Abstract: A semiconductor device and method of manufacturing the same are provided. The semiconductor device includes a substrate and a first gate electrode disposed on the substrate and located in a first region of the semiconductor device. The semiconductor device also includes a first sidewall structure covering the first gate electrode. The semiconductor device further includes a protective layer disposed between the first gate electrode and the first sidewall structure. In addition, the semiconductor device includes a second gate electrode disposed on the substrate and located in a second region of the semiconductor device. The semiconductor device also includes a second sidewall structure covering a lateral surface of the second gate electrode.

Abstract: An optical system affixed to an electronic apparatus is provided, including a first optical module, a second optical module, and a third optical module. The first optical module is configured to adjust the moving direction of a first light from a first moving direction to a second moving direction, wherein the first moving direction is not parallel to the second moving direction. The second optical module is configured to receive the first light moving in the second moving direction. The first light reaches the third optical module via the first optical module and the second optical module in sequence. The third optical module includes a first photoelectric converter configured to transform the first light into a first image signal.

Abstract: The present disclosure provides a photomask, including a plurality of pattern areas, each of the pattern areas is defined by a respective boundary, a first pattern area including a first mask feature, and a training area adjacent to a boundary of the pattern area, the training area comprising a first training feature, wherein the first training feature is comparable to the first mask feature.

Abstract: The present invention provides non-calcined cementitious compositions comprising micron inorganic particles, which can be used as a binder material; and provides non-calcined concrete compositions; non-calcined concretes are also provided, which exhibit similar or better physical and mechanical properties than those prepared with traditional cements do. The present invention also provides the preparation methods of the non-calcined cementitious compositions, the non-calcined concrete compositions and the non-calcined concretes.

Abstract: The present invention provides non-calcined cementitious compositions comprising micron inorganic particles, which can be used as a binder material; and provides non-calcined concrete compositions; non-calcined concretes are also provided, which exhibit similar or better physical and mechanical properties than those prepared with traditional cements do. The present invention also provides the preparation methods of the non-calcined cementitious compositions, the non-calcined concrete compositions and the non-calcined concretes.

Abstract: The present disclosure relates to a method of inspecting a photomask to decrease false defects, which uses a plurality of image rendering models with varying emphasis on different design aspects, and an associated apparatus. In some embodiments, the method is performed by forming an integrated circuit (IC) design comprising a graphical representation of an integrated circuit. A first image rendering simulation is performed on the IC design using an initial image rendering model to determine a plurality of initial mask defects. A second image rendering simulation is performed on the IC design using a modified image rendering model that emphasizes a design aspect to determine a plurality of modified mask defects. By comparing the plurality of initial mask defects with the plurality of modified mask defects, falsely identified mask defects can be detected and eliminated.

Abstract: The present disclosure relates to a method of inspecting a photomask to decrease false defects, which uses a plurality of image rendering models with varying emphasis on different design aspects, and an associated apparatus. In some embodiments, the method is performed by forming an integrated circuit (IC) design comprising a graphical representation of an integrated circuit. A first image rendering simulation is performed on the IC design using an initial image rendering model to determine a plurality of initial mask defects. A second image rendering simulation is performed on the IC design using a modified image rendering model that emphasizes a design aspect to determine a plurality of modified mask defects. By comparing the plurality of initial mask defects with the plurality of modified mask defects, falsely identified mask defects can be detected and eliminated.

Abstract: A low-calcium-cementitious material having a calcium oxide content less than or equal to 10 wt % which is processed at room temperature into a low calcium cement mainly composed of mullite and a method manufacturing of the low calcium cement are provided. The low-calcium-cementitious material includes low calcium fly ash, an alkaline agent, and a congealing agent, wherein the calcium oxide content of the low-calcium-cementitious material is less than or equal to 10 wt %. The low calcium fly ash has a calcium oxide content less than or equal to 10 wt %. The low calcium cement manufacturing method includes providing a low calcium fly ash having a calcium oxide content less than or equal to 10 wt %; providing an alkaline agent; providing a congealing agent; and mixing the low-calcium-content fly ash, the alkaline agent, and the congealing agent and standing the mixture at room temperature to form a low calcium cement.

Abstract: A low-calcium-cementitious material having a calcium oxide content less than or equal to 10 wt % which is processed at room temperature into a low calcium cement mainly composed of mullite and a method manufacturing of the low calcium cement are provided. The low-calcium-cementitious material includes low calcium fly ash, an alkaline agent, and a congealing agent, wherein the calcium oxide content of the low-calcium-cementitious material is less than or equal to 10 wt %. The low calcium fly ash has a calcium oxide content less than or equal to 10 wt %. The low calcium cement manufacturing method includes providing a low calcium fly ash having a calcium oxide content less than or equal to 10 wt %; providing an alkaline agent; providing a congealing agent; and mixing the low-calcium-content fly ash, the alkaline agent, and the congealing agent and standing the mixture at room temperature to form a low calcium cement.