Patents by Inventor Chris Chapman

Chris Chapman has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8158789
    Abstract: The present invention is a compound of formula (I) or formula (II) which are suitable as NP-1 antagonists.
    Type: Grant
    Filed: October 4, 2007
    Date of Patent: April 17, 2012
    Assignee: Ark Therapeutics Group Ltd.
    Inventors: Haiyan Jia, Ian Zachary, Michelle Tickner, Lili Cheng, Chris Chapman, Katie Ellard, Basil Hartzoulakis, Ashley Jarvis, Rosemary Lynch, Jamie Nally, David Selwood, Mark Stewart
  • Patent number: 8109218
    Abstract: A process for the treatment of waste, the process comprising either a gasification step or a pyrolysis step to produce an offgas and a non-airborne, solid char material; followed by a plasma treatment step. An associated apparatus having a plasma treatment unit which is separate from the gasification unit or pyrolysis unit.
    Type: Grant
    Filed: January 19, 2010
    Date of Patent: February 7, 2012
    Assignee: Advanced Plasma Power Limited
    Inventors: Chris Chapman, David Ovens, David Deegan, Saeed Ismail
  • Patent number: 8062616
    Abstract: The present invention relates to a method for treating spent pot liner material (SPL) containing carbon and/or an inorganic material, the method comprising: providing a plasma furnace having first and second electrodes for generating plasma and a crucible having a non-electrically conductive inner surface, heating the SPL material in the crucible in the presence of a flux material and an oxidant by passing an arc between the first and second electrodes via the SPL material to form a molten slag material and convert at least some of the carbon in the SPL material to CO and/or CO2 and/or incorporate at least some of the inorganic material into the molten slag material.
    Type: Grant
    Filed: March 26, 2008
    Date of Patent: November 22, 2011
    Assignee: Tetronics Limited
    Inventors: Chris Chapman, Hao Ly, David Deegan
  • Publication number: 20110271883
    Abstract: A process and related apparatus for the treatment of hazardous waste and an initially separate waste stream, the process comprising gasifying the waste stream in a gasification unit to produce an offgas and a char material; and plasma treating the offgas, and optionally the char material, in a plasma treatment unit to produce a syngas; and blending hazardous waste with the waste stream at a point in the process determined by the relative chemical and/or physical properties of the hazardous waste and the waste stream.
    Type: Application
    Filed: May 7, 2010
    Publication date: November 10, 2011
    Applicant: ADVANCED PLASMA POWER LIMITED
    Inventors: Chris Chapman, Martin Brooks, Rolf Stein, Edward S. Manukian, Robert M. Clark
  • Publication number: 20100137671
    Abstract: The present invention relates to a method for treating spent pot liner material (SPL) containing carbon and/or an inorganic material, the method comprising: providing a plasma furnace having first and second electrodes for generating plasma and a crucible having a non-electrically conductive inner surface, heating the SPL material in the crucible in the presence of a flux material and an oxidant by passing an arc between the first and second electrodes via the SPL material to form a molten slag material and convert at least some of the carbon in the SPL material to CO and/or CO2 and/or incorporate at least some of the inorganic material into the molten slag material.
    Type: Application
    Filed: March 26, 2008
    Publication date: June 3, 2010
    Applicant: TETRONICS LIMITED
    Inventors: Chris Chapman, Hao Ly, David Deegan
  • Publication number: 20100115961
    Abstract: A process for the treatment of waste, the process comprising either a gasification step or a pyrolysis step to produce an offgas and a non-airborne, solid char material; followed by a plasma treatment step. An associated apparatus having a plasma treatment unit which is separate from the gasification unit or pyrolysis unit.
    Type: Application
    Filed: January 19, 2010
    Publication date: May 13, 2010
    Applicant: TETRONICS LIMITED
    Inventors: Chris Chapman, David Ovens, David Deegan, Saeed Ismail
  • Publication number: 20100078409
    Abstract: A method for treating hazardous waste comprising: providing a plasma reactor, waste to be treated and a glass-forming host slag material; contacting within the plasma reactor the waste and the host slag material; and treating the waste and the host slag material using a plasma treatment to melt the host slag material and incorporate inorganic components of the waste within the host slag material, wherein the plasma is generated using an arc and the arc is passed through the host slag material.
    Type: Application
    Filed: March 20, 2007
    Publication date: April 1, 2010
    Applicant: TETRONICS LIMITED
    Inventors: David Deegan, Chris Chapman, Saeed Ismail
  • Publication number: 20100069698
    Abstract: A method for treating nuclear sludge comprising subjecting the nuclear sludge to a plasma treatment in a plasma chamber to melt at least some of the inorganic components of the sludge, wherein the plasma chamber comprises a crucible having a cooled inner surface, this surface cooled sufficiently such that the inorganic components in contact with the inner surface are in a solid state and form a barrier between the part of surface of the crucible with which they are in contact and the molten inorganic components of the sludge.
    Type: Application
    Filed: September 19, 2007
    Publication date: March 18, 2010
    Applicant: TETRONICS LIMITED
    Inventors: David Deegan, Chris Chapman, Saeed Ismail
  • Patent number: 7658155
    Abstract: A process for the treatment of waste, the process comprising: (i) either (a) a gasification step comprising treating the waste in a gasification unit in the presence of oxygen and steam to produce an offgas and a char, or (b) a pyrolysis step comprising treating the waste in a pyrolysis unit to produce an offgas and a char; and (ii) a plasma treatment step comprising subjecting the offgas and the char to a plasma treatment in a plasma treatment unit in the presence of oxygen and, optionally, steam.
    Type: Grant
    Filed: June 6, 2006
    Date of Patent: February 9, 2010
    Assignee: Advanced Plasma Power Limited
    Inventors: Chris Chapman, David Ovens, David Deegan, Saeed Ismail
  • Publication number: 20100022525
    Abstract: The present invention is a compound of formula (I) or formula (II) which are suitable as NP-1 antagonists.
    Type: Application
    Filed: October 4, 2007
    Publication date: January 28, 2010
    Inventors: Haiyan Jia, Ian Zachary, Michelle Tickner, Lili Cheng, Chris Chapman, Katie Ellard, Basil Hartzoulakis, Ashley Jarvis, Rosemary Lynch, Jamie Nally, David Selwood, Mark Stewart
  • Publication number: 20080097137
    Abstract: The present invention provides a process for the treatment of waste, the process comprising a gasification step comprising treating the waste in a gasification unit in the presence of oxygen and steam to produce an offgas and a char, and a plasma treatment step comprising subjecting the offgas and the char to a plasma treatment in a plasma treatment unit in the presence of oxygen and steam. An apparatus for carrying out the process is also provided.
    Type: Application
    Filed: June 6, 2006
    Publication date: April 24, 2008
    Applicant: TETRONICS LIMITED
    Inventors: Chris Chapman, David Ovens, David Deegan, Saeed Ismail
  • Publication number: 20060107789
    Abstract: A plasma arc reactor and process for producing a powder from a solid feed material, for example aluminium, is provided. The reactor comprises: (a) a first electrode (5), (b) a second electrode (10) which is adapted to be spaced apart from the first electrode by a distance sufficient to achieve a plasma arc therebetween, (c) means for introducing a plasma gas into the space between the first and second electrodes, (d) means for generating a plasma arc in the space between the first and second electrodes, wherein the first electrode has a channel (7) running therethrough, an outlet of the channel exiting into the space between the first and second electrodes, and wherein means are provided for feeding solid material (20) through the channel to exit therefrom via the outlet into the space between the first and second electrodes.
    Type: Application
    Filed: December 16, 2005
    Publication date: May 25, 2006
    Applicant: TETRONICS LIMITED
    Inventors: David Deegan, Chris Chapman, Timothy Johnson
  • Publication number: 20060096417
    Abstract: A plasma arc reactor and process for producing a powder from a solid feed material, for example aluminium, is provided. The reactor comprises: (a) a first electrode (5), (b) a second electrode (10) which is adapted to be spaced apart from the first electrode by a distance sufficient to achieve a plasma arc therebetween, (c) means for introducing a plasma gas into the space between the first and second electrodes, (d) means for generating a plasma arc in the space between the first and second electrodes, wherein the first electrode has a channel (7) running therethrough, an outlet of the channel exiting into the space between the first and second electrodes, and wherein means are provided for feeding solid material (20) through the channel to exit therefrom via the outlet into the space between the first and second electrodes.
    Type: Application
    Filed: December 16, 2005
    Publication date: May 11, 2006
    Applicant: TETRONICS LIMITED
    Inventors: David Deegan, Chris Chapman, Timothy Johnson
  • Publication number: 20050115932
    Abstract: The present invention relates to plasma torches and, in particular, to a method of improving the service life of electrodes, especially stub-ended electrodes. An electrode for a plasma torch comprises an electrode body and an electrode tip, wherein the electrode tip is fusion welded either directly or indirectly to the electrode body.
    Type: Application
    Filed: July 10, 2001
    Publication date: June 2, 2005
    Inventors: David Deegan, Chris Chapman, Timothy Johnson