Patents by Inventor Ching-Yuan Tseng

Ching-Yuan Tseng has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240128381
    Abstract: A power diode device includes a substrate. The substrate includes a core layer of a first conductive type, a first diffusion layer of the first conductive type, a second diffusion layer of a second conductive type, and a heavily doped region of the second conductive type. The core layer is located between the first diffusion layer and the second diffusion layer. A thickness of the core layer is greater than that of the second diffusion layer. The heavily doped region is located in the second diffusion layer and extends toward the core layer to form a PN junction between the heavily doped region and the core layer. A method for manufacturing the power diode device is also provided.
    Type: Application
    Filed: June 2, 2023
    Publication date: April 18, 2024
    Inventors: Ching Chiu TSENG, Tzu Yuan LO, Chao Yi CHANG
  • Patent number: 11948949
    Abstract: In some embodiments, the present disclosure relates to a device having a semiconductor substrate including a frontside and a backside. On the frontside of the semiconductor substrate are a first source/drain region and a second source/drain region. A gate electrode is arranged on the frontside of the semiconductor substrate and includes a horizontal portion, a first vertical portion, and a second vertical portion. The horizontal portion is arranged over the frontside of the semiconductor substrate and between the first and second source/drain regions. The first vertical portion extends from the frontside towards the backside of the semiconductor substrate and contacts the horizontal portion of the gate electrode structure. The second vertical portion extends from the frontside towards the backside of the semiconductor substrate, contacts the horizontal portion of the gate electrode structure, and is separated from the first vertical portion by a channel region of the substrate.
    Type: Grant
    Filed: July 15, 2022
    Date of Patent: April 2, 2024
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Chun-Yuan Chen, Ching-Chun Wang, Hsiao-Hui Tseng, Jen-Cheng Liu, Jhy-Jyi Sze, Shyh-Fann Ting, Wei Chuang Wu, Yen-Ting Chiang, Chia Ching Liao, Yen-Yu Chen
  • Patent number: 11916100
    Abstract: The present disclosure relates to an integrated chip including a dielectric structure over a substrate. A first capacitor is disposed between sidewalls of the dielectric structure. The first capacitor includes a first electrode between the sidewalls of the dielectric structure and a second electrode between the sidewalls and over the first electrode. A second capacitor is disposed between the sidewalls. The second capacitor includes the second electrode and a third electrode between the sidewalls and over the second electrode. A third capacitor is disposed between the sidewalls. The third capacitor includes the third electrode and a fourth electrode between the sidewalls and over the third electrode. The first capacitor, the second capacitor, and the third capacitor are coupled in parallel by a first contact on a first side of the first capacitor and a second contact on a second side of the first capacitor.
    Type: Grant
    Filed: March 21, 2022
    Date of Patent: February 27, 2024
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Hsuan-Han Tseng, Chun-Yuan Chen, Lu-Sheng Chou, Hsiao-Hui Tseng, Ching-Chun Wang
  • Patent number: 9557443
    Abstract: A photosensitive resin composition, a black matrix, a color filter, and a liquid crystal display device including the resin composition are provided. The photosensitive resin composition includes an alkali-soluble resin (A), a compound (B) containing an ethylenically unsaturated group, a photo initiator (C), a solvent (D), and a black pigment (E). The compound (B) containing an ethylenically unsaturated group includes a compound (B-1) represented by the following formula (1). In formula (1), a represents an integer of 1 to 20; each of Ra and Rb independently represents an acryloyloxy phenyl group, an acryloyloxy alkyl group having 4 to 20 carbons, a methacryloyloxy phenyl group, a methacryloyloxy alkyl group having 5 to 20 carbons, an alkenyl group having 3 to 20 carbons, or an alkenyl aryl group having 8 to 30 carbons; when a is 2 or more, a plurality of Ra and Rb are the same or different.
    Type: Grant
    Filed: June 12, 2014
    Date of Patent: January 31, 2017
    Assignee: Chi Mei Corporation
    Inventor: Ching-Yuan Tseng
  • Patent number: 9298091
    Abstract: The invention relates to a photosensitive resin composition; especially relates to a photosensitive resin composition that has good heat-yellowing resistance, surface roughness resistance, developability and brightness. The invention also provides a white matrix, a color filter and a reflective display element.
    Type: Grant
    Filed: March 17, 2014
    Date of Patent: March 29, 2016
    Assignee: CHI MEI CORPORATION
    Inventor: Ching-Yuan Tseng
  • Patent number: 9223206
    Abstract: A photosensitive resin composition includes (A) an alkali-soluble resin, (B) a polysiloxane, (C) an ethylenically unsaturated compound, (D) a photo-initiator, (E) a solvent, (F) a black pigment, and (G) a metal chelate. The alkali-soluble resin (A) includes an unsaturated-group-containing resin (A-1) obtained by subjecting a mixture containing (i) an epoxy compound having at least two epoxy groups and (ii) a compound having at least one carboxyl group and at least one ethylenically unsaturated group to polymerization.
    Type: Grant
    Filed: March 13, 2013
    Date of Patent: December 29, 2015
    Assignee: Chi Mei Corporation
    Inventors: Ching-Yuan Tseng, Hao-Wei Liao
  • Publication number: 20150253464
    Abstract: The invention relates to a photosensitive resin composition for a black matrix, a color filter formed by the black matrix, and a liquid crystal display element. The photosensitive resin composition comprises an alkali-soluble resin (A), a compound (B) containing an ethylenically unsaturated group, a photoinitiator (C), a solvent (D), a black pigment (E), a compound (F) represented by Formula (a) and an epoxy resin (G) containing a fluorene skeleton represented by Formula (b). The photosensitive resin composition for the black matrix has the advantage of reducing film shrinkage and reducing roughness.
    Type: Application
    Filed: May 19, 2015
    Publication date: September 10, 2015
    Inventor: CHING-YUAN TSENG
  • Patent number: 9063412
    Abstract: A photosensitive resin composition includes (A) an alkali-soluble resin, (B) a polysiloxane, (C) an ethylenically unsaturated compound, (D) a photo-initiator, (E) a first solvent, and (F) a black pigment dispersion. The alkali-soluble resin (A) includes an unsaturated-group-containing resin (A-1) obtained by subjecting a mixture containing (i) an epoxy compound having at least two epoxy groups and (ii) a compound having at least one carboxyl group and at least one ethylenically unsaturated group to polymerization. A weight ratio of the black pigment dispersion (F) to the polysiloxane (B) ranges from 5 to 35. Application of the photosensitive resin composition is also disclosed.
    Type: Grant
    Filed: February 4, 2013
    Date of Patent: June 23, 2015
    Assignee: Chi Mei Corporation
    Inventors: Hao-Wei Liao, Ching-Yuan Tseng, Chun-Hsien Lee, Ming-Ju Wu, Chun-An Shih
  • Patent number: 9063422
    Abstract: A photosensitive resin composition includes (A) an alkali-soluble resin, (B) a polysiloxane, (C) an ethylenically unsaturated compound, (D) a photo-initiator, (E) a black pigment, and (F) a solvent. The alkali-soluble resin includes an unsaturated-group-containing resin obtained by subjecting a mixture containing (i) an epoxy compound having at least two epoxy groups and (ii) a compound having at least one carboxyl group and at least one ethylenically unsaturated group to polymerization. A weight ratio of the unsaturated-group-containing resin to the polysiloxane ranges from 0.1 to 3.0. Application of the photosensitive resin composition is also disclosed.
    Type: Grant
    Filed: November 2, 2012
    Date of Patent: June 23, 2015
    Assignee: Chi Mei Corporation
    Inventors: Hao-Wei Liao, Ching-Yuan Tseng, Chun-Hsien Lee, Ming-Ju Wu, Chun-An Shih
  • Patent number: 9029051
    Abstract: A photosensitive resin composition is provided, which comprises an alkali-soluble resin (A), a polysiloxane polymer (B), a compound containing vinyl unsaturated group(s) (C), a photoinitiator (D), a solvent (E), a black pigment (F) and a light stabilizer (G). The alkali-soluble resin (A) includes a resin having unsaturated group(s) (A-1), which is obtained by reacting an epoxy compound having at least two epoxy groups (a-1) with a compound having at least one vinyl unsaturated group and carboxyl group (a-2). The light stabilizer (G) includes a UV absorber (G-1) and/or a hindered amine (G-2). Therefore, the photosensitive resin composition has an excellent temporal stability, and a black matrix formed by such composition has a better heat resistance.
    Type: Grant
    Filed: March 8, 2013
    Date of Patent: May 12, 2015
    Assignee: Chi Mei Corporation
    Inventors: Ching-Yuan Tseng, Hao-Wei Liao
  • Publication number: 20150115210
    Abstract: The invention relates to a photosensitive resin composition for a black matrix, a color filter formed by the black matrix, and a liquid crystal display device. The photosensitive resin composition comprises an alkali-soluble resin (A), a compound containing an ethylenically unsaturated group (B), a photoinitiator (C), a solvent (D), a black pigment (E), and a specific compound (F). The photosensitive resin composition for the black matrix has the advantage of good linearity of pattern with high finesse.
    Type: Application
    Filed: October 24, 2014
    Publication date: April 30, 2015
    Inventor: CHING-YUAN TSENG
  • Publication number: 20150115209
    Abstract: The present invention relates to a photosensitive resin composition, a color filter and a liquid crystal display device using the same. The photosensitive resin composition includes an alkali-soluble resin (A), a compound having a vinyl unsaturated group (B), a photo initiator (C), a solvent (D) and a black pigment (E) The alkali-soluble resin (A) includes a resin having an unsaturated group (A-1), which is prepared by polymerizing a mixture. The aforementioned compound having a vinyl unsaturated group (B) can include a compound (B-1). The photosensitive resin composition has good reliability at high temperature and high humidity.
    Type: Application
    Filed: October 8, 2014
    Publication date: April 30, 2015
    Inventors: Hao-Wei LIAO, Ching-Yuan TSENG
  • Publication number: 20150028272
    Abstract: The present invention relates to a photosensitive resin composition for a black matrix, a color filter including the black matrix and a liquid crystal display device using the same. The aforementioned photosensitive resin composition includes a polysiloxane (A), a compound having a vinyl unsaturated group (B), a photo initiator (C), a solvent (D) and a black pigment (E). The compound having the vinyl unsaturated group (B) includes a compound having an acidic group and at least three vinyl unsaturated groups (B-1).
    Type: Application
    Filed: July 9, 2014
    Publication date: January 29, 2015
    Inventors: Ching-Yuan TSENG, Hao-Wei LIAO
  • Publication number: 20140374675
    Abstract: A photosensitive resin composition, a black matrix, a color filter, and a liquid crystal display device including the resin composition are provided. The photosensitive resin composition includes an alkali-soluble resin (A), a compound (B) containing an ethylenically unsaturated group, a photo initiator (C), a solvent (D), and a black pigment (E). The compound (B) containing an ethylenically unsaturated group includes a compound (B-1) represented by the following formula (1). In formula (1), a represents an integer of 1 to 20; each of Ra and Rb independently represents an acryloyloxy phenyl group, an acryloyloxy alkyl group having 4 to 20 carbons, a methacryloyloxy phenyl group, a methacryloyloxy alkyl group having 5 to 20 carbons, an alkenyl group having 3 to 20 carbons, or an alkenyl aryl group having 8 to 30 carbons; when a is 2 or more, a plurality of Ra and Rb are the same or different.
    Type: Application
    Filed: June 12, 2014
    Publication date: December 25, 2014
    Inventor: Ching-Yuan Tseng
  • Publication number: 20140293400
    Abstract: The invention relates to a photosensitive resin composition; especially relates to a photosensitive resin composition that has good heat-yellowing resistance, surface roughness resistance, developability and brightness. The invention also provides a white matrix, a color filter and a reflective display element.
    Type: Application
    Filed: March 17, 2014
    Publication date: October 2, 2014
    Applicant: CHI MEI CORPORATION
    Inventor: CHING-YUAN TSENG
  • Publication number: 20130277627
    Abstract: A photosensitive resin composition includes (A) an alkali-soluble resin, (B) a polysiloxane, (C) an ethylenically unsaturated compound, (D) a photo-initiator, (E) a solvent, (F) a black pigment, and (G) a metal chelate. The alkali-soluble resin (A) includes an unsaturated-group-containing resin (A-1) obtained by subjecting a mixture containing (i) an epoxy compound having at least two epoxy groups and (ii) a compound having at least one carboxyl group and at least one ethylenically unsaturated group to polymerization.
    Type: Application
    Filed: March 13, 2013
    Publication date: October 24, 2013
    Applicant: CHI MEI CORPORATION
    Inventors: Ching-Yuan Tseng, Hao-Wei Liao
  • Publication number: 20130244177
    Abstract: A photosensitive resin composition is provided, which comprises an alkali-soluble resin (A), a polysiloxane polymer (B), a compound containing vinyl unsaturated group(s) (C), a photoinitiator (D), a solvent (E), a black pigment (F) and a light stabilizer (G). The alkali-soluble resin (A) includes a resin having unsaturated group(s) (A-1), which is obtained by reacting an epoxy compound having at least two epoxy groups (a-1) with a compound having at least one vinyl unsaturated group and carboxyl group (a-2). The light stabilizer (G) includes a UV absorber (G-1) and/or a hindered amine (G-2). Therefore, the photosensitive resin composition has an excellent temporal stability, and a black matrix formed by such composition has a better heat resistance.
    Type: Application
    Filed: March 8, 2013
    Publication date: September 19, 2013
    Applicant: CHI MEI CORPORATION
    Inventors: Ching-Yuan Tseng, Hao-Wei Liao
  • Publication number: 20130228727
    Abstract: A photosensitive resin composition includes (A) an alkali-soluble resin, (B) a polysiloxane, (C) an ethylenically unsaturated compound, (D) a photo-initiator, (E) a first solvent, and (F) a black pigment dispersion. The alkali-soluble resin (A) includes an unsaturated-group-containing resin (A-1) obtained by subjecting a mixture containing (i) an epoxy compound having at least two epoxy groups and (ii) a compound having at least one carboxyl group and at least one ethylenically unsaturated group to polymerization. A weight ratio of the black pigment dispersion (F) to the polysiloxane (B) ranges from 5 to 35. Application of the photosensitive resin composition is also disclosed.
    Type: Application
    Filed: February 4, 2013
    Publication date: September 5, 2013
    Applicant: CHI MEI CORPORATION
    Inventors: Hao-Wei Liao, Ching-Yuan Tseng, Chun-Hsien Lee, Ming-Ju Wu, Chun-An Shih