Abstract: A method of forming a semiconductor device includes forming a photoresist layer over a mask layer, patterning the photoresist layer, and forming an oxide layer on exposed surfaces of the patterned photoresist layer. The mask layer is patterned using the patterned photoresist layer as a mask.

Abstract: A method of forming a semiconductor device includes forming a mask layer over a substrate and forming an opening in the mask layer. A gap-filling material is deposited in the opening. A plasma treatment is performed on the gap-filling material. The height of the gap-filling material is reduced. The mask layer is removed. The substrate is patterned using the gap-filling material as a mask.

Abstract: A method of making a semiconductor device includes manufacturing a first transistor over a first side of a substrate. The method further includes depositing a spacer material against a sidewall of the first transistor. The method further includes recessing the spacer material to expose a first portion of the sidewall of the first transistor. The method further includes manufacturing a first electrical connection to the transistor, a first portion of the electrical connection contacts a surface of the first transistor farthest from the substrate, and a second portion of the electrical connect contacts the first portion of the sidewall of the first transistor. The method further includes manufacturing a self-aligned interconnect structure (SIS) extending along the spacer material, wherein the spacer material separates a portion of the SIS from the first transistor, and the first electrical connection directly contacts the SIS.

Abstract: Provided are semiconductor devices that include a first gate structure having a first end cap portion, a second gate structure having a second end cap portion coaxial with the first gate structure, a first dielectric region separating the first end cap portion and the second end cap portion, a first conductive element extending over the first gate structure, a second conductive element extending over the second gate structure, and a gate via electrically connecting the second gate structure and the second conductive element, with the first dielectric region having a first width and being positioned at least partially under the first conductive element and defines a spacing between the gate via and an end of the second end cap portion that exceeds a predetermined distance.

Abstract: Various embodiments of the present disclosure are directed towards a semiconductor processing system including an overlay (OVL) shift measurement device. The OVL shift measurement device is configured to determine an OVL shift between a first wafer and a second wafer, where the second wafer overlies the first wafer. A photolithography device is configured to perform one or more photolithography processes on the second wafer. A controller is configured to perform an alignment process on the photolithography device according to the determined OVL shift. The photolithography device performs the one or more photolithography processes based on the OVL shift.

Abstract: A system for recovering natural gas liquid from a gas source, comprising compression means (206) for increasing the temperature and pressure of the fluid from the gas source, cooling means (230) for cooling the fluid from the compression means, a gas/gas heat exchanger (204), fluid from the gas source flowing from a first inlet to a first outlet; at least one separator (208) for receiving the fluid from the first outlet of the gas/gas heat exchanger (204) and separating liquid from the gas, the gas from the separator being directed to expansion means (206) for reducing the temperature and pressure of the gas, the aqueous part of the liquid from the separator and/or the gas from the expansion means being directed to the gas/gas heat exchanger (204) where it flows therethrough from a second inlet to a second outlet for cooling the fluid flowing between the first inlet and first outlet, wherein injection means are provided between the cooling means and the gas/gas heat exchanger for saturating the gas with a liq

Abstract: An illumination system includes a first light source module and a first reflective mirror module. The first light source module includes plural first light sources for emitting plural first light beams, respectively. The first reflective mirror module includes at least one first reflective mirror, at least one first fixing structure, and at least one first adjusting mechanism. The first reflective mirror is located at a first optical axis of the plural first light sources. The at least one first fixing structure is used for fixing the first reflective mirror. The first adjusting mechanism is connected with the first fixing structure. By moving or rotating the first adjusting mechanism, a location and an angle of the first reflective mirror relative to the first optical axis are correspondingly changed, so that the first light beam is reflected by the first reflective mirror and guided along a specified optical path.

Abstract: An illumination system includes a first light source module and a first reflective mirror module. The first light source module includes plural first light sources for emitting plural first light beams, respectively. The first reflective mirror module includes at least one first reflective mirror, at least one first fixing structure, and at least one first adjusting mechanism. The first reflective mirror is located at a first optical axis of the plural first light sources. The at least one first fixing structure is used for fixing the first reflective mirror. The first adjusting mechanism is connected with the first fixing structure. By moving or rotating the first adjusting mechanism, a location and an angle of the first reflective mirror relative to the first optical axis are correspondingly changed, so that the first light beam is reflected by the first reflective mirror and guided along a specified optical path.

Abstract: Disclosed is a method for making fiber paper. In this method, mineral fibers and PVA resin are blended in water, thus forming first solution. Polymer fibers and PVA resin are blended in water, thus forming second solution. The first solution is mixed with the second solution. A wet paper-making machine is used to make mineral fiber paper from the mixture.

Abstract: Disclosed is a method for making fiber paper. In this method, mineral fibers and PVA resin are blended in water, thus forming first solution. Polymer fibers and PVA resin are blended in water, thus forming second solution. The first solution is mixed with the second solution. A wet paper-making machine is used to make mineral fiber paper from the mixture.

Abstract: A method is disclosed for recycling precious metal from used printed circuit boards. The used printed circuit boards are roasted with plasma at 800 degrees Celsius for less than 10 minutes, thus producing exhaust and residue that contains the precious metal. The exhaust is treated with an exhaust-treatment system before it is released to the atmosphere. The residue is ground and turned into scraps of a diameter smaller than 2 mm. The scraps are subjected to magnetic separation, thus separating ferromagnetic scraps from non-ferromagnetic scraps. The ferromagnetic scraps are refined. The non-ferromagnetic scraps are screened, thus separating tiny non-ferromagnetic scraps from big non-ferromagnetic scraps. The tiny non-ferromagnetic scraps contain silver and gold. The big non-ferromagnetic scraps contain copper.

Abstract: Incinerator ashes, which is obtained after treating municipal solid waste, incinerator ashes or its plasma vitrified slag is made into mineral fibers. Cullet is added during manufacturing the mineral fibers for conditioning. The mineral fibers thus obtained have a good strength and could raise value of recycled product. In addition, it could reduce impact of the incinerator ashes to the environment and environmental protection is achieved.

Abstract: A light source adjusting device for a projector is provided. The light source adjusting device includes a base; an adjusting frame having a containing housing; a lamp disposed inside the containing housing as a light source of the projector; a connecting frame connected between the base and the adjusting frame; a first adjusting element disposed on the base and connected with the connecting frame; and a second adjusting element disposed on the base and connected with the adjusting frame, wherein the second adjusting element and the first adjusting element are disposed coplanarly, and a position of the connecting frame is adjusted by adjusting the first adjusting element and a position of the adjusting frame is adjusted by adjusting the second adjusting element, thereby driving the lamp so as to adjust a focal position of the light source adjusting device.

Abstract: Incinerator ashes, which is obtained after treating municipal solid waste, incinerator ashes or its plasma vitrified slag is made into mineral fibers. Cullet is added during manufacturing the mineral fibers for conditioning. The mineral fibers thus obtained have a good strength and could raise value of recycled product. In addition, it could reduce impact of the incinerator ashes to the environment and environmental protection is achieved.

Abstract: A light source adjusting device for a projector is provided. The light source adjusting device includes a base; an adjusting frame having a containing housing; a lamp disposed inside the containing housing as a light source of the projector; a connecting frame connected between the base and the adjusting frame; a first adjusting element disposed on the base and connected with the connecting frame; and a second adjusting element disposed on the base and connected with the adjusting frame, wherein the second adjusting element and the first adjusting element are disposed coplanarly, and a position of the connecting frame is adjusted by adjusting the first adjusting element and a position of the adjusting frame is adjusted by adjusting the second adjusting element, thereby driving the lamp so as to adjust a focal position of the light source adjusting device.