Patents by Inventor Chit Yiu Chan

Chit Yiu Chan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20180327908
    Abstract: Provided is a cyanide-free non-electrolytic gold plating solution including a specific nitrile compound. The plating solution is sustainable and showed good bath stability and plating performance.
    Type: Application
    Filed: December 18, 2015
    Publication date: November 15, 2018
    Inventors: Lingli DUAN, Chen CHEN, Kitho TONG, Chit Yiu CHAN, Kwok Wai Dennis YEE
  • Patent number: 10066299
    Abstract: A solution including a precious metal nanoparticle and a polymer polymerized from at least two monomers, (1) a monomer having two or more carboxyl groups or carboxyl acid salt groups and (2) a monomer which has ? electron-available features. The solution is useful for a catalyst of a process for electroless plating a metal on non-conductive surface.
    Type: Grant
    Filed: February 24, 2013
    Date of Patent: September 4, 2018
    Assignee: ROHM AND HAAS ELECTRONIC MATERIALS LLC
    Inventors: Suk Kwan Kwong, Weijuan Zhou, Wenjia Zhou, Dennis Chit Yiu Chan, Dennis Kwok-Wai Yee
  • Patent number: 9970114
    Abstract: Shielding coatings are applied to polymer substrates for selective metallization of the substrates. The shielding coatings include a primer component and a hydrophobic top coat. The primer is first applied to the polymer substrate followed by application of the top coat component. The shielding coating is then selectively etched to form an outline of a desired current pattern. A catalyst is applied to the patterned polymer substrate followed by electroless metal plating in the etched portions. The portions of the polymer substrate which contain the shielding coating inhibit electroless metal plating. The primers contain polyamines and the top coat contains hydrophobic alky organic compounds.
    Type: Grant
    Filed: September 13, 2016
    Date of Patent: May 15, 2018
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Hung Tat Chan, Ka Ming Yip, Chit Yiu Chan, Kwok Wai Yee
  • Publication number: 20180073149
    Abstract: Shielding coatings are applied to polymer substrates for selective metallization of the substrates. The shielding coatings include a primer component and a hydrophobic top coat. The primer is first applied to the polymer substrate followed by application of the top coat component. The shielding coating is then selectively etched to form an outline of a desired current pattern. A catalyst is applied to the patterned polymer substrate followed by electroless metal plating in the etched portions. The portions of the polymer substrate which contain the shielding coating inhibit electroless metal plating. The primers contain polyamines and the top coat contains hydrophobic alky organic compounds.
    Type: Application
    Filed: September 13, 2016
    Publication date: March 15, 2018
    Inventors: Hung Tat Chan, Ka Ming Yip, Chit Yiu Chan, Kwok Wai Yee
  • Patent number: 9850578
    Abstract: Shielding coatings are applied to polymer substrates for selective metallization of the substrates. The shielding coatings include a primer component and a hydrophobic top coat. The primer is first applied to the polymer substrate followed by application of the top coat component. The shielding coating is then selectively etched to form an outline of a desired current pattern. A catalyst is applied to the patterned polymer substrate followed by electroless metal plating in the etched portions. The portions of the polymer substrate which contain the shielding coating inhibit electroless metal plating. The primers contain five-membered heterocyclic nitrogen compounds and the top coat contains hydrophobic alky organic compounds.
    Type: Grant
    Filed: September 13, 2016
    Date of Patent: December 26, 2017
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Hung Tat Chan, Ka Ming Yip, Chit Yiu Chan, Kwok Wai Yee
  • Patent number: 9797043
    Abstract: Shielding coatings are applied to polymer substrates for selective metallization of the substrates. The shielding coatings include a primer component and a hydrophobic top coat. The primer is first applied to the polymer substrate followed by application of the top coat component. The shielding coating is then selectively etched to form an outline of a desired current pattern. A catalyst is applied to the patterned polymer substrate followed by electroless metal plating in the etched portions. The portions of the polymer substrate which contain the shielding coating inhibit electroless metal plating. The primers contain aromatic heterocyclic compounds and the top coat contains hydrophobic alky organic compounds.
    Type: Grant
    Filed: September 13, 2016
    Date of Patent: October 24, 2017
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Hung Tat Chan, Ka Ming Yip, Chit Yiu Chan, Kwok Wai Yee
  • Publication number: 20170183783
    Abstract: A method for selective deposition of an organic solderability preservative coating on a copper surface of an article is disclosed. The method includes two steps of organic coatings by two solutions; the first step contains contacting the copper surface with a first solution including azole compound and the second step contains contacting the copper surface treated by the first solution with a second solution including a specific pyrazine derived compound.
    Type: Application
    Filed: December 12, 2016
    Publication date: June 29, 2017
    Inventors: Qin Tang, Kit Ho Tong, Chit Yiu Chan, Kwok Wai Yee
  • Publication number: 20170181292
    Abstract: A method for forming an organic coating on a surface of nickel or nickel alloy is disclosed. The method includes contacting the nickel surface with a composition comprising a specific pyrazine derived compound to prevent corrosion of nickel without forming known gold emersion film on the surface of the nickel.
    Type: Application
    Filed: December 12, 2016
    Publication date: June 22, 2017
    Inventors: Qin Tang, Kit Ho Tong, Chit Yiu Chan, Kowk-Wai Yee
  • Publication number: 20170152600
    Abstract: A solution including a precious metal nanoparticle and a polymer polymerized from at least two monomers, (1) a monomer having two or more carboxyl groups or carboxyl acid salt groups and (2) a monomer which has ? electron-available features. The solution is useful for a catalyst of a process for electroless plating a metal on non-conductive surface.
    Type: Application
    Filed: January 5, 2017
    Publication date: June 1, 2017
    Inventors: SUK KWAN KWONG, Weijuan ZHOU, Wenjia ZHOU, Dennis Chit Yiu CHAN, Dennis Kwok-Wai YEE
  • Patent number: 9228262
    Abstract: A catalyst solution includes a precious metal nanoparticle and a polymer having a carboxyl group and a nitrogen atom. The catalyst solution is useful for a catalyzing an electroless process for plating metal on non-conductive surfaces.
    Type: Grant
    Filed: June 16, 2015
    Date of Patent: January 5, 2016
    Inventors: Wenjia Zhou, Suk Kwan Kwong, Chit Yiu Chan, Kwok-Wai Yee
  • Patent number: 9227182
    Abstract: A solution including a precious metal nanoparticle and a polymer polymerized from a monomer comprising at least a monomer having two or more carboxyl groups or carboxylic acid salt groups. The solution is useful for a catalyst for a process of electroless plating of a metal on non-conductive surface.
    Type: Grant
    Filed: December 31, 2012
    Date of Patent: January 5, 2016
    Inventors: Wenjia Zhou, Suk Kwan Kwong, Dennis Chit Yiu Chan, Dennis Kwok Wai Yee, Weijuan Zhou
  • Publication number: 20150284858
    Abstract: A catalyst solution includes a precious metal nanoparticle and a polymer having a carboxyl group and a nitrogen atom. The catalyst solution is useful for a catalyzing an electroless process for plating metal on non-conductive surfaces.
    Type: Application
    Filed: June 16, 2015
    Publication date: October 8, 2015
    Inventors: Wenjia Zhou, Suk Kwan Kwong, Chit Yiu Chan, Kwok-Wai Yee
  • Patent number: 9149798
    Abstract: A catalyst solution includes a precious metal nanoparticle and a polymer having a carboxyl group and a nitrogen atom. The catalyst solution is useful for a catalyzing an electroless process for plating metal on non-conductive surfaces.
    Type: Grant
    Filed: December 31, 2012
    Date of Patent: October 6, 2015
    Inventors: Wenjia Zhou, Suk Kwan Kwong, Dennis Chit Yiu Chan, Dennis Kwok Wai Yee
  • Patent number: 8961678
    Abstract: An organic solderability preservative solution includes pyrazine derivatives which inhibit corrosion of metal. The solution is applied to metal surfaces of components for electronic apparatus to improve solderability of electrical connections between the components in the electronic apparatus.
    Type: Grant
    Filed: December 20, 2012
    Date of Patent: February 24, 2015
    Assignee: Rohm and Haas Electronic Materials LLC
    Inventors: Qin Tang, Kit Ho Tong, Chit Yiu Chan, Martin W. Bayes
  • Publication number: 20140242287
    Abstract: A solution including a precious metal nanoparticle and a polymer polymerized from at least two monomers, (1) a monomer having two or more carboxyl groups or carboxyl acid salt groups and (2) a monomer which has ? electron-available features. The solution is useful for a catalyst of a process for electroless plating a metal on non-conductive surface.
    Type: Application
    Filed: February 24, 2013
    Publication date: August 28, 2014
    Applicant: ROHM AND HAAS ELECTRONIC MATERIALS LLC
    Inventors: Suk Kwan KWONG, Weijuan ZHOU, Wenjia ZHOU, Dennis Chit Yiu CHAN, Dennis Kwok-Wai YEE
  • Publication number: 20140174322
    Abstract: An organic solderability preservative solution includes pyrazine derivatives which inhibit corrosion of metal. The solution is applied to metal surfaces of components for electronic apparatus to improve solderability of electrical connections between the components in the electronic apparatus.
    Type: Application
    Filed: December 20, 2012
    Publication date: June 26, 2014
    Applicant: ROHM AND HAAS ELECTRONIC MATERIALS LLC
    Inventors: Qin TANG, Kit Ho TONG, Chit Yiu CHAN, Martin W. BAYES
  • Patent number: 6902716
    Abstract: The present invention deals with the generation of sharp single crystal diamond tips and the arrays of these tips, and their fabrication technology. The invention combines the deposition of synthetic diamond films with reactive etching processes. Upon the diamond orientation prepared and reactive etching environment with considerable directivity of ions, single crystal diamond tips with different apical angles can be fabricated. Very sharp diamond tips with an apical angle of no more than about 28° and a tip radius smaller than 50 nm are fabricated on pyramidal-shaped [001]-textured diamond films by subsequent reactive etching., The technology is based on selective etching of sp2- and sp3- hybridized carbons by the activated constituents of an etching environment, in particular based on atomic hydrogen, in a way similar to ion bombardment, which contributes to overall etching and local conversion of diamond to graphitic phase promoting further etching with chemically activated species.
    Type: Grant
    Filed: October 29, 2002
    Date of Patent: June 7, 2005
    Assignee: City University of Hong Kong
    Inventors: Shuit-Tong Lee, Igor Bello, Wenjun Zhang, Chit Yiu Chan
  • Publication number: 20040079280
    Abstract: The present invention deals with the generation of sharp single crystal diamond tips and the arrays of these tips, and their fabrication technology. The invention combines the deposition of synthetic diamond films with reactive etching processes. Upon the diamond orientation prepared and reactive etching environment with considerable directivity of ions, single crystal diamond tips with different apical angles can be fabricated. Very sharp diamond tips with an apical angle of no more than about 28° and a tip radius smaller than 50 nm are fabricated on pyramidal-shaped [001]-textured diamond films by subsequent reactive etching., The technology is based on selective etching of sp2- and sp3- hybridized carbons by the activated constituents of an etching environment, in particular based on atomic hydrogen, in a way similar to ion bombardment, which contributes to overall etching and local conversion of diamond to graphitic phase promoting further etching with chemically activated species.
    Type: Application
    Filed: October 29, 2002
    Publication date: April 29, 2004
    Inventors: Shuit-Tong Lee, Igor Bello, Wenjun Zhang, Chit Yiu Chan