008
    Applicant: Silicon Data International Co., Ltd.
    Inventors: Chin-chung Chen, Ching-feng Huang, Yi-chun Sung
  • Publication number: 20080101718
    Abstract: A method of processing a frame including a plurality of macro-blocks is provided. Each of the macro-blocks respectively includes M pixels. A local buffer is previously provided. The capacity of the local buffer is equal to the size of N pixels. M and N are both positive integers. N is smaller than or equal to M. A target area is first selected from the micro-blocks, and then N pixels within the target area are stored in the local buffer. Afterward, the method performs a deblock filtering procedure on the N pixels stored in the local buffer.
    Type: Application
    Filed: October 23, 2007
    Publication date: May 1, 2008
    Inventors: Kuo-Uei Yang, Ching-Feng Huang
  • Publication number: 20050279452
    Abstract: An etching reaction device (3) includes an etching reaction chamber (30), and a number of protrusions (301) arranged on the bottom of the etching reaction chamber. Thus it can economize the etching time and quickly complement the concentration of the etching liquid near to a wafer (7). The protrusions can reduce the capability of the etching reaction chamber, thus it can economize the etching liquid.
    Type: Application
    Filed: June 17, 2005
    Publication date: December 22, 2005
    Inventors: Ching-Feng Huang, Jung-Lung Huang, Chang Huang, Chen-Hsien Ou, Chih Huang, Sheng-Chou Gau
  • Patent number: D1016101
    Type: Grant
    Filed: August 10, 2022
    Date of Patent: February 27, 2024
    Assignee: WALRUS PUMP CO., LTD.
    Inventor: Ching Feng Huang
  • Patent number: D1026039
    Type: Grant
    Filed: October 28, 2022
    Date of Patent: May 7, 2024
    Assignee: WALRUS PUMP CO., LTD.
    Inventor: Ching Feng Huang