Patents by Inventor Chinteong Lim

Chinteong Lim has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for Exposing an Area on a Substrate to a Beam and Photolithographic System
    Publication number: 20140204355
    Abstract: Embodiments of the invention describe a method for exposing an area on a substrate to a beam. The method includes adjusting a focus offset of the beam with respect to the area on the substrate, tilting the beam or tilting the substrate, and exposing the area on the substrate with the beam, thereby generating locations within the area exposed with different foci. Furthermore embodiments describe computer programs for controlling a photolithographic system to do the same and a photolithographic system for doing the same.
    Type: Application
    Filed: March 25, 2014
    Publication date: July 24, 2014
    Applicant: Infineon Technologies AG
    Inventors: Vlad Temchenko, Chinteong Lim, Jens Schneider, Yves Fabien Rody
  • Method for exposing an area on a substrate to a beam and photolithographic system
    Patent number: 8715910
    Abstract: Embodiments of the invention describe a method for exposing an area on a substrate to a beam. The method includes adjusting a focus offset of the beam with respect to the area on the substrate, tilting the beam or tilting the substrate, and exposing the area on the substrate with the beam, thereby generating locations within the area exposed with different foci. Furthermore embodiments describe computer programs for controlling a photolithographic system to do the same and a photolithographic system for doing the same.
    Type: Grant
    Filed: August 14, 2008
    Date of Patent: May 6, 2014
    Assignee: Infineon Technologies AG
    Inventors: Vlad Temchenko, Chinteong Lim, Jens Schneider, Yves Fabien Rody
  • Method for Exposing an Area on a Substrate to a Beam and Photolithographic System
    Publication number: 20100040987
    Abstract: Embodiments of the invention describe a method for exposing an area on a substrate to a beam. The method includes adjusting a focus offset of the beam with respect to the area on the substrate, tilting the beam or tilting the substrate, and exposing the area on the substrate with the beam, thereby generating locations within the area exposed with different foci. Furthermore embodiments describe computer programs for controlling a photolithographic system to do the same and a photolithographic system for doing the same.
    Type: Application
    Filed: August 14, 2008
    Publication date: February 18, 2010
    Inventors: Vlad Temchenko, Chinteong Lim, Jens Schneider