Abstract: A program operation is initiated to program a set of target memory cells of a target wordline of a memory device to a target programming level. During a program verify operation of the program operation, a program verify voltage level is caused to be applied to the target wordline to verify programming of the set of target memory cells. A pass through read voltage level associated with the target wordline is identified. During the program verify operation, a pass through voltage level is caused to be applied to at least one of a first wordline or a second wordline, wherein the pass through read voltage level is the read voltage level reduced by an offset value.

Abstract: A reflective mask includes a substrate, a reflective multilayer disposed on the substrate, a capping layer disposed on the reflective multilayer, a photo catalytic layer disposed on the capping layer, and an absorber layer disposed on the photo catalytic layer and carrying circuit patterns having openings. Part of the photo catalytic layer is exposed at the openings of the absorber layer, and the photo catalytic layer includes one selected from the group consisting of titanium oxide (TiO2), tin oxide (SnO), zinc oxide (ZnO) and cadmium sulfide (CdS).

Abstract: A reflective mask includes a substrate, a reflective multilayer disposed on the substrate, a capping layer disposed on the reflective multilayer, and an absorber layer disposed on the capping layer. The absorber layer includes one or more alternating pairs of a first Cr based layer and a second Cr based layer different from the first Cr based layer.

Abstract: A reflective mask includes a substrate, a reflective multilayer disposed on the substrate, a capping layer disposed on the reflective multilayer, and an absorber layer disposed on the capping layer. The absorber layer includes one or more alternating pairs of a first Cr based layer and a second Cr based layer different from the first Cr based layer.

Abstract: The invention disclosed an anti-reflective film. The anti-reflective film comprises a substrate, a hard coating layer disposed on the substrate and a low refractive layer disposed on the hard coating layer. The low refractivity layer comprises a fluorine-containing acrylate-modified polysiloxane resin, a plurality of hollow silica nanoparticles, an initiator and a leveling agent comprising a perfluoropolyether group-containing (meth)acrylic-modified organosilicone compound. The reflectivity of the anti-reflective film of the anti-reflective film is less than 1.1%, and the water contact angle thereof is ranging between 90° and 125°.

Abstract: A reflective mask includes a substrate, a reflective multilayer disposed on the substrate, a capping layer disposed on the reflective multilayer, a photo catalytic layer disposed on the capping layer, and an absorber layer disposed on the photo catalytic layer and carrying circuit patterns having openings. Part of the photo catalytic layer is exposed at the openings of the absorber layer, and the photo catalytic layer includes one selected from the group consisting of titanium oxide (TiO2), tin oxide (SnO), zinc oxide (ZnO) and cadmium sulfide (CdS).

Abstract: This invention is to provide a hard coating film, comprising a polymethyl methacrylate (PMMA) base film and an antiglare hard coating layer formed thereon, wherein the antiglare hard coating layer comprises a (meth)acrylate composition, an initiator, a plurality of silica nanoparticles, a plurality of organic microparticles and a leveling agent. The (meth)acrylate composition comprises a urethane (meth)acrylate oligomer with a functionality of 6 to 15 and a molecular weight ranging between 1,000 and 4,500, and at least one (meth)acrylate monomer with a functionality of 3 to 6, and at least one (meth)acrylate monomer with functionality of less than 3.

Abstract: A reflective mask includes a substrate, a reflective multilayer disposed on the substrate, a capping layer disposed on the reflective multilayer, a photo catalytic layer disposed on the capping layer, and an absorber layer disposed on the photo catalytic layer and carrying circuit patterns having openings. Part of the photo catalytic layer is exposed at the openings of the absorber layer, and the photo catalytic layer includes one selected from the group consisting of titanium oxide (TiO2), tin oxide (SnO), zinc oxide (ZnO) and cadmium sulfide (CdS).

Abstract: A high hardness flexible hard coating film is disclosed. The high hardness flexible hard coating film comprises a substrate film and a hard coating layer. The hard coating layer comprises a (meth)acrylate binder and reactive silica nanoparticles, wherein the reactive silica nanoparticles comprise reactive (meth)acrylate modified silica nanoparticles and reactive (meth)acrylate-polyhedral oligomeric silsesquioxane (POSS) modified silica nanoparticles. The high hardness flexible hard coating film will not crack or fracture under an dynamic inward folding test for performing 180° bend testing at a radius of 1 mm with 2×105 times, and the pencil hardness (JIS K 5400) thereof is 6H or more.

Abstract: A reflective mask includes a substrate, a reflective multilayer disposed on the substrate, a capping layer disposed on the reflective multilayer, and an absorber layer disposed on the capping layer. The absorber layer includes one or more alternating pairs of a first Cr based layer and a second Cr based layer different from the first Cr based layer.

Abstract: A reflective mask includes a substrate, a reflective multilayer disposed on the substrate, a capping layer disposed on the reflective multilayer, and an absorber layer disposed on the capping layer. The absorber layer includes one or more alternating pairs of a first Cr based layer and a second Cr based layer different from the first Cr based layer.

Abstract: The invention is to provide an anti-reflective film. The anti-reflective film comprises a substrate, a hard coating layer disposed on the substrate and a low refractive layer disposed on the hard coating layer. The low refractive layer comprises a (meth)acrylate resin, hollow silica nanoparticles, an initiator and a leveling agent. Wherein the leveling agent comprises a (meth)acrylic-modified organosilicone compound having a perfluoropolyether group. The reflectivity of the anti-reflective film of the present invention is in the range of 1.2% to 1.4%.

Abstract: The invention disclosed an anti-reflective film. The anti-reflective film comprises a substrate, a hard coating layer disposed on the substrate and a low refractive layer disposed on the hard coating layer. The low refractivity layer comprises a fluorine-containing acrylate-modified polysiloxane resin, a plurality of hollow silica nanoparticles, an initiator and a leveling agent comprising a perfluoropolyether group-containing (meth)acrylic-modified organosilicone compound. The reflectivity of the anti-reflective film of the anti-reflective film is less than 1.1%, and the water contact angle thereof is ranging between 90° and 125°.

Abstract: This invention is to provide a hard coating film, comprising a polymethyl methacrylate (PMMA) base film and an antiglare hard coating layer formed thereon, wherein the antiglare hard coating layer comprises a (meth)acrylate composition, an initiator, a plurality of silica nanoparticles, a plurality of organic microparticles and a leveling agent. The (meth)acrylate composition comprises a urethane (meth)acrylate oligomer with a functionality of 6 to 15 and a molecular weight ranging between 1,000 and 4,500, and at least one (meth)acrylate monomer with a functionality of 3 to 6, and at least one (meth)acrylate monomer with functionality of less than 3.

Abstract: A reflective mask includes a substrate, a reflective multilayer disposed on the substrate, a capping layer disposed on the reflective multilayer, and an absorber layer disposed on the capping layer. The absorber layer includes one or more alternating pairs of a first Cr based layer and a second Cr based layer different from the first Cr based layer.

Abstract: The invention is to provide an anti-reflective film. The anti-reflective film comprises a substrate, a hard coating layer disposed on the substrate and a low refractive layer disposed on the hard coating layer. The low refractive layer comprises a (meth)acrylate resin, hollow silica nanoparticles, an initiator and a leveling agent. Wherein the leveling agent comprises a (meth)acrylic-modified organosilicone compound having a perfluoropolyether group. The reflectivity of the anti-reflective film of the present invention is in the range of 1.2% to 1.4%.

Abstract: The present invention is to provide a hard coating layered optical film, comprising a poly(methylmethacrylate) (PMMA) base film and a hard coating layer thereon. The hard coating layer comprises a (meth)acrylate composition and an initiator, wherein the (meth)acrylate composition comprises a urethane (meth)acrylate oligomer of functionalities from 6 to 15, at least one (meth)acrylate monomer of functionalities from 3 to 6 and at least one (meth)acrylate monomer of functionalities less than 3, wherein the molecular weight of the (meth)urethane acrylate oligomer of functionalities from 6 to 15 is ranging between 1,000 to 4,500. The hard coating layer of the hard coating layered optical film can be further coated with a functional layer, such as a low reflection layer to form an anti-reflection hard coating layered optical film. The hard coating layer can optionally comprise micro-particles to generate an anti-glare hard coating film.

Abstract: A high hardness flexible hard coating film is disclosed. The high hardness flexible hard coating film comprises a substrate film and a hard coating layer. The hard coating layer comprises a (meth)acrylate binder and reactive silica nanoparticles, wherein the reactive silica nanoparticles comprise reactive (meth)acrylate modified silica nanoparticles and reactive (meth)acrylate-polyhedral oligomeric silsesquioxane (POSS) modified silica nanoparticles. The high hardness flexible hard coating film will not crack or fracture under an dynamic inward folding test for performing 180° bend testing at a radius of 1 mm with 2×105 times, and the pencil hardness (JIS K 5400) thereof is 6H or more.

Abstract: A reflective mask includes a substrate, a reflective multilayer disposed on the substrate, a capping layer disposed on the reflective multilayer, a photo catalytic layer disposed on the capping layer, and an absorber layer disposed on the photo catalytic layer and carrying circuit patterns having openings. Part of the photo catalytic layer is exposed at the openings of the absorber layer, and the photo catalytic layer includes one selected from the group consisting of titanium oxide (TiO2), tin oxide (SnO), zinc oxide (ZnO) and cadmium sulfide (CdS).

Abstract: The present invention is to provide a hard coating layered optical film, comprising a poly(methylmethacrylate) (PMMA) base film and a hard coating layer thereon. The hard coating layer comprises a (meth)acrylate composition and an initiator, wherein the (meth)acrylate composition comprises a urethane (meth)acrylate oligomer of functionalities from 6 to 15, at least one (meth)acrylate monomer of functionalities from 3 to 6 and at least one (meth)acrylate monomer of functionalities less than 3, wherein the molecular weight of the (meth)urethane acrylate oligomer of functionalities from 6 to 15 is ranging between 1,000 to 4,500. The hard coating layer of the hard coating layered optical film can be further coated with a functional layer, such as a low reflection layer to form an anti-reflection hard coating layered optical film. The hard coating layer can optionally comprise micro-particles to generate an anti-glare hard coating film.