Patents by Inventor Chris E. Osuch

Chris E. Osuch has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Photosensitive acrylate composition and waveguide device
    Patent number: 7327925
    Abstract: A photosensitive composition suitable for practical waveguide devices is provided. The photosensitive composition comprises at least one multifunctional acrylate prepared from a fluorinated multifunctional alcohol and at least one photoinitiator. The said composition has high photo contrast, high curing speed, controllable refractive index, low curing shrinkage, high thermo-optic coefficient, low volatility and high viscosity. A waveguide device is formed by patterning the photosensitive composition.
    Type: Grant
    Filed: June 2, 2006
    Date of Patent: February 5, 2008
    Assignee: E. I. du Pont de Nemours and Company
    Inventors: Fang Wang, Baopei Xu, Indira S. Pottebaum, Chuck C. Xu, Deepti Pant, Chris E. Osuch, Louay A. Eldada
  • Photosensitive acrylate composition and waveguide device
    Patent number: 7078445
    Abstract: A photosensitive composition suitable for practical waveguide devices is provided. The photosensitive composition comprises at least one multifunctional acrylate prepared from a fluorinated multifunctional alcohol and at least one photoinitiator. The said composition has high photo contrast, high curing speed, controllable refractive index, low curing shrinkage, high thermo-optic coefficient, low volatility and high viscosity. A waveguide device is formed by patterning the photosensitive composition.
    Type: Grant
    Filed: January 18, 2002
    Date of Patent: July 18, 2006
    Assignee: E. I. du Pont de Nemours and Company
    Inventors: Chuck C. Xu, Deepti Pant, Chris E. Osuch, Louay A. Eldada
  • Fluorinated photopolymer composition and waveguide device
    Patent number: 6929899
    Abstract: A photosensitive composition having low absorption loss at 1,300-1,610 nm and is suitable for practical waveguide devices. The composition comprises at least one (meth)acrylate prepared from a fluorinated monomer or polymer having minimum two hydroxyl groups, at least one multifunctional non-fluorinated (meth)acrylate and at least one photoinitiator. An optical coating on a variety of substrates is obtained by exposing the photosensitive composition to actinic radiation such as UV light. An optical waveguide device is fabricated by patterning the photosensitive composition on a substrate.
    Type: Grant
    Filed: January 18, 2002
    Date of Patent: August 16, 2005
    Assignee: E. I. du Pont de Nemours and Company
    Inventors: Indira S. Pottebaum, Chuck C. Xu, Chris E. Osuch, Deepti Pant, Louay A. Eldada
  • Fluorinated photopolymer composition and waveguide device
    Publication number: 20020136526
    Abstract: A photosensitive composition having low absorption loss at 1,300-1,610 nm and is suitable for practical waveguide devices. The composition comprises at least one (meth)acrylate prepared from a fluorinated monomer or polymer having minimum two hydroxyl groups, at least one multifunctional non-fluorinated (meth)acrylate and at least one photoinitiator. An optical coating on a variety of substrates is obtained by exposing the photosensitive composition to actinic radiation such as UV light. An optical waveguide device is fabricated by patterning the photosensitive composition on a substrate.
    Type: Application
    Filed: January 18, 2002
    Publication date: September 26, 2002
    Inventors: Indira S. Pottebaum, Chuck C. Xu, Chris E. Osuch, Deepti Pant, Louay A. Eldada
  • Photosensitive acrylate composition and waveguide device
    Publication number: 20020106582
    Abstract: A photosensitive composition suitable for practical waveguide devices is provided. The photosensitive composition comprises at least one multifunctional acrylate prepared from a fluorinated multifunctional alcohol and at least one photoinitiator. The said composition has high photo contrast, high curing speed, controllable refractive index, low curing shrinkage, high thermo-optic coefficient, low volatility and high viscosity. A waveguide device is formed by patterning the photosensitive composition.
    Type: Application
    Filed: January 18, 2002
    Publication date: August 8, 2002
    Inventors: Chuck C. Xu, Deepti Pant, Chris E. Osuch, Louay A. Eldada