Patents by Inventor Chong T. Wan Wan

Chong T. Wan Wan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 4194962
    Abstract: A system for sputter coating architectural glass is disclosed which includes an evacuable enclosure, a conveyor for moving glass to be coated along parallel paths, an elongated sputtering cathode supported between the paths, and structure by which ionizable gas is introduced into the enclosure. The cathode creates a continuous band of plasma extending about it through a region defining laterally spaced first and second sections extending generally parallel to glass on respective sides of the cathode and return sections joining the ends of the laterally spaced sections. The cathode includes sputtering material target face portions extending adjacent and parallel to the plasma sections and a magnetic field directing system for constraining the plasma flow in the sections to extend substantially uniformly over the target face portions.
    Type: Grant
    Filed: December 20, 1978
    Date of Patent: March 25, 1980
    Assignee: Advanced Coating Technology, Inc.
    Inventors: Douglas L. Chambers, Chong T. Wan Wan