Patents by Inventor Chris E. Karlsrud
Chris E. Karlsrud has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 5791975Abstract: A method of fabricating a soft, resilient backing pad adapted for attachment to a pressure plate for planarizing work pieces wherein the outer exposed surface of the pad has been abraded by means of dry abrasive particles fixed on a surface of a spherical convex lapping wheel.Type: GrantFiled: August 9, 1995Date of Patent: August 11, 1998Assignee: Speedfam CorporationInventors: Joseph V. Cesna, Chris E. Karlsrud, Spencer Preston
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Patent number: 5498199Abstract: A wafer polishing apparatus includes a wafer polishing assembly having a plurality of wafer carriers for substantially simultaneously polishing a plurality of wafers against a rotating polishing surface. A plurality of wafers to be polished are substantially simultaneously loaded into the plurality of wafer carriers by wafer holding apparatus of an index table. Similarly, a plurality of polished wafers are substantially simultaneously unloaded from the plurality of wafer carriers into wafer holding apparatus of the index table. The wafer carriers are individually computer controlled for exact polishing and different polishing requirements can be met at the same time by different wafer carriers.Type: GrantFiled: July 15, 1994Date of Patent: March 12, 1996Assignee: Speedfam CorporationInventors: Chris E. Karlsrud, Anthony G. Van Woerkom, Shigeru Odagiri, Isao Nagahashi, Spencer Preston
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Patent number: 5498196Abstract: A wafer polishing apparatus includes a wafer polishing assembly having a plurality of wafer carriers for substantially simultaneously polishing a plurality of wafers against a rotating polishing surface. A plurality of wafers to be polished are substantially simultaneously loaded into the plurality of wafer carriers by wafer holding apparatus of an index table. Similarly, a plurality of wafer carriers are substantially simultaneously unloaded into wafer holding apparatus of the index table. The wafer carriers are individually computer controlled for exact polishing and different polishing requirements can be met at the same time by different wafer carriers.Type: GrantFiled: May 18, 1994Date of Patent: March 12, 1996Assignee: Speedfam CorporationInventors: Chris E. Karlsrud, Anthony G. Van Woerkom, Shigeru Odagiri, Isao Nagahashi
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Patent number: 5329732Abstract: A wafer polishing apparatus includes a wafer polishing assembly having a plurality of wafer carriers for substantially simultaneously polishing a plurality of wafers against a rotating polishing surface. A plurality of wafers to be polished are substantially simultaneously loaded into the plurality of wafer carriers by wafer holding apparatus of an index table. Similarly, a plurality of wafer carriers are substantially simultaneously unloaded into wafer holding apparatus of the index table. The wafer carriers are individually computer controlled for exact polishing and different polishing requirements can be met at the same time by different wafer carriers.Type: GrantFiled: June 15, 1992Date of Patent: July 19, 1994Assignee: Speedfam CorporationInventors: Chris E. Karlsrud, Anthony G. Van Woerkom, Shigeru Odagiri, Isao Nagahashi
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Patent number: 5274960Abstract: A machine for simultaneously finishing two sides of a workpiece simultaneously, the machine having a base, an upper polishing plate, a lower polishing plate, a carrier holding one or more workpieces between the upper and lower polishing plates, a motor attached to a spindle having a first axis, which is fixedly attached to a spindle cam having a second axis such that when the spindle rotates about the first axis, the second axis of the spindle cam moves in a circular non-rotational manner circumscribing a circle having a radius defining a critical radius. The movement of the circular spindle cam causes the lower polishing plate to move in a circular non-rotational manner. The lower polishing plate is connected to one or more eccentric cams by one or more lower polishing plate linkages. The circular non-rotational movement of the lower polishing plate is transferred to the upper polishing plate by one or more eccentric cams via lower polishing plate linkages, and one or more upper polishing plate linkages.Type: GrantFiled: October 23, 1990Date of Patent: January 4, 1994Assignee: Speedfam CorporationInventor: Chris E. Karlsrud
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Patent number: 5187901Abstract: A disc finishing machine comprising an annular upper platen, lower platen, a center driving ring, a plurality of a clamping guide rollers, a plurality of stationary guide rollers, a clamping guide roller, and stationary guide roller perpendicularly attached to one of a plurality of a roller stanchions. The polishing machine capable of imparting a circumferential pattern on a plurality of disc-shaped work pieces.Type: GrantFiled: February 2, 1990Date of Patent: February 23, 1993Assignee: Speedfam CorporationInventor: Chris E. Karlsrud
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Patent number: 5123218Abstract: A disc finishing method using a machine comprising an annular upper platen, lower platen, a center driving ring, a plurality of a clamping guide rollers, a plurality of stationary guide rollers, a clamping guide roller, and stationary guide roller perpendicularly attached to one of a plurality of a roller stanchions. The polishing machine capable of imparting a circumferential pattern on a plurality of disc-shaped work pieces.Type: GrantFiled: July 23, 1991Date of Patent: June 23, 1992Assignee: Speedfam CorporationInventor: Chris E. Karlsrud
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Patent number: RE37622Abstract: A wafer polishing apparatus includes a wafer polishing assembly having a plurality of wafer carriers for substantially simultaneously polishing a plurality of wafers against a rotating polishing surface. A plurality of wafers to be polished are substantially simultaneously loaded into the plurality of wafer carriers by wafer holding apparatus of an index table. Similarly, a plurality of wafer carriers are substantially simultaneously unloaded into wafer holding apparatus of the index table. The wafer carriers are individually computer controlled for exact polishing and different polishing requirements can be met at the same time by different wafer carriers.Type: GrantFiled: January 24, 1997Date of Patent: April 2, 2002Assignee: SpeedFam-IPEC CorporationInventors: Chris E. Karlsrud, Anthony G. Van Woerkom, Shigeru Odagiri, Isao Nagahashi