Patents by Inventor Chitoshi Shimakawa

Chitoshi Shimakawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11254783
    Abstract: A xylylenediisocyanate composition including xylylenediisocyanate and a compound represented by Chemical Formula (1) below, wherein 0.
    Type: Grant
    Filed: February 25, 2020
    Date of Patent: February 22, 2022
    Assignee: MITSUI CHEMICALS, INC.
    Inventors: Satoshi Yamasaki, Daisuke Hasegawa, Hirokazu Morita, Hideaki Otsuka, Tatsuya Nakashima, Chitoshi Shimakawa, Shigetoshi Kuma, Masaaki Sasaki
  • Patent number: 10844010
    Abstract: In a process for producing a (poly) sulfide compound represented by General Formula (2) of the present invention, thiol compounds represented by General Formula (1) are reacted with each other in the presence of a basic compound represented by General Formula (4) or General Formula (5) and sulfur.
    Type: Grant
    Filed: March 17, 2017
    Date of Patent: November 24, 2020
    Assignee: MITSUI CHEMICALS, INC.
    Inventors: Koichi Tokunaga, Chitoshi Shimakawa, Shigetoshi Kuma, Masaru Kawaguchi
  • Publication number: 20200190249
    Abstract: A xylylenediisocyanate composition including xylylenediisocyanate and a compound represented by Chemical Formula (1) below, wherein 0.
    Type: Application
    Filed: February 25, 2020
    Publication date: June 18, 2020
    Inventors: Satoshi YAMASAKI, Daisuke HASEGAWA, Hirokazu MORITA, Hideaki OTSUKA, Tatsuya NAKASHIMA, Chitoshi SHIMAKAWA, Shigetoshi KUMA, Masaaki SASAKI
  • Patent number: 10640605
    Abstract: A xylylenediisocyanate composition including xylylenediisocyanate and a compound represented by Chemical Formula (1) below, wherein 0.
    Type: Grant
    Filed: April 9, 2018
    Date of Patent: May 5, 2020
    Assignee: MITSUI CHEMICALS, INC.
    Inventors: Satoshi Yamasaki, Daisuke Hasegawa, Hirokazu Morita, Hideaki Otsuka, Tatsuya Nakashima, Chitoshi Shimakawa, Shigetoshi Kuma, Masaaki Sasaki
  • Publication number: 20190292304
    Abstract: A xylylenediisocyanate composition including xylylenediisocyanate and a compound represented by Chemical Formula (1) below, wherein 0.
    Type: Application
    Filed: April 9, 2018
    Publication date: September 26, 2019
    Inventors: Satoshi YAMASAKI, Daisuke HASEGAWA, Hirokazu MORITA, Hideaki OTSUKA, Tatsuya NAKASHIMA, Chitoshi SHIMAKAWA, Shigetoshi KUMA, Masaaki SASAKI
  • Publication number: 20190077751
    Abstract: In a process for producing a (poly) sulfide compound represented by General Formula (2) of the present invention, thiol compounds represented by General Formula (1) are reacted with each other in the presence of a basic compound represented by General Formula (4) or General Formula (5) and sulfur.
    Type: Application
    Filed: March 17, 2017
    Publication date: March 14, 2019
    Applicant: MITSUI CHEMICALS, INC.
    Inventors: Koichi Tokunaga, Chitoshi Shimakawa, Shigetoshi Kuma, Masaru Kawaguchi
  • Patent number: 9708260
    Abstract: A method for producing meta-xylylenediamines includes a reaction step in which monohalogenated benzenes, formaldehydes, and an amide compound having a primary amide group or a secondary amide group are allowed to react in the presence of an acidic liquid, a dehalogenation step in which the halogen atom derived from the monohalogenated benzenes is replaced with a hydrogen atom, and a deprotection step in which the primary amide group or the secondary amide group derived from the amide compound is converted to an amino group. In the reaction step, the acidic liquid contains inorganic acid, the equivalent ratio of the hydrogen atom of the inorganic acid relative to the monohalogenated benzenes is more than 16; the acidic liquid has an inorganic acid concentration of more than 80 mass %; and the reaction temperature is more than 40° C.
    Type: Grant
    Filed: August 11, 2014
    Date of Patent: July 18, 2017
    Assignee: MITSUI CHEMICALS INC.
    Inventors: Kouya Kojima, Hidetaka Tsukada, Mamoru Takashina, Chitoshi Shimakawa, Naoyuki Kakinuma
  • Patent number: 9670148
    Abstract: A method for producing meta-xylylenediisocyanates includes a reaction step in which monohalogenated benzenes, formaldehydes, and an amide compound represented by general formula (1) below are allowed to react in the presence of an acidic liquid to produce a bisamide compound; a dehalogenation step in which in the bisamide compound, the halogen atom derived from the monohalogenated benzenes is replaced with a hydrogen atom; and a thermal decomposition step in which the bisamide compound from which the halogen atom is eliminated is subjected to thermal decomposition. In the reaction step, the acidic liquid contains inorganic acid, the equivalent ratio of the hydrogen atom of the inorganic acid relative to the monohalogenated benzenes is more than 14, the acidic liquid has an inorganic acid concentration of more than 90 mass %, and the reaction temperature is more than 10° C. General formula (1): wherein R1 represents an alkoxy group or an amino group.
    Type: Grant
    Filed: August 11, 2014
    Date of Patent: June 6, 2017
    Assignee: MITSUI CHEMICALS, INC.
    Inventors: Kouya Kojima, Hidetaka Tsukada, Mamoru Takashina, Chitoshi Shimakawa, Naoyuki Kakinuma
  • Publication number: 20160185722
    Abstract: A method for producing meta-xylylenediamines includes a reaction step in which monohalogenated benzenes, formaldehydes, and an amide compound having a primary amide group or a secondary amide group are allowed to react in the presence of an acidic liquid, a dehalogenation step in which the halogen atom derived from the monohalogenated benzenes is replaced with a hydrogen atom, and a deprotection step in which the primary amide group or the secondary amide group derived from the amide compound is converted to an amino group. In the reaction step, the acidic liquid contains inorganic acid, the equivalent ratio of the hydrogen atom of the inorganic acid relative to the monohalogenated benzenes is more than 16; the acidic liquid has an inorganic acid concentration of more than 80 mass %; and the reaction temperature is more than 40° C.
    Type: Application
    Filed: August 11, 2014
    Publication date: June 30, 2016
    Applicant: MITSUI CHEMICALS, INC.
    Inventors: Kouya KOJIMA, Hidetaka TSUKADA, Mamoru TAKASHINA, Chitoshi SHIMAKAWA, Naoyuki KAKINUMA
  • Publication number: 20160145201
    Abstract: A method for producing meta-xylylenediisocyanates includes a reaction step in which monohalogenated benzenes, formaldehydes, and an amide compound represented by general formula (1) below are allowed to react in the presence of an acidic liquid to produce a bisamide compound; a dehalogenation step in which in the bisamide compound, the halogen atom derived from the monohalogenated benzenes is replaced with a hydrogen atom; and a thermal decomposition step in which the bisamide compound from which the halogen atom is eliminated is subjected to thermal decomposition. In the reaction step, the acidic liquid contains inorganic acid, the equivalent ratio of the hydrogen atom of the inorganic acid relative to the monohalogenated benzenes is more than 14, the acidic liquid has an inorganic acid concentration of more than 90 mass %, and the reaction temperature is more than 10° C. General formula (1): wherein R1 represents an alkoxy group or an amino group.
    Type: Application
    Filed: August 11, 2014
    Publication date: May 26, 2016
    Applicant: MITSUI CHEMICALS, INC.
    Inventors: Kouya KOJIMA, Hidetaka TSUKADA, Mamoru TAKASHINA, Chitoshi SHIMAKAWA, Naoyuki KAKINUMA
  • Patent number: 9227925
    Abstract: A process for producing an aldehyde compound of the invention comprising: reacting a compound represented by the following formula (a1) or (a2) with a hydrogen and a carbon monoxide in a presence of a compound containing a metal belonging to Groups 8 to 10 and a phosphorous compound so as to satisfy the following conditions (1) and (2) to synthesize an aldehyde compound; wherein the condition (1) is that a content of a metal included in the compound containing a metal belonging to Groups 8 to 10 is 0.
    Type: Grant
    Filed: May 7, 2012
    Date of Patent: January 5, 2016
    Assignee: MITSUI CHEMICALS, INC.
    Inventors: Shigetoshi Kuma, Michiharu Sakata, Kouichi Tokunaga, Chitoshi Shimakawa, Naoyuki Kakinuma, Masayuki Furuya, Mamoru Tanaka
  • Publication number: 20140088321
    Abstract: A process for producing an aldehyde compound of the invention comprising: reacting a compound represented by the following formula (a1) or (a2) with a hydrogen and a carbon monoxide in a presence of a compound containing a metal belonging to Groups 8 to 10 and a phosphorous compound so as to satisfy the following conditions (1) and (2) to synthesize an aldehyde compound; wherein the condition (1) is that a content of a metal included in the compound containing a metal belonging to Groups 8 to 10 is 0.
    Type: Application
    Filed: May 7, 2012
    Publication date: March 27, 2014
    Applicant: Mitsui Chemicals, Inc.
    Inventors: Shigetoshi Kuma, Michiharu Sakata, Kouichi Tokunaga, Chitoshi Shimakawa, Naoyuki Kakinuma, Masayuki Furuya, Mamoru Tanaka
  • Patent number: 8183407
    Abstract: An isocyanate has been widely used as a starting material for the production of a polyurethane material, a polyisocyanurate material or the like which is suitably applicable to the field of optical materials. Disclosed is a process for producing an isocyanate which includes a step for producing the isocyanate in the form of a hydrochloride with improved productivity. A process for producing a linear or cyclic aliphatic isocyanate comprising the step of reacting a linear or cyclic aliphatic amine with hydrogen chloride to yield a hydrochloride of the linear or cyclic aliphatic amine, the step being performed under a pressure higher by 0.01 MPa or more than the atmospheric pressure.
    Type: Grant
    Filed: July 20, 2006
    Date of Patent: May 22, 2012
    Assignee: Mitsui Chemicals, Inc.
    Inventors: Chitoshi Shimakawa, Hiroyuki Morijiri, Hidetoshi Hayashi, Norihiko Fukatsu, Seiichi Kobayashi, Homare Yumoto, Junichi Ishiyama, Shinya Tsuchiyama
  • Patent number: 8183404
    Abstract: The present invention is to provide a process for producing dicyanonorbornane characterized by causing hydrogen cyanide to undergo addition reaction with cyanonorbornene (bicyclo[2.2.1]-5-heptene-2-carbonitrile) in the presence of a zerovalent nickel complex catalyst which is produced by using a phosphite represented by P(x)(y)(z) (wherein P is a phosphorus atom, and x, y and z are each OR, where R represents an aryl group having not more than 18 carbon atoms) as a ligand to reduce a nickel halide with at least one metal selected among zinc, cadmium, beryllium, aluminum, iron and cobalt, wherein the phosphite is one which has a phosphate content of 1.0 weight % or lower based on the whole phosphite.
    Type: Grant
    Filed: June 22, 2007
    Date of Patent: May 22, 2012
    Assignee: Mitsui Chemicals, Inc.
    Inventors: Norihiko Fukatsu, Hiroyuki Morijiri, Chitoshi Shimakawa, Koichi Tokunaga, Seiichi Kobayashi
  • Publication number: 20090198082
    Abstract: The present invention is to provide a process for producing dicyanonorbornane characterized by causing hydrogen cyanide to undergo addition reaction with cyanonorbornene (bicyclo[2.2.1]-5-heptene-2-carbonitrile) in the presence of a zerovalent nickel complex catalyst which is produced by using a phosphite represented by P(x)(y)(z) (wherein P is a phosphorus atom, and x, y and z are each OR, where R represents an aryl group having not more than 18 carbon atoms) as a ligand to reduce a nickel halide with at least one metal selected among zinc, cadmium, beryllium, aluminum, iron and cobalt, wherein the phosphite is one which has a phosphate content of 1.0 weight % or lower based on the whole phosphite.
    Type: Application
    Filed: June 22, 2007
    Publication date: August 6, 2009
    Applicant: MITSUI CHEMICALS , INC.
    Inventors: Norihiko Fukatsu, Hiroyuki Morijiri, Chitoshi Shimakawa, Koichi Tokunaga, Seiichi Kobayashi
  • Publication number: 20090124785
    Abstract: An isocyanate has been widely used as a starting material for the production of a polyurethane material, a polyisocyanurate material or the like which is suitably applicable to the field of optical materials. Disclosed is a process for producing an isocyanate which includes a step for producing the isocyanate in the form of a hydrochloride with improved productivity. A process for producing a linear or cyclic aliphatic isocyanate comprising the step of reacting a linear or cyclic aliphatic amine with hydrogen chloride to yield a hydrochloride of the linear or cyclic aliphatic amine, the step being performed under a pressure higher by 0.01 MPa or more than the atmospheric pressure.
    Type: Application
    Filed: July 20, 2006
    Publication date: May 14, 2009
    Applicant: Mitsui Chemicals, Inc.
    Inventors: Chitoshi Shimakawa, Hiroyuki Morijiri, Hidetoshi Hayashi, Norihiko Fukatsu, Seiichi Kobayashi, Homare Yumoto, Junichi Ishiyama, Shinya Tsuchiyama
  • Patent number: 7354989
    Abstract: A polymerizable composition and a manufacturing method thereof are provided, in which the composition is capable of meeting requirements of overcoming decrease in production yield of a resin composed of a thioepoxy compound, the decrease being caused by variations in refractive index, hue, and optical strain. In a polymerizable composition containing a compound having at least one structure represented by the above formula (where R1 represents a hydrocarbon having 1 to 10 carbon atoms, R2, R3, and R4 each represent a hydrocarbon group having 1 to 10 carbon atoms or a hydrogen atom.), the total of a thioepoxy compound A, which has at least one structure represented by formula (2) and at least one structure represented by formula (3), and a thioepoxy compound B, which has at least one structure represented by formula (4) and at least one structure represented by formula (3), is 4 mass percent or less with respect to the total mass of the polymerizable composition.
    Type: Grant
    Filed: March 11, 2003
    Date of Patent: April 8, 2008
    Assignee: Mitsui Chemicals, Inc.
    Inventors: Hiroyuki Morijiri, Seiichi Kobayashi, Chitoshi Shimakawa, Akinori Ryu, Nobuo Kawato
  • Publication number: 20050124783
    Abstract: A polymerizable composition and a manufacturing method thereof are provided, in which the composition is capable of meeting requirements of overcoming decrease in production yield of a resin composed of a thioepoxy compound, the decrease being caused by variations in refractive index, hue, and optical strain. In a polymerizable composition containing a compound having at least one structure represented by the above formula (where R1 represents a hydrocarbon having 1 to 10 carbon atoms, R2, R3, and R4 each represent a hydrocarbon group having 1 to 10 carbon atoms or a hydrogen atom.), the total of a thioepoxy compound A, which has at least one structure represented by formula (2) and at least one structure represented by formula (3), and a thioepoxy compound B, which has at least one structure represented by formula (4) and at least one structure represented by formula (3), is 4 mass percent or less with respect to the total mass of the polymerizable composition.
    Type: Application
    Filed: March 11, 2003
    Publication date: June 9, 2005
    Applicant: Mitsui Chemicals, Inc.
    Inventors: Hiroyuki Morijiri, Seiichi Kobayashi, Chitoshi Shimakawa, Akinori Ryu, Nobuo Kawato
  • Patent number: 6458917
    Abstract: An optical resin prepared by curing a polymerizable composition comprising a (thio)epoxy compound having at least one intramolecular disulfide bond exhibits a considerably high refractive index while maintaining good optical properties and a high Abbe number. In addition, the above polymerizable composition to which is added primary and/or secondary amines as an yellowing inhibitor in a proportion of 0.001 to 0.5 of the total molar number of NH2 and NH groups in the amines to the total molar number of thioepoxy and epoxy groups in the (thio)epoxy compound having at least one intramolecular disulfide bond, can provide a transparent resin in which yellowing and reduction in heat resistance associated therewith are adequately prevented while maintaining a high refractive index.
    Type: Grant
    Filed: August 1, 2001
    Date of Patent: October 1, 2002
    Assignee: Mitsui Chemicals, Inc.
    Inventors: Hiroyuki Morijiri, Seiichi Kobayashi, Koju Okazaki, Chitoshi Shimakawa, Akinori Ryu, Yoshinobu Kanemura
  • Patent number: 6365707
    Abstract: A polymerizable composition according to the present invention is characterized by that it comprises a compound (a) having at least one structure represented by the following formula (1): wherein R1 is a divalent hydrocarbon group having 1 to 10 carbon atoms, R2, R3 and R4 each independently represents a hydrocarbon group having 1 to 10 carbon atoms or a hydrogen atom; X stands for an S or O atom and the average number of S atom is at least 50% based on the total number of S and O atoms which consist of the three membered ring; and X′ is —S— or —O—, at least two compounds (b) having a tertiary amino group substituted with aliphatic and/or aromatic group(s), which are each different in catalytic activity as a polymerization catalyst, with the proviso that the ratio of the total of the tertiary amino groups in the at least two compounds (b) to the episulfide groups in compound (a) is in the range of 0.0001 to 0.
    Type: Grant
    Filed: May 31, 2000
    Date of Patent: April 2, 2002
    Assignee: Mitsui Chemicals, Inc.
    Inventors: Akinori Ryu, Seiichi Kobayashi, Hiroyuki Morijiri, Chitoshi Shimakawa, Koju Okazaki, Yoshinobu Kanemura, Nobuo Kawato