Patents by Inventor Ching-Yuan Tseng
Ching-Yuan Tseng has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240128381Abstract: A power diode device includes a substrate. The substrate includes a core layer of a first conductive type, a first diffusion layer of the first conductive type, a second diffusion layer of a second conductive type, and a heavily doped region of the second conductive type. The core layer is located between the first diffusion layer and the second diffusion layer. A thickness of the core layer is greater than that of the second diffusion layer. The heavily doped region is located in the second diffusion layer and extends toward the core layer to form a PN junction between the heavily doped region and the core layer. A method for manufacturing the power diode device is also provided.Type: ApplicationFiled: June 2, 2023Publication date: April 18, 2024Inventors: Ching Chiu TSENG, Tzu Yuan LO, Chao Yi CHANG
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Patent number: 11948949Abstract: In some embodiments, the present disclosure relates to a device having a semiconductor substrate including a frontside and a backside. On the frontside of the semiconductor substrate are a first source/drain region and a second source/drain region. A gate electrode is arranged on the frontside of the semiconductor substrate and includes a horizontal portion, a first vertical portion, and a second vertical portion. The horizontal portion is arranged over the frontside of the semiconductor substrate and between the first and second source/drain regions. The first vertical portion extends from the frontside towards the backside of the semiconductor substrate and contacts the horizontal portion of the gate electrode structure. The second vertical portion extends from the frontside towards the backside of the semiconductor substrate, contacts the horizontal portion of the gate electrode structure, and is separated from the first vertical portion by a channel region of the substrate.Type: GrantFiled: July 15, 2022Date of Patent: April 2, 2024Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Chun-Yuan Chen, Ching-Chun Wang, Hsiao-Hui Tseng, Jen-Cheng Liu, Jhy-Jyi Sze, Shyh-Fann Ting, Wei Chuang Wu, Yen-Ting Chiang, Chia Ching Liao, Yen-Yu Chen
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Patent number: 11916100Abstract: The present disclosure relates to an integrated chip including a dielectric structure over a substrate. A first capacitor is disposed between sidewalls of the dielectric structure. The first capacitor includes a first electrode between the sidewalls of the dielectric structure and a second electrode between the sidewalls and over the first electrode. A second capacitor is disposed between the sidewalls. The second capacitor includes the second electrode and a third electrode between the sidewalls and over the second electrode. A third capacitor is disposed between the sidewalls. The third capacitor includes the third electrode and a fourth electrode between the sidewalls and over the third electrode. The first capacitor, the second capacitor, and the third capacitor are coupled in parallel by a first contact on a first side of the first capacitor and a second contact on a second side of the first capacitor.Type: GrantFiled: March 21, 2022Date of Patent: February 27, 2024Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Hsuan-Han Tseng, Chun-Yuan Chen, Lu-Sheng Chou, Hsiao-Hui Tseng, Ching-Chun Wang
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Patent number: 9557443Abstract: A photosensitive resin composition, a black matrix, a color filter, and a liquid crystal display device including the resin composition are provided. The photosensitive resin composition includes an alkali-soluble resin (A), a compound (B) containing an ethylenically unsaturated group, a photo initiator (C), a solvent (D), and a black pigment (E). The compound (B) containing an ethylenically unsaturated group includes a compound (B-1) represented by the following formula (1). In formula (1), a represents an integer of 1 to 20; each of Ra and Rb independently represents an acryloyloxy phenyl group, an acryloyloxy alkyl group having 4 to 20 carbons, a methacryloyloxy phenyl group, a methacryloyloxy alkyl group having 5 to 20 carbons, an alkenyl group having 3 to 20 carbons, or an alkenyl aryl group having 8 to 30 carbons; when a is 2 or more, a plurality of Ra and Rb are the same or different.Type: GrantFiled: June 12, 2014Date of Patent: January 31, 2017Assignee: Chi Mei CorporationInventor: Ching-Yuan Tseng
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Patent number: 9298091Abstract: The invention relates to a photosensitive resin composition; especially relates to a photosensitive resin composition that has good heat-yellowing resistance, surface roughness resistance, developability and brightness. The invention also provides a white matrix, a color filter and a reflective display element.Type: GrantFiled: March 17, 2014Date of Patent: March 29, 2016Assignee: CHI MEI CORPORATIONInventor: Ching-Yuan Tseng
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Patent number: 9223206Abstract: A photosensitive resin composition includes (A) an alkali-soluble resin, (B) a polysiloxane, (C) an ethylenically unsaturated compound, (D) a photo-initiator, (E) a solvent, (F) a black pigment, and (G) a metal chelate. The alkali-soluble resin (A) includes an unsaturated-group-containing resin (A-1) obtained by subjecting a mixture containing (i) an epoxy compound having at least two epoxy groups and (ii) a compound having at least one carboxyl group and at least one ethylenically unsaturated group to polymerization.Type: GrantFiled: March 13, 2013Date of Patent: December 29, 2015Assignee: Chi Mei CorporationInventors: Ching-Yuan Tseng, Hao-Wei Liao
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Publication number: 20150253464Abstract: The invention relates to a photosensitive resin composition for a black matrix, a color filter formed by the black matrix, and a liquid crystal display element. The photosensitive resin composition comprises an alkali-soluble resin (A), a compound (B) containing an ethylenically unsaturated group, a photoinitiator (C), a solvent (D), a black pigment (E), a compound (F) represented by Formula (a) and an epoxy resin (G) containing a fluorene skeleton represented by Formula (b). The photosensitive resin composition for the black matrix has the advantage of reducing film shrinkage and reducing roughness.Type: ApplicationFiled: May 19, 2015Publication date: September 10, 2015Inventor: CHING-YUAN TSENG
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Patent number: 9063412Abstract: A photosensitive resin composition includes (A) an alkali-soluble resin, (B) a polysiloxane, (C) an ethylenically unsaturated compound, (D) a photo-initiator, (E) a first solvent, and (F) a black pigment dispersion. The alkali-soluble resin (A) includes an unsaturated-group-containing resin (A-1) obtained by subjecting a mixture containing (i) an epoxy compound having at least two epoxy groups and (ii) a compound having at least one carboxyl group and at least one ethylenically unsaturated group to polymerization. A weight ratio of the black pigment dispersion (F) to the polysiloxane (B) ranges from 5 to 35. Application of the photosensitive resin composition is also disclosed.Type: GrantFiled: February 4, 2013Date of Patent: June 23, 2015Assignee: Chi Mei CorporationInventors: Hao-Wei Liao, Ching-Yuan Tseng, Chun-Hsien Lee, Ming-Ju Wu, Chun-An Shih
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Patent number: 9063422Abstract: A photosensitive resin composition includes (A) an alkali-soluble resin, (B) a polysiloxane, (C) an ethylenically unsaturated compound, (D) a photo-initiator, (E) a black pigment, and (F) a solvent. The alkali-soluble resin includes an unsaturated-group-containing resin obtained by subjecting a mixture containing (i) an epoxy compound having at least two epoxy groups and (ii) a compound having at least one carboxyl group and at least one ethylenically unsaturated group to polymerization. A weight ratio of the unsaturated-group-containing resin to the polysiloxane ranges from 0.1 to 3.0. Application of the photosensitive resin composition is also disclosed.Type: GrantFiled: November 2, 2012Date of Patent: June 23, 2015Assignee: Chi Mei CorporationInventors: Hao-Wei Liao, Ching-Yuan Tseng, Chun-Hsien Lee, Ming-Ju Wu, Chun-An Shih
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Patent number: 9029051Abstract: A photosensitive resin composition is provided, which comprises an alkali-soluble resin (A), a polysiloxane polymer (B), a compound containing vinyl unsaturated group(s) (C), a photoinitiator (D), a solvent (E), a black pigment (F) and a light stabilizer (G). The alkali-soluble resin (A) includes a resin having unsaturated group(s) (A-1), which is obtained by reacting an epoxy compound having at least two epoxy groups (a-1) with a compound having at least one vinyl unsaturated group and carboxyl group (a-2). The light stabilizer (G) includes a UV absorber (G-1) and/or a hindered amine (G-2). Therefore, the photosensitive resin composition has an excellent temporal stability, and a black matrix formed by such composition has a better heat resistance.Type: GrantFiled: March 8, 2013Date of Patent: May 12, 2015Assignee: Chi Mei CorporationInventors: Ching-Yuan Tseng, Hao-Wei Liao
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Publication number: 20150115210Abstract: The invention relates to a photosensitive resin composition for a black matrix, a color filter formed by the black matrix, and a liquid crystal display device. The photosensitive resin composition comprises an alkali-soluble resin (A), a compound containing an ethylenically unsaturated group (B), a photoinitiator (C), a solvent (D), a black pigment (E), and a specific compound (F). The photosensitive resin composition for the black matrix has the advantage of good linearity of pattern with high finesse.Type: ApplicationFiled: October 24, 2014Publication date: April 30, 2015Inventor: CHING-YUAN TSENG
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Publication number: 20150115209Abstract: The present invention relates to a photosensitive resin composition, a color filter and a liquid crystal display device using the same. The photosensitive resin composition includes an alkali-soluble resin (A), a compound having a vinyl unsaturated group (B), a photo initiator (C), a solvent (D) and a black pigment (E) The alkali-soluble resin (A) includes a resin having an unsaturated group (A-1), which is prepared by polymerizing a mixture. The aforementioned compound having a vinyl unsaturated group (B) can include a compound (B-1). The photosensitive resin composition has good reliability at high temperature and high humidity.Type: ApplicationFiled: October 8, 2014Publication date: April 30, 2015Inventors: Hao-Wei LIAO, Ching-Yuan TSENG
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Publication number: 20150028272Abstract: The present invention relates to a photosensitive resin composition for a black matrix, a color filter including the black matrix and a liquid crystal display device using the same. The aforementioned photosensitive resin composition includes a polysiloxane (A), a compound having a vinyl unsaturated group (B), a photo initiator (C), a solvent (D) and a black pigment (E). The compound having the vinyl unsaturated group (B) includes a compound having an acidic group and at least three vinyl unsaturated groups (B-1).Type: ApplicationFiled: July 9, 2014Publication date: January 29, 2015Inventors: Ching-Yuan TSENG, Hao-Wei LIAO
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Publication number: 20140374675Abstract: A photosensitive resin composition, a black matrix, a color filter, and a liquid crystal display device including the resin composition are provided. The photosensitive resin composition includes an alkali-soluble resin (A), a compound (B) containing an ethylenically unsaturated group, a photo initiator (C), a solvent (D), and a black pigment (E). The compound (B) containing an ethylenically unsaturated group includes a compound (B-1) represented by the following formula (1). In formula (1), a represents an integer of 1 to 20; each of Ra and Rb independently represents an acryloyloxy phenyl group, an acryloyloxy alkyl group having 4 to 20 carbons, a methacryloyloxy phenyl group, a methacryloyloxy alkyl group having 5 to 20 carbons, an alkenyl group having 3 to 20 carbons, or an alkenyl aryl group having 8 to 30 carbons; when a is 2 or more, a plurality of Ra and Rb are the same or different.Type: ApplicationFiled: June 12, 2014Publication date: December 25, 2014Inventor: Ching-Yuan Tseng
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Publication number: 20140293400Abstract: The invention relates to a photosensitive resin composition; especially relates to a photosensitive resin composition that has good heat-yellowing resistance, surface roughness resistance, developability and brightness. The invention also provides a white matrix, a color filter and a reflective display element.Type: ApplicationFiled: March 17, 2014Publication date: October 2, 2014Applicant: CHI MEI CORPORATIONInventor: CHING-YUAN TSENG
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Publication number: 20130277627Abstract: A photosensitive resin composition includes (A) an alkali-soluble resin, (B) a polysiloxane, (C) an ethylenically unsaturated compound, (D) a photo-initiator, (E) a solvent, (F) a black pigment, and (G) a metal chelate. The alkali-soluble resin (A) includes an unsaturated-group-containing resin (A-1) obtained by subjecting a mixture containing (i) an epoxy compound having at least two epoxy groups and (ii) a compound having at least one carboxyl group and at least one ethylenically unsaturated group to polymerization.Type: ApplicationFiled: March 13, 2013Publication date: October 24, 2013Applicant: CHI MEI CORPORATIONInventors: Ching-Yuan Tseng, Hao-Wei Liao
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Publication number: 20130244177Abstract: A photosensitive resin composition is provided, which comprises an alkali-soluble resin (A), a polysiloxane polymer (B), a compound containing vinyl unsaturated group(s) (C), a photoinitiator (D), a solvent (E), a black pigment (F) and a light stabilizer (G). The alkali-soluble resin (A) includes a resin having unsaturated group(s) (A-1), which is obtained by reacting an epoxy compound having at least two epoxy groups (a-1) with a compound having at least one vinyl unsaturated group and carboxyl group (a-2). The light stabilizer (G) includes a UV absorber (G-1) and/or a hindered amine (G-2). Therefore, the photosensitive resin composition has an excellent temporal stability, and a black matrix formed by such composition has a better heat resistance.Type: ApplicationFiled: March 8, 2013Publication date: September 19, 2013Applicant: CHI MEI CORPORATIONInventors: Ching-Yuan Tseng, Hao-Wei Liao
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Publication number: 20130228727Abstract: A photosensitive resin composition includes (A) an alkali-soluble resin, (B) a polysiloxane, (C) an ethylenically unsaturated compound, (D) a photo-initiator, (E) a first solvent, and (F) a black pigment dispersion. The alkali-soluble resin (A) includes an unsaturated-group-containing resin (A-1) obtained by subjecting a mixture containing (i) an epoxy compound having at least two epoxy groups and (ii) a compound having at least one carboxyl group and at least one ethylenically unsaturated group to polymerization. A weight ratio of the black pigment dispersion (F) to the polysiloxane (B) ranges from 5 to 35. Application of the photosensitive resin composition is also disclosed.Type: ApplicationFiled: February 4, 2013Publication date: September 5, 2013Applicant: CHI MEI CORPORATIONInventors: Hao-Wei Liao, Ching-Yuan Tseng, Chun-Hsien Lee, Ming-Ju Wu, Chun-An Shih