Patents by Inventor Chong-Tat Lee

Chong-Tat Lee has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of cleaning turbo pump and chamber/turbo pump clean process
    Patent number: 8277567
    Abstract: A method of cleaning a turbo pump is described. The turbo pump is coupled with a CVD chamber of depositing a material and thus accumulates the material therein. The method includes switching off the turbo pump and using another pump to pump a reactive gas, which can react with the material to form gaseous products, through the turbo pump. Thereby, the turbo pump is cleaned up and is prevented from being a particle source in subsequent CVD operations.
    Type: Grant
    Filed: August 8, 2011
    Date of Patent: October 2, 2012
    Assignee: United Microelectronics Corp.
    Inventors: Kian-Soong Poh, Jui-Ling Tang, Chong-Tat Lee, Cheng-Chung Lim
  • METHOD OF CLEANING TURBO PUMP AND CHAMBER/TURBO PUMP CLEAN PROCESS
    Publication number: 20110284035
    Abstract: A method of cleaning a turbo pump is described. The turbo pump is coupled with a CVD chamber of depositing a material and thus accumulates the material therein. The method includes switching off the turbo pump and using another pump to pump a reactive gas, which can react with the material to form gaseous products, through the turbo pump. Thereby, the turbo pump is cleaned up and is prevented from being a particle source in subsequent CVD operations.
    Type: Application
    Filed: August 8, 2011
    Publication date: November 24, 2011
    Applicant: UNITED MICROELECTRONICS CORP.
    Inventors: Kian-Soong Poh, Jui-Ling Tang, Chong-Tat Lee, Cheng-Chung Lim
  • Method of cleaning turbo pump and chamber/turbo pump clean process
    Patent number: 8021492
    Abstract: A method of cleaning a turbo pump is described. The turbo pump is coupled with a CVD chamber of depositing a material and thus accumulates the material therein. The method includes using another pump to pump a reactive gas, which can react with the material to form gaseous products, through the turbo pump. Thereby, the turbo pump is cleaned up and is prevented from being a particle source in subsequent CVD operations.
    Type: Grant
    Filed: May 29, 2007
    Date of Patent: September 20, 2011
    Assignee: United Microelectronics Corp.
    Inventors: Kian-Soong Poh, Jui-Ling Tang, Chong-Tat Lee, Cheng-Chung Lim
  • Method for cleaning semiconductor equipment
    Patent number: 7931752
    Abstract: A method for cleaning a semiconductor equipment is provided. First, a first cleaning step is performed to the process chamber. The first cleaning step includes conducting a cleaning gas into the process chamber via a short processing gas injector for generating a plasma of the cleaning gas in the process chamber. Then, a cleaning step is performed to a long cleaning gas injector. The cleaning step performed to the long cleaning gas injector includes conducting the cleaning gas into the process chamber via the long processing gas injector. Then, a second cleaning step is performed to the process chamber. The second cleaning step includes conducting the plasma of the cleaning gas into the process chamber via the short processing gas injector.
    Type: Grant
    Filed: January 6, 2009
    Date of Patent: April 26, 2011
    Assignee: United Microelectronics Corp.
    Inventors: Chong-Tat Lee, Jui-Lin Tang, Chee-Thim Loh, Kok-Poh Chong
  • METHOD FOR CLEANING SEMICONDUCTOR EQUIPMENT
    Publication number: 20100170530
    Abstract: A method for cleaning a semiconductor equipment is provided. First, a first cleaning step is performed to the process chamber. The first cleaning step includes conducting a cleaning gas into the process chamber via a short processing gas injector for generating a plasma of the cleaning gas in the process chamber. Then, a cleaning step is performed to a long cleaning gas injector. The cleaning step performed to the long cleaning gas injector includes conducting the cleaning gas into the process chamber via the long processing gas injector. Then, a second cleaning step is performed to the process chamber. The second cleaning step includes conducting the plasma of the cleaning gas into the process chamber via the short processing gas injector.
    Type: Application
    Filed: January 6, 2009
    Publication date: July 8, 2010
    Applicant: United Microelectronics Corp.
    Inventors: Chong-Tat Lee, Jui-Lin Tang, Chee-Thim Loh, Kok-Poh Chong
  • METHOD OF CLEANING TURBO PUMP AND CHAMBER/TURBO PUMP CLEAN PROCESS
    Publication number: 20080295867
    Abstract: A method of cleaning a turbo pump is described. The turbo pump is coupled with a CVD chamber of depositing a material and thus accumulates the material therein. The method includes using another pump to pump a reactive gas, which can react with the material to form gaseous products, through the turbo pump. Thereby, the turbo pump is cleaned up and is prevented from being a particle source in subsequent CVD operations.
    Type: Application
    Filed: May 29, 2007
    Publication date: December 4, 2008
    Applicant: UNITED MICROELECTRONICS CORP.
    Inventors: Kian-Soong Poh, Jui-Ling Tang, Chong-Tat Lee, Cheng-Chung Lim