Patents by Inventor Christiaan Alexander Hoogendam
Christiaan Alexander Hoogendam has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9952515Abstract: An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid.Type: GrantFiled: August 28, 2015Date of Patent: April 24, 2018Assignee: ASML NETHERLANDS B.V.Inventors: Bob Streefkerk, Johannes Jacobus Matheus Baselmans, Richard Joseph Bruls, Marcel Mathijs Theodore Marie Dierichs, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Hans Jansen, Erik Roelof Loopstra, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Ronald Walther Jeanne Severijns, Sergei Shulepov, Herman Boom, Timotheus Franciscus Sengers
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Publication number: 20180081282Abstract: A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.Type: ApplicationFiled: November 27, 2017Publication date: March 22, 2018Applicant: ASML NETHERLANDS B.V.Inventors: Aleksey Yurievich KOLESNYCHENKO, Johannes Jacobus Matheus BASELMANS, Sjoerd Nicolaas Lambertus DONDERS, Christiaan Alexander HOOGENDAM, Hans JANSEN, Jeroen Johannes Sophia Maria MERTENS, Johannes Catharinus Hubertus MULKENS, Felix Godfried Peter PEETERS, Bob STREEFKERK, Franciscus Johannes Herman Maria TEUNISSEN, Helmar VAN SANTEN
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Publication number: 20180081285Abstract: A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations.Type: ApplicationFiled: November 28, 2017Publication date: March 22, 2018Applicant: ASML NETHERLANDS B.V.Inventors: Marcel BECKERS, Sjoerd Nicolaas Lambertus DONDERS, Christiaan Alexander HOOGENDAM, Johannes Henricus Wilhelmus JACOBS, Nicolaas TEN KATE, Nicolaas Rudolf KEMPER, Ferdy MIGCHELBRINK, Elmar EVERS
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Publication number: 20180067401Abstract: A method for determining an offset between a center of a substrate and a center of a depression in a chuck includes providing a test substrate to the depression, the test substrate having a dimension smaller than a dimension of the depression, measuring a position of an alignment mark of the test substrate while in the depression, and determining the offset between the center of the substrate and the center of the depression from the position of the alignment mark.Type: ApplicationFiled: August 21, 2017Publication date: March 8, 2018Inventors: Christiaan Alexander HOOGENDAM, Gerrit Johannes Nijmeijer, Minne Cuperus, Petrus Anton Willem Cornelia Maria Van Eijck
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Patent number: 9904185Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.Type: GrantFiled: October 24, 2016Date of Patent: February 27, 2018Assignees: ASML NETHERLANDS B.V., ASML HOLDINGS N.V.Inventors: Nicolaas Rudolf Kemper, Henrikus Herman Marie Cox, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Nicolaas Ten Kate, Martinus Hendrikus Antonius Leenders, Jeroen Johannes Sophia Maria Mertens, Frits Van Der Meulen, Joost Jeroen Ottens, Franciscus Johannes Herman Maria Teunissen, Jan-Gerard Cornelis Van Der Toorn, Martinus Cornelis Maria Verhagen, Marco Polizzi, Edwin Augustinus Matheus Van Gompel, Johannes Petrus Maria Smeulers, Stefan Philip Christiaan Belfroid, Herman Vogel
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Publication number: 20180046089Abstract: In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.Type: ApplicationFiled: October 23, 2017Publication date: February 15, 2018Applicant: ASML NETHERLANDS B.V.Inventors: Bob STREEFKERK, Johannes Jacobus Matheus BASELMANS, Henrikus Herman Marie COX, Antonius Theodorus Anna Maria DERKSEN, Sjoerd Nicolaas Lambertus DONDERS, Christiaan Alexander HOOGENDAM, Joeri LOF, Erik Roelof LOOPSTRA, Jeroen Johannes Sophia Maria MERTENS, Frits VAN DER MEDLEN, Johannes Catharinus Hubertus MULKENS, Gerardus Petrus Matthijs VAN NUNEN, Klaus SIMON, Bernardus Antonius SLAGHEKKE, Alexander STRAAIJER, Jan-Gerard Cornelis VAN DER TOORN, Martijn HOUKES
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Publication number: 20180039188Abstract: A lithographic apparatus is disclosed including a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, an outlet configured to remove a mixture of liquid and gas passing through a gap between a liquid confinement structure of the liquid supply system and the substrate, and an evacuation system configured to draw the mixture through the outlet, the evacuation system having a separator tank arranged to separate liquid from gas in the mixture and a separator tank pressure controller, connected to a non-liquid-filled region of the separator tank, configured to maintain a stable pressure within the non-liquid-filled region.Type: ApplicationFiled: September 1, 2017Publication date: February 8, 2018Applicant: ASML NETHERLANDS B.V.Inventors: Jeroen Johannes Sophia Maria MERTENS, Sjoerd Nicolaas Lambertus DONDERS, Roelof Frederik DE GRAAF, Christiaan Alexander HOOGENDAM, Antonius Johannus VAN DER NET, Franciscus Johannes Herman Maria TEUNISSEN, Patricius Aloysius Jacobus TINNEMANS, Martinus Cornelis Maria VERHAGEN, Jacobus Johannus Leonardus Hendricus VERSPAY, Edwin Augustinus Matheus VAN GOMPEL
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Patent number: 9885965Abstract: A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.Type: GrantFiled: March 2, 2017Date of Patent: February 6, 2018Assignee: ASML NETHERLANDS B.V.Inventors: Christiaan Alexander Hoogendam, Antonius Theodorus Anna Maria Derksen, Sjoerd Nicolaas Lambertus Donders, Joeri Lof, Erik Roelof Loopstra, Johannes Catharinus Hubertus Mulkens, Hans Jansen, Jacobus Johannus Leonardus Hendricus Verspay, Alexander Straaijer, Bob Streefkerk
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Publication number: 20180017879Abstract: A lithographic apparatus comprising: a positioning stage (WT); an isolation frame (300); a projection system (PS), comprising a first frame (210); a second frame (220); a supporting frame (10) for supporting the positioning stage; a first vibration isolation system (250) and a second vibration isolation system (270), wherein the supporting frame and the first frame are coupled via the first vibration isolation system; a stage position measurement system (400) to determine directly the position of a stage reference of an element of the positioning stage in one or more degrees of freedom with respect to an isolation frame reference of an element of the isolation frame; and wherein the first frame and the isolation frame are coupled via the second vibration isolation system.Type: ApplicationFiled: January 26, 2016Publication date: January 18, 2018Applicant: ASML Netherlands B.V.Inventors: Hans BUTLER, Maurice Willem Jozef Etiƫnne WIJCKMANS, Engelbertus Antonius Fransiscus VAN DER PASCH, Christiaan Alexander HOOGENDAM, Bernardus Antonius Johannes LUTTIKHUIS
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Patent number: 9857695Abstract: A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations.Type: GrantFiled: August 29, 2016Date of Patent: January 2, 2018Assignee: ASML NETHERLANDS B.V.Inventors: Marcel Beckers, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Johannes Henricus Wilhelmus Jacobs, Nicolaas Ten Kate, Nicolaas Rudolf Kemper, Ferdy Migchelbrink, Elmar Evers
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Publication number: 20170357165Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.Type: ApplicationFiled: August 28, 2017Publication date: December 14, 2017Applicants: ASML NETHERLANDS B.V., ASML HOLDING N.V.Inventors: Nicolaas Rudolf KEMPER, Henrikus Herman Marie COX, Sjored Nicolaas Lambertus DONDERS, Roelof Frederik DE GRAAF, Christiaan Alexander HOOGENDAM, Nicolaas TEN KATE, Jeroen Johannes Sophia Maria MERTENS, Frits VAN DER MEULEN, Franciscus Johannes Herman Maria TEUNISSEN, Jan-Gerard Cornelis VAN DER TOORN, Martinus Cornelis Maria VERHAGEN, Stefan Philip Christiaan BELFROID, Johannes Petrus Maria SMEULERS, Herman VOGEL
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Patent number: 9829799Abstract: A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.Type: GrantFiled: February 13, 2017Date of Patent: November 28, 2017Assignee: ASML NETHERLANDS B.V.Inventors: Aleksey Yurievich Kolesnychenko, Johannes Jacobus Matheus Baselmans, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Hans Jansen, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Hubertus Mulkens, Felix Godfried Peter Peeters, Bob Streefkerk, Franciscus Johannes Herman Maria Teunissen, Helmar Van Santen
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Patent number: 9798246Abstract: In a lithographic apparatus, a localized area of the substrate surface under a projection system is immersed in liquid. The height of a liquid supply system above the surface of the substrate can be varied using actuators. A control system uses feedforward or feedback control with input of the surface height of the substrate to maintain the liquid supply system at a predetermined height above the surface of the substrate.Type: GrantFiled: June 16, 2016Date of Patent: October 24, 2017Assignee: ASML NETHERLANDS B.V.Inventors: Bob Streefkerk, Johannes Jacobus Matheus Baselmans, Henrikus Herman Marie Cox, Antonius Theodorus Anna Maria Derksen, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Joeri Lof, Erik Roelof Loopstra, Jeroen Johannes Sophia Maria Mertens, Frits Van Der Meulen, Johannes Catharinus Hubertus Mulkens, Gerardus Petrus Matthijs Van Nunen, Klaus Simon, Bernardus Antonius Slaghekke, Alexander Straaijer, Jan-Gerard Cornelis Van Der Toorn, Martijn Houkes
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Publication number: 20170285488Abstract: A method and apparatus for cleaning the inside of an immersion lithographic apparatus is disclosed. In particular, a liquid supply system of the lithographic apparatus may be used to introduce a cleaning fluid into a space between the projection system and the substrate table of the lithographic apparatus. Additionally or alternatively, a cleaning device may be provided on the substrate table and an ultrasonic emitter may be provided to create an ultrasonic cleaning liquid.Type: ApplicationFiled: June 15, 2017Publication date: October 5, 2017Applicant: ASML NETHERLANDS B.V.Inventors: Hans Jansen, Johannes Jacobus Matheus Baselmans, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Jeroen Johannes Sophia Maria Mertens, Johannes Catharinus Huberts Mulkens, Marco Koert Stavenga, Bob Streefkerk, Jan Cornelis Van Der Hoeven, Cedric Desire Grouwstra
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Patent number: 9766556Abstract: A gas knife configured to dry a surface in an immersion lithographic apparatus is optimized to remove liquid by ensuring that a pressure gradient is built up in the liquid film on the surface being dried.Type: GrantFiled: September 15, 2016Date of Patent: September 19, 2017Assignee: ASML NETHERLANDS B.V.Inventors: Nicolaas Rudolf Kemper, Sjoerd Nicolaas Lambertus Donders, Christiaan Alexander Hoogendam, Nicolaas Ten Kate, Sergei Shulepov
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Patent number: 9753380Abstract: A lithographic apparatus is disclosed including a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, an outlet configured to remove a mixture of liquid and gas passing through a gap between a liquid confinement structure of the liquid supply system and the substrate, and an evacuation system configured to draw the mixture through the outlet, the evacuation system having a separator tank arranged to separate liquid from gas in the mixture and a separator tank pressure controller, connected to a non-liquid-filled region of the separator tank, configured to maintain a stable pressure within the non-liquid-filled region.Type: GrantFiled: August 30, 2016Date of Patent: September 5, 2017Assignee: ASML NETHERLANDS B.V.Inventors: Jeroen Johannes Sophia Maria Mertens, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Antonius Johannus Van Der Net, Franciscus Johannes Herman Maria Teunissen, Patricius Aloysius Jacobus Tinnemans, Martinus Cornelis Maria Verhagen, Jacobus Johannus Leonardus Hendricus Verspay, Edwin Augustinus Matheus Van Gompel
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Patent number: 9753381Abstract: A substrate table system includes a substrate table and a dual directional motor for moving the substrate table in a plane of movement that is defined by a first direction and a second direction. The dual directional motor includes: a first pusher structure extending in the first direction, the substrate table being movable in respect of the first pusher structure, the first pusher structure and the substrate table being arranged to cooperate to form a first motor to exert a force between the first pusher structure and the substrate table in the first direction; and a second pusher structure extending in the first direction, the substrate table being movable in respect of the second pusher structure, the second pusher structure and the substrate table to cooperate to form a second motor to exert a force between the second pusher structure and the substrate table in the second direction.Type: GrantFiled: February 15, 2013Date of Patent: September 5, 2017Assignee: ASML NETHERLANDS B.V.Inventors: Bastiaan Lambertus Wilhelmus Marinus Van De Ven, Antonius Franciscus Johannes De Groot, Christiaan Alexander Hoogendam, Erik Roelof Loopstra, Hans Butler
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Publication number: 20170248854Abstract: An immersion lithographic apparatus has adaptations to prevent or reduce bubble formation in one or more gaps in the substrate table by preventing bubbles escaping from the gap into the beam path and/or extracting bubbles that may form in the gap.Type: ApplicationFiled: March 27, 2017Publication date: August 31, 2017Applicant: ASML NETHERLANDS B.V.Inventors: Bob STREEFKERK, Sjoerd Nicolaas Lambertus DONDERS, Roelof Frederik DE GRAAF, Christiaan Alexander HOOGENDAM, Martinus Hendrikus Antonius LEENDERS, Jeroen Johannes Sophia Maria MERTENS, Michel RIEPEN
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Patent number: 9746788Abstract: A lithographic projection apparatus, including a liquid supply system configured to supply a liquid to a space between a projection system and a movable table; a member to at least partly confine liquid in the space, the member including a recovery opening facing toward the movable table, the recovery opening including a first porous structure configured to recover fluid; and a chamber configured to receive recovered fluid and to separate liquid from gas in the recovered fluid, the chamber including a second porous structure.Type: GrantFiled: October 13, 2016Date of Patent: August 29, 2017Assignees: ASML Netherlands B.V., ASML Holding N.V.Inventors: Nicolaas Rudolf Kemper, Henrikus Herman Marie Cox, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Nicolaas Ten Kate, Jeroen Johannes Sophia Maria Mertens, Frits Van Der Meulen, Franciscus Johannes Herman Maria Teunissen, Jan-Gerard Cornelis Van Der Toorn, Martinus Cornelis Maria Verhagen, Stefan Philip Christiaan Belfroid, Johannes Petrus Maria Smeulers, Herman Vogel
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Publication number: 20170242347Abstract: A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate.Type: ApplicationFiled: March 2, 2017Publication date: August 24, 2017Applicant: ASML NETHERLANDS B.V.Inventors: Christiaan Alexander HOOGENDAM, Antonius Theodorus Anna Maria DERKSEN, Sjoerd Nicolaas Lambertus DONDERS, Joeri LOF, Erik Roelof LOOPSTRA, Johannes Catharinus Hubertus MULKENS, Hans JANSEN, Jacobus Johannus Leonardus Hendricus VERSPAY, Alexander STRAAIJER, Bob STREEFKERK