Patents by Inventor Chingwen Yeh

Chingwen Yeh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8058182
    Abstract: Method and device for forming a membrane includes providing a glass substrate, and depositing a thin layer of chromium on the glass substrate. The thin layer of chromium is patterned to form a deflection electrode and interconnect leads. A sacrificial layer of aluminum is deposited on top of the patterned chromium layer, then the sacrificial layer is patterned to define anchor regions. On top of the sacrificial layer, a thick layer of chromium is deposited, and the thick layer of chromium is patterned to form a membrane. The sacrificial layer is then etched to release the membrane.
    Type: Grant
    Filed: July 1, 2009
    Date of Patent: November 15, 2011
    Assignee: Xerox Corporation
    Inventors: Chingwen Yeh, James B. Boyce, Kathleen Boyce, legal representative, Jingkuang Chen, Feixia Pan, Joel A. Kubby
  • Publication number: 20110003405
    Abstract: Method and device for forming a membrane includes providing a glass substrate, and depositing a thin layer of chromium on the glass substrate. The thin layer of chromium is patterned to form a deflection electrode and interconnect leads. A sacrificial layer of aluminum is deposited on top of the patterned chromium layer, then the sacrificial layer is patterned to define anchor regions. On top of the sacrificial layer, a thick layer of chromium is deposited, and the thick layer of chromium is patterned to form a membrane. The sacrificial layer is then etched to release the membrane.
    Type: Application
    Filed: July 1, 2009
    Publication date: January 6, 2011
    Applicant: XEROX CORPORATION
    Inventors: Chingwen Yeh, James B. Boyce, Kathleen Boyce, Jingkuang Chen, Feixia Pan, Joel A. Kubby
  • Patent number: 6532093
    Abstract: A micro-optical-electrical-mechanical laser scanner is configured from a silicon-on-insulator substrate having a silicon substrate layer, a buried oxide layer, and a single crystal silicon device layer. A first device layer portion having a micro-mirror fabricated therefrom. A laser is connected to a second device layer portion, and a hinge connects the first device layer portion and the second device layer portion. The hinge is formed with a bimorph material, wherein the bimorph material creates built-in stresses in the hinge. The bimorph hinge moves the released micro-mirror out of the horizontal plane to a position for either directly or indirectly reflecting laser light emitted from the laser.
    Type: Grant
    Filed: December 6, 2000
    Date of Patent: March 11, 2003
    Assignee: Xerox Corporation
    Inventors: Decai Sun, Michel A. Rosa, Chingwen Yeh
  • Publication number: 20020067533
    Abstract: A micro-optical-electrical-mechanical laser scanner is configured from a silicon-on-insulator substrate having a silicon substrate layer, a buried oxide layer, and a single crystal silicon device layer. A first device layer portion having a micro-mirror fabricated therefrom. A laser is connected to a second device layer portion, and a hinge connects the first device layer portion and the second device layer portion. The hinge is formed with a bimorph material, wherein the bimorph material creates built-in stresses in the hinge. The bimorph hinge moves the released micro-mirror out of the horizontal plane to a position for either directly or indirectly reflecting laser light emitted from the laser.
    Type: Application
    Filed: December 6, 2000
    Publication date: June 6, 2002
    Applicant: XEROX CORPORATION
    Inventors: Decai Sun, Michel A. Rosa, Chingwen Yeh