Patents by Inventor Ching-Hua Chen
Ching-Hua Chen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240130246Abstract: A method for fabricating a semiconductor device includes the steps of first forming a first inter-metal dielectric (IMD) layer on a substrate and a metal interconnection in the first IMD layer, forming a magnetic tunneling junction (MTJ) and a top electrode on the metal interconnection, forming a spacer adjacent to the MTJ and the top electrode, forming a second IMD layer around the spacer, forming a cap layer on the top electrode, the spacer, and the second IMD layer, and then patterning the cap layer to form a protective cap on the top electrode and the spacer.Type: ApplicationFiled: December 25, 2023Publication date: April 18, 2024Applicant: UNITED MICROELECTRONICS CORP.Inventors: Hui-Lin Wang, Po-Kai Hsu, Ju-Chun Fan, Ching-Hua Hsu, Yi-Yu Lin, Hung-Yueh Chen
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Patent number: 11961791Abstract: A device includes a redistribution line, and a polymer region molded over the redistribution line. The polymer region includes a first flat top surface. A conductive region is disposed in the polymer region and electrically coupled to the redistribution line. The conductive region includes a second flat top surface not higher than the first flat top surface.Type: GrantFiled: May 18, 2022Date of Patent: April 16, 2024Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Ching-Wen Hsiao, Ming-Da Cheng, Chih-Wei Lin, Chen-Shien Chen, Chih-Hua Chen, Chen-Cheng Kuo
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Patent number: 11957061Abstract: A semiconductor device includes a substrate, a first dielectric layer, a second dielectric layer, and a third dielectric layer. The first dielectric layer is disposed on the substrate, around a first metal interconnection. The second dielectric layer is disposed on the first dielectric layer, around a via and a second metal interconnection. The second metal interconnection directly contacts the first metal interconnection. The third dielectric layer is disposed on the second dielectric layer, around a first magnetic tunneling junction (MTJ) structure and a third metal interconnection. The third metal interconnection directly contacts top surfaces of the first MTJ structure and the second metal interconnection, and the first MTJ structure directly contacts the via.Type: GrantFiled: May 23, 2023Date of Patent: April 9, 2024Assignee: UNITED MICROELECTRONICS CORP.Inventors: Hui-Lin Wang, Po-Kai Hsu, Ju-Chun Fan, Yi-Yu Lin, Ching-Hua Hsu, Hung-Yueh Chen
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Patent number: 11955460Abstract: In accordance with some embodiments, a package-on-package (PoP) structure includes a first semiconductor package having a first side and a second side opposing the first side, a second semiconductor package having a first side and a second side opposing the first side, and a plurality of inter-package connector coupled between the first side of the first semiconductor package and the first side of the second semiconductor package. The PoP structure further includes a first molding material on the second side of the first semiconductor package. The second side of the second semiconductor package is substantially free of the first molding material.Type: GrantFiled: October 5, 2020Date of Patent: April 9, 2024Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Yi-Da Tsai, Meng-Tse Chen, Sheng-Feng Weng, Sheng-Hsiang Chiu, Wei-Hung Lin, Ming-Da Cheng, Ching-Hua Hsieh, Chung-Shi Liu
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Publication number: 20240113032Abstract: Interconnect structure packages (e.g., through silicon vias (TSV) packages, through interlayer via (TIV) packages) may be pre-manufactured as opposed to forming TIVs directly on a carrier substrate during a manufacturing process for a semiconductor die package at backend packaging facility. The interconnect structure packages may be placed onto a carrier substrate during manufacturing of a semiconductor device package, and a semiconductor die package may be placed on the carrier substrate adjacent to the interconnect structure packages. A molding compound layer may be formed around and in between the interconnect structure packages and the semiconductor die package.Type: ApplicationFiled: April 25, 2023Publication date: April 4, 2024Inventors: Kai-Fung CHANG, Chin-Wei LIANG, Sheng-Feng WENG, Ming-Yu YEN, Cheyu LIU, Hung-Chih CHEN, Yi-Yang LEI, Ching-Hua HSIEH
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Publication number: 20240105642Abstract: A method of manufacturing a package structure at least includes the following steps. An encapsulant laterally is formed to encapsulate the die and the plurality of through vias. A plurality of first connectors are formed to electrically connect to first surfaces of the plurality of through vias. A warpage control material is formed over the die, wherein the warpage control material is disposed to cover an entire surface of the die. A protection material is formed over the encapsulant and around the plurality of first connectors and the warpage control material. A coefficient of thermal expansion of the protection material is less than a coefficient of thermal expansion of the encapsulant.Type: ApplicationFiled: November 29, 2023Publication date: March 28, 2024Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Hao-Jan Pei, Ching-Hua Hsieh, Hsiu-Jen Lin, Wei-Yu Chen, Chia-Shen Cheng, Chih-Chiang Tsao, Jen-Jui Yu, Cheng-Shiuan Wong
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Patent number: 11942464Abstract: In an embodiment, a method includes: aligning a first package component with a second package component, the first package component having a first region and a second region, the first region including a first conductive connector, the second region including a second conductive connector; performing a first laser shot on a first portion of a top surface of the first package component, the first laser shot reflowing the first conductive connector of the first region, the first portion of the top surface of the first package component completely overlapping the first region; and after performing the first laser shot, performing a second laser shot on a second portion of the top surface of the first package component, the second laser shot reflowing the second conductive connector of the second region, the second portion of the top surface of the first package component completely overlapping the second region.Type: GrantFiled: July 19, 2021Date of Patent: March 26, 2024Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Hao-Jan Pei, Hsiu-Jen Lin, Wei-Yu Chen, Philip Yu-Shuan Chung, Chia-Shen Cheng, Kuei-Wei Huang, Ching-Hua Hsieh, Chung-Shi Liu, Chen-Hua Yu
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Publication number: 20240092415Abstract: An HOD device, comprising: a framework; covering material, covering the frame work; at least one conductive region, provided on or in the covering material; wherein the conductive region is coupled to a capacitance detection circuit or a predetermined voltage level. The HOD device can be a vehicle control device such as a steering wheel. The conductive region comprises conductive wires which can be threads of the covering material. By this way, the arrangements of the conductive wires can be changed corresponding to the size or the shape of the frame work or any other requirements. Also, the interference caused by unstable factors can be improved since the conductive wires can be coupled to a ground source of the vehicle to provide a short capacitance sensing path.Type: ApplicationFiled: September 21, 2022Publication date: March 21, 2024Applicant: PixArt Imaging Inc.Inventors: Chin-Hua Hu, Ching-Shun Chen, Yu-Han Chen, Yu-Sheng Lin
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Patent number: 11935826Abstract: A method includes depositing a first passivation layer over a conductive feature, wherein the first passivation layer has a first dielectric constant, forming a capacitor over the first passivation layer, and depositing a second passivation layer over the capacitor, wherein the second passivation layer has a second dielectric constant greater than the first dielectric constant. The method further includes forming a redistribution line over and electrically connecting to the capacitor, depositing a third passivation layer over the redistribution line, and forming an Under-Bump-Metallurgy (UBM) penetrating through the third passivation layer to electrically connect to the redistribution line.Type: GrantFiled: March 10, 2021Date of Patent: March 19, 2024Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Chia-Ming Huang, Ming-Da Cheng, Songbor Lee, Jung-You Chen, Ching-Hua Kuan, Tzy-Kuang Lee
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Publication number: 20240088062Abstract: A package structure includes a die, an encapsulant laterally encapsulating the die, a warpage control material disposed over the die, and a protection material disposed over the encapsulant and around the warpage control material. A coefficient of thermal expansion of the protection material is less than a coefficient of thermal expansion of the encapsulant.Type: ApplicationFiled: November 23, 2023Publication date: March 14, 2024Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Hao-Jan Pei, Ching-Hua Hsieh, Hsiu-Jen Lin, Wei-Yu Chen, Chia-Shen Cheng, Chih-Chiang Tsao, Jen-Jui Yu, Cheng-Shiuan Wong
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Patent number: 11925035Abstract: A hybrid random access memory for a system-on-chip (SOC), including a semiconductor substrate with a MRAM region and a ReRAM region, a first dielectric layer on the semiconductor substrate, multiple ReRAM cells in the first dielectric layer on the ReRAM region, a second dielectric layer above the first dielectric layer, and multiple MRAM cells in the second dielectric layer on the MRAM region.Type: GrantFiled: October 26, 2022Date of Patent: March 5, 2024Assignee: UNITED MICROELECTRONICS CORP.Inventors: Po-Kai Hsu, Hui-Lin Wang, Ching-Hua Hsu, Yi-Yu Lin, Ju-Chun Fan, Hung-Yueh Chen
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Publication number: 20240071953Abstract: A memory device including a base semiconductor die, conductive terminals, memory dies, an insulating encapsulation and a buffer cap is provided. The conductive terminals are disposed on a first surface of the base semiconductor die. The memory dies are stacked over a second surface of the base semiconductor die, and the second surface of the base semiconductor die is opposite to the first surface of the base semiconductor die. The insulating encapsulation is disposed on the second surface of the base semiconductor die and laterally encapsulates the memory dies. The buffer cap covers the first surface of the base semiconductor die, sidewalls of the base semiconductor die and sidewalls of the insulating encapsulation. A package structure including the above- mentioned memory device is also provided.Type: ApplicationFiled: November 6, 2023Publication date: February 29, 2024Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Kai-Ming Chiang, Chao-wei Li, Wei-Lun Tsai, Chia-Min Lin, Yi-Da Tsai, Sheng-Feng Weng, Yu-Hao Chen, Sheng-Hsiang Chiu, Chih-Wei Lin, Ching-Hua Hsieh
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Publication number: 20240071954Abstract: A memory device including a base semiconductor die, conductive terminals, memory dies, an insulating encapsulation and a buffer cap is provided. The conductive terminals are disposed on a first surface of the base semiconductor die. The memory dies are stacked over a second surface of the base semiconductor die, and the second surface of the base semiconductor die is opposite to the first surface of the base semiconductor die. The insulating encapsulation is disposed on the second surface of the base semiconductor die and laterally encapsulates the memory dies. The buffer cap covers the first surface of the base semiconductor die, sidewalls of the base semiconductor die and sidewalls of the insulating encapsulation. A package structure including the above-mentioned memory device is also provided.Type: ApplicationFiled: November 9, 2023Publication date: February 29, 2024Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Kai-Ming Chiang, Chao-wei Li, Wei-Lun Tsai, Chia-Min Lin, Yi-Da Tsai, Sheng-Feng Weng, Yu-Hao Chen, Sheng-Hsiang Chiu, Chih-Wei Lin, Ching-Hua Hsieh
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Patent number: 11593722Abstract: A method for planning under uncertainty is disclosed. The method includes steps of processing a stochastic programming formulation based on forecast values of at least one of product and service configurations, and determining a resource requirements plan for one or more planning periods in a non-deterministic bill of resources of at least two levels.Type: GrantFiled: December 19, 2007Date of Patent: February 28, 2023Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Markus Ettl, Ching-Hua Chen-Ritzo, John P. Fasano, Aliza Rivka Heching, Karthik Sourirajan, Robert J. Wittrock
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Patent number: 11521724Abstract: A mechanism is provided in a data processing system to implement a personalized patient engagement engine.Type: GrantFiled: October 4, 2019Date of Patent: December 6, 2022Assignee: International Business Machines CorporationInventors: Subhro Das, Gema Almoguera, Kenneth J. Barker, Ching-Hua Chen, Adam R. Faulkner, Pei-Yun Hsueh, Chandramouli Maduri, Sara Rosenthal
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Patent number: 11362099Abstract: A non-volatile memory device includes a substrate, a stacked structure, an anti-fuse gate, a gate dielectric layer, a first doping region, and a second doping region. The stacked structure is formed on the substrate and includes a floating gate, a select logic gate, a logic gate dielectric layer, and an inter-polysilicon layer dielectric layer. The select logic gate is disposed on the floating gate, the logic gate dielectric layer is disposed between the floating gate and the substrate, and the inter-polysilicon layer dielectric layer is disposed between the floating gate and the select logic gate. The anti-fuse gate is disposed on the substrate, and the gate dielectric layer is disposed between the anti-fuse gate and the substrate. The first doping region is formed in the substrate at one side of the floating gate. The second doping region is formed in the substrate between the floating gate and the anti-fuse gate.Type: GrantFiled: May 8, 2020Date of Patent: June 14, 2022Assignee: Powerchip Semiconductor Manufacturing CorporationInventors: Ching-Hua Chen, Bing-Chen Ji, Shun-Tsung Yu, Ming-Yuan Lin, Han-Chao Lai, Jih-Wen Chou, Chen-Chiu Hsue
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Patent number: 11228613Abstract: An aspect includes querying, by a processor, a plurality of model data from a distributed data source based at least in part on one or more user characteristics. A plurality of sensor data is gathered associated with a condition of a user. A policy is generated including an end goal and one or more sub-goals based at least in part on the model data and the sensor data. The policy is iteratively adapted based at least in part on one or more detected changes in the sensor data collected over a period of time to adjust at least one of the one or more sub-goals. The policy and the one or more sub-goals are provided to the user.Type: GrantFiled: May 22, 2017Date of Patent: January 18, 2022Assignee: INTERNATIONAL BUSINESS MACHINES CORPORATIONInventors: Hung-Yang Chang, Ching-Hua Chen, James V. Codella, Pei-Yun Hsueh, Xinyu Hu
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Patent number: 11195743Abstract: A stage for supporting a semiconductor substrate is disclosed. The stage includes a platform that defines a plurality of apertures, and a plurality of burls that protrude from the apertures, where the plurality of burls have support surfaces for supporting a region of the semiconductor substrate. The stage includes an actuator coupled to at least a first burl included in the plurality of burls, wherein the actuator is operable to adjust an elevation of a first support surface of the first burl relative to the platform, and control circuitry that controls operation of the actuator to establish a substantially-planar alignment of the support surface of the first burl with a support surface of at least a second burl included in the plurality of burls.Type: GrantFiled: July 17, 2020Date of Patent: December 7, 2021Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LIMITEDInventors: Ching-Hua Chen, Kai-Fa Ho
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Patent number: 11132920Abstract: A system provides an intervention for a user and comprises at least one processor. The system monitors behavior and context of a user to generate a behavior history. One or more models are utilized to determine an intervention for the user to induce a behavior modification, wherein the one or more models map interventions to user context and behavior and utilize the behavior history to determine an effective intervention for the user. The intervention is provided to the user and feedback is received in response to the intervention. The one or more models are updated based on the feedback. Embodiments of the present invention further include a method and computer program product for providing an intervention to a user in substantially the same manner described above.Type: GrantFiled: December 20, 2017Date of Patent: September 28, 2021Assignee: International Business Machines CorporationInventors: Marie Angelopoulos, Shahram Ebadollahi, Stewart T. Sill, Michal Rosen-Zvi, Ching-Hua Chen, James V. Codella, Si Sun
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Publication number: 20210265368Abstract: A non-volatile memory device includes a substrate, a stacked structure, an anti-fuse gate, a gate dielectric layer, a first doping region, and a second doping region. The stacked structure is formed on the substrate and includes a floating gate, a select logic gate, a logic gate dielectric layer, and an inter-polysilicon layer dielectric layer. The select logic gate is disposed on the floating gate, the logic gate dielectric layer is disposed between the floating gate and the substrate, and the inter-polysilicon layer dielectric layer is disposed between the floating gate and the select logic gate. The anti-fuse gate is disposed on the substrate, and the gate dielectric layer is disposed between the anti-fuse gate and the substrate. The first doping region is formed in the substrate at one side of the floating gate. The second doping region is formed in the substrate between the floating gate and the anti-fuse gate.Type: ApplicationFiled: May 8, 2020Publication date: August 26, 2021Applicant: Powerchip Semiconductor Manufacturing CorporationInventors: Ching-Hua Chen, Bing-Chen Ji, Shun-Tsung Yu, Ming-Yuan Lin, Han-Chao Lai, Jih-Wen Chou, Chen-Chiu Hsue