Patents by Inventor Chris Kardas

Chris Kardas has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • High CF.sub.4 flow-reactive ion etch for aluminum patterning
    Patent number: 5202291
    Abstract: An anisotropic reactive ion etching of an aluminum metal film of a semiconductor device. The device is placed in a reactive ion etcher using a CF.sub.4, Cl.sub.2 and BCl.sub.3 gas mixture to anisotropically etch the aluminum metal film layer wherein the gas mixture has a ratio of CF.sub.4 :Cl.sub.2 such that the aluminum etch rate increases as the amount of CF.sub.4 relative to Cl.sub.2 increases.
    Type: Grant
    Filed: May 8, 1992
    Date of Patent: April 13, 1993
    Assignee: Intel Corporation
    Inventors: Peter K. Charvat, Chris Kardas