Patents by Inventor Christiaan Louis Valentin
Christiaan Louis Valentin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11681233Abstract: A system having a sub-system that is configured to change a thermal condition of a physical component from a set-point to a new set-point, wherein the sub-system includes: a mixer operative to receive a first conditioning fluid having a first temperature and a second conditioning fluid having a second temperature different from the first temperature, and operative to supply to the physical component a mix of the first conditioning fluid and the second conditioning fluid; and a controller configured to control the mixer in dependence on the new set-point. Also a method of operating a lithographic apparatus as well as a device manufactured using the system described herein or according to methods described herein.Type: GrantFiled: September 26, 2019Date of Patent: June 20, 2023Assignee: ASML NETHERLANDS B.V.Inventors: Joost De Hoogh, Alain Louis Claude Leroux, Alexander Marinus Arnoldus Huijberts, Christiaan Louis Valentin, Robert Coenraad Wit, Dries Vaast Paul Hemschoote, Frits Van Der Meulen, Johannes Franciscus Martinus Van Santvoort, Radu Donose
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Patent number: 11442369Abstract: An object stage bearing system can include an object stage, a hollow shaft coupled to the object stage, and an in-vacuum gas bearing assembly coupled to the hollow shaft and the object stage. The in-vacuum gas bearing assembly can include a gas bearing, a scavenging groove, and a vacuum groove. The gas bearing is disposed along an inner wall of the in-vacuum gas bearing assembly and along an external wall of the hollow shaft. The scavenging groove is disposed along the inner wall such that the scavenging groove is isolated from the gas bearing. The vacuum groove is disposed along the inner wall such that the vacuum groove is isolated from the scavenging groove and the gas bearing.Type: GrantFiled: November 7, 2018Date of Patent: September 13, 2022Assignee: ASML Netherlands B.V.Inventors: Yang-Shan Huang, Pieter Cornelis Johan De Jager, Rob Reilink, Christiaan Louis Valentin, Jasper Leonardus Johannes Scholten, Antonie Hendrik Verweij, Edwin Van Horne
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Publication number: 20210356875Abstract: A system having a sub-system that is configured to change a thermal condition of a physical component from a set-point to a new set-point, wherein the sub-system includes: a mixer operative to receive a first conditioning fluid having a first temperature and a second conditioning fluid having a second temperature different from the first temperature, and operative to supply to the physical component a mix of the first conditioning fluid and the second conditioning fluid; and a controller configured to control the mixer in dependence on the new set-point. Also a method of operating a lithographic apparatus as well as a device manufactured using the system described herein or according to methods described herein.Type: ApplicationFiled: September 26, 2019Publication date: November 18, 2021Applicant: ASML NETHERLANDS B.V.Inventors: Joost DE HOOGH, Alain Louis Claude LEROUX, Alexander Marinus Arnoldus HUIJBERTS, Christiaan Louis VALENTIN, Robert Coenraad WIT, Dries Vaast Paul HEMSCHOOTE, Frits VAN DER MEULEN, Johannes Franciscus Martinus VAN SANTVOORT, Radu DONOSE
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Publication number: 20200333717Abstract: An object stage bearing system can include an object stage, a hollow shaft coupled to the object stage, and an in-vacuum gas bearing assembly coupled to the hollow shaft and the object stage. The in-vacuum gas bearing assembly can include a gas bearing, a scavenging groove, and a vacuum groove. The gas bearing is disposed along an inner wall of the in-vacuum gas bearing assembly and along an external wall of the hollow shaft. The scavenging groove is disposed along the inner wall such that the scavenging groove is isolated from the gas bearing. The vacuum groove is disposed along the inner wall such that the vacuum groove is isolated from the scavenging groove and the gas bearing.Type: ApplicationFiled: November 7, 2018Publication date: October 22, 2020Applicant: ASML Netherlands B.V.Inventors: Yang-Shan HUANG, Pieter Cornelis Johan DE JAGER, Rob REILINK, Christiaan Louis VALENTIN, Jasper Leonardus Johannes SCHOLTEN, Antonie Hendrik VERWEIJ, Edwin VAN HORNE
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Patent number: 10747127Abstract: A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table, the lithographic apparatus further comprising a cooling apparatus for cooling the substrate, wherein the cooling apparatus comprises a cooling element located above the substrate table and adjacent to the exposure area, the cooling element being configured to remove heat from the substrate.Type: GrantFiled: August 11, 2017Date of Patent: August 18, 2020Assignee: ASML Netherlands B.V.Inventors: Frits Van Der Meulen, Erik Johan Arlemark, Hendrikus Herman Marie Cox, Martinus Agnes Willem Cuijpers, Joost De Hoogh, Gosse Charles De Vries, Paul Comé Henri De Wit, Sander Catharina Reinier Derks, Ronald Cornelis Gerardus Gijzen, Dries Vaast Paul Hemschoote, Christiaan Alexander Hoogendam, Adrianus Hendrik Koevoets, Raymond Wilhelmus Louis Lafarre, Alain Louis Claude Leroux, Patrick Willem Paul Limpens, Jim Vincent Overkamp, Christiaan Louis Valentin, Koos Van Berkel, Stan Henricus Van Der Meulen, Jacobus Cornelis Gerardus Van Der Sanden, Harmen Klaas Van Der Schoot, David Ferdinand Vles, Evert Auke Rinze Westerhuis
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Publication number: 20190227445Abstract: A lithographic apparatus comprising a projection system configured to project a patterned radiation beam to form an exposure area on a substrate held on a substrate table, the lithographic apparatus further comprising a cooling apparatus for cooling the substrate, wherein the cooling apparatus comprises a cooling element located above the substrate table and adjacent to the exposure area, the cooling element being configured to remove heat from the substrate.Type: ApplicationFiled: August 11, 2017Publication date: July 25, 2019Applicant: ASML Netherlands B.V.Inventors: Frits VAN DER MEULEN, Erik Johan ARLEMARK, Hendrikus Herman Marie COX, Martinus Agnes Willem CUIJPERS, Joost DE HOOGH, Gosse Charles DE VRIES, Paul Comé Henri DE WIT, Sander Catharina Reinier DERKS, Ronald Comelis Gerardus GIJZEN, Dries Vaast Paul HEMSCHOOTE, Christiaan Alexander HOOGENDAM, Adrianus Hendrik KOEVOETS, Raymond Wilhelmus Louis LAFARRE, Alain Louis Claude LEROUX, Patrick Willem Paul LIMPENS, Jim Vincent OVERKAMP, Christiaan Louis VALENTIN, Koos VAN BERKEL, Stan Henricus VAN DER MEULEN, Jacobus Comelis Gerardus VAN DER SANDEN, Harmen Klaas VAN DER SCHOOT, David Ferdinand VLES, Evert Auke Rinze WESTERHUIS
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Patent number: 10248027Abstract: A projection system (PS1) for a lithographic apparatus comprises: an optical path (100); a plurality of sensors (S1-S4); one or more actuators (A1-A4); and a controller (CN). The optical path is operable to receive an input radiation beam (Bin) and to project an output radiation beam (Bout) onto a substrate to form an image. The optical path comprises: a plurality of optical elements (M1-M4), the plurality of optical elements comprising: a first set of at least two optical elements (M1, M4) and a second set of at least one optical element (M2, M3). Each sensor is associated with one of the plurality of optical elements and is operable to determine a position of that optical element. Each actuator is associated with one of the second set of optical elements and is operable to adjust that optical element.Type: GrantFiled: November 16, 2015Date of Patent: April 2, 2019Assignee: ASML Netherlands B.V.Inventors: Hans Butler, Raoul Maarten Simon Knops, Bob Streefkerk, Christiaan Louis Valentin, Jan Bernard Plechelmus Van Schoot, Wilhelmus Franciscus Johannes Simons, Leon Leonardus Franciscus Merkx, Robertus Johannes Marinus De Jongh, Roel Johannes Elisabeth Merry, Michael Frederik Ypma
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Patent number: 10228626Abstract: A movable support configured to support an object, the support including: a support plane to support the object, an actuator assembly to move the movable support in a first direction and in a second direction perpendicular to the first direction, wherein the first direction and the second direction extend in a plane parallel to the support plane, wherein the actuator assembly includes: a first actuator configured to exert a first actuation force in a first actuation direction, the first actuation direction being parallel to the support plane, a second actuator configured to exert a second actuation force in a second actuation direction, the second actuation direction being parallel to the support plane, wherein the first actuation direction and the second actuation direction are arranged non-parallel and non-perpendicular with respect to each other.Type: GrantFiled: April 28, 2016Date of Patent: March 12, 2019Assignee: ASML Netherlands B.V.Inventors: Antonius Franciscus Johannes De Groot, Theo Anjes Maria Ruijl, Christiaan Louis Valentin, Christian Werner
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Publication number: 20180356738Abstract: The present invention relates to a movable support (1) configured to support an object, comprising: a support plane (2) to support the object, an actuator assembly to move the movable support in a first direction and in a second direction perpendicular to the first direction, wherein the first direction and the second direction extend in a plane parallel to the support plane, wherein the actuator assembly comprises: a first actuator (3) configured to exert a first actuation force (F1) in a first actuation direction (A1), said first actuation direction being parallel to the support plane, a second actuator (4) configured to exert a second actuation force (F2) in a second actuation direction (A2), said second actuation direction being parallel to the support plane, wherein the first actuation direction and the second actuation direction are arranged non-parallel and non-perpendicular with respect to each other.Type: ApplicationFiled: April 28, 2016Publication date: December 13, 2018Applicant: ASML Netherlands B.V.Inventors: Antonius Franciscus Johannes DE GROOT, Theo Anjes Maria RUIJL, Christiaan Louis VALENTIN, Christan WERNER
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Patent number: 9958787Abstract: A method of exposing a patterned area on a substrate using an EUV lithographic apparatus having a demagnification of about 5× and a numerical aperture of about 0.4 is disclosed. The method comprises exposing a first portion of the patterned area on the substrate using a first exposure, the first portion dimensions are significantly less than the dimensions of a conventional exposure, and exposing one or more additional portions of the patterned area on the substrate using one or more additional exposures, the additional portions having dimensions which are significantly less than the dimensions of a conventional exposure. The method further comprises repeating the above to expose a second patterned area on the substrate, the second patterned area being provided with the same pattern as the first patterned area, wherein a distance between center points of the first and second patterned areas corresponds with a dimension of a conventional exposure.Type: GrantFiled: September 17, 2013Date of Patent: May 1, 2018Assignee: ASML Netherlands B.V.Inventors: Erik Roelof Loopstra, Jan Bernard Plechelmus Van Schoot, Timotheus Franciscus Sengers, Christiaan Louis Valentin, Antonius Johannes Josephus Van Dijsseldonk
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Patent number: 9910368Abstract: A system (300) for supporting an exchangeable object (302) can include a movable structure (304) and an object holder (306) configured to be movable relative to the movable structure. The object holder can be configured to hold the exchangeable object. The system can also include a first actuator assembly (308) and second actuator assembly (316). The first actuator assembly can be configured to apply a force to the object holder to translate the exchangeable object generally along a plane. The second actuator assembly can be configured to apply a bending moment to the object holder. The exchangeable object can be a patterning device of a lithographic apparatus.Type: GrantFiled: September 20, 2013Date of Patent: March 6, 2018Assignees: ASML Netherlands B.V., ASML Holding N.V.Inventors: Christiaan Louis Valentin, Erik Roelof Loopstra, Christopher Charles Ward, Daniel Nathan Burbank, Mark Josef Schuster, Peter James Graffeo
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Publication number: 20170363965Abstract: A projection system (PS1) for a lithographic apparatus comprises: an optical path (100); a plurality of sensors (S1-S4); one or more actuators (A1-A4); and a controller (CN). The optical path is operable to receive an input radiation beam (Bin) and to project an output radiation beam (Bout) onto a substrate to form an image. The optical path comprises: a plurality of optical elements (M1-M4), the plurality of optical elements comprising: a first set of at least two optical elements (M1, M4) and a second set of at least one optical element (M2, M3). Each sensor is associated with one of the plurality of optical elements and is operable to determine a position of that optical element. Each actuator is associated with one of the second set of optical elements and is operable to adjust that optical element.Type: ApplicationFiled: November 16, 2015Publication date: December 21, 2017Applicant: ASML Netherlands B.V.Inventors: Hans BUTLER, Raoul Maarten Simon KNOPS, Bob STREEFKERK, Christiaan Louis VALENTIN, Jan Bernard Plechelmus VAN SCHOOT, Wilhelmus Franciscus Johanne SIMONS, Leon Leonardus Franciscus MERKX, Robertus Johannes Marinus DE JONGH, Roel Johannes Elisabeth MERRY, Michael Frederik YPMA
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Patent number: 9632429Abstract: A system and method that bends a reticle and senses a curvature of a bent reticle in real-time. The system includes movable reticle stage, reticle vacuum clamps, sensor systems, and reticle bender. The reticle bender comprises piezo actuators. The sensor systems comprises measurement targets and corresponding sensors. The sensors are attached to the movable reticle stage and the measurement targets are attached to the reticle clamps, the reticle bender, or on reticle surfaces. The system is configured to determine a width of the reticle or distance between measurement targets at opposing ends of the reticle, measure a first rotational angle at a first end of the reticle, and measure a second local rotational angle at a second end of the reticle that is opposite to the first end. Based on the width or distance and the first and second angles, a field curvature of the reticle is determined.Type: GrantFiled: August 1, 2013Date of Patent: April 25, 2017Assignees: ASML Holding N.V., ASML Netherlands B.V.Inventors: Christopher Charles Ward, Martinus Hendrikus Antonius Leenders, Mark Josef Schuster, Christiaan Louis Valentin
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Publication number: 20150277241Abstract: A system (300) for supporting an exchangeable object (302) can include a movable structure (304) and an object holder (306) configured to be movable relative to the movable structure. The object holder can be configured to hold the exchangeable object. The system can also include a first actuator assembly (308) and second actuator assembly (316). The first actuator assembly can be configured to apply a force to the object holder to translate the exchangeable object generally along a plane. The second actuator assembly can be configured to apply a bending moment to the object holder. The exchangeable object can be a patterning device of a lithographic apparatus.Type: ApplicationFiled: September 20, 2013Publication date: October 1, 2015Applicants: ASML Netherlands B.V., ASML Holding N.V.Inventors: Christiaan Louis Valentin, Erik Roelof Loopstra, Christopher Charles Ward, Daniel Nathan Burbank, Mark Josef Schuster, Peter James Graffeo
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Publication number: 20150253679Abstract: A method of exposing a patterned area on a substrate using an EUV lithographic apparatus having a demagnification of about 5× and a numerical aperture of about 0.4 is disclosed. The method comprises exposing a first portion of the patterned area on the substrate using a first exposure, the first portion dimensions are significantly less than the dimensions of a conventional exposure, and exposing one or more additional portions of the patterned area on the substrate using one or more additional exposures, the additional portions having dimensions which are significantly less than the dimensions of a conventional exposure. The method further comprises repeating the above to expose a second patterned area on the substrate, the second patterned area being provided with the same pattern as the first patterned area, wherein a distance between centre points of the first and second patterned areas corresponds with a dimension of a conventional exposure.Type: ApplicationFiled: September 17, 2013Publication date: September 10, 2015Applicant: ASML Netherlands B.V.Inventors: Erik Roelof Loopstra, Jan Bernard Plechelmus Van Schoot, Timotheus Franciscus Sengers, Christiaan Louis Valentin, Antonius Johannes Josephus Van Dijsseldonk
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Publication number: 20150220005Abstract: A system and method that bends a reticle and senses a curvature of a bent reticle in real-time. The system includes movable reticle stage, reticle vacuum clamps, sensor systems, and reticle bender. The reticle bender comprises piezo actuators. The sensor systems comprises measurement targets and corresponding sensors. The sensors are attached to the movable reticle stage and the measurement targets are attached to the reticle clamps, the reticle bender, or on reticle surfaces. The system is configured to determine a width of the reticle or distance between measurement targets at opposing ends of the reticle, measure a first rotational angle at a first end of the reticle, and measure a second local rotational angle at a second end of the reticle that is opposite to the first end. Based on the width or distance and the first and second angles, a field curvature of the reticle is determined.Type: ApplicationFiled: August 1, 2013Publication date: August 6, 2015Applicants: ASML Holding N.V., ASML Netherlands B.V.Inventors: Christopher Charles Ward, Martinus Hendrikus Antonius Leenders, Mark Josef Schuster, Christiaan Louis Valentin
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Patent number: 8755030Abstract: A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; and a projection system configured to project the patterned radiation beam onto a target portion of the substrate. An optical element of the projection system is adjustable. The lithographic apparatus includes a controller to control the adjustable optical element. The controller is arranged to drive the optical element so as to at least partly compensate for a magnification resulting from a bending of the patterning device.Type: GrantFiled: March 9, 2011Date of Patent: June 17, 2014Assignee: ASML Netherlands B.V.Inventors: Christiaan Louis Valentin, Antonius Franciscus Johannes De Groot, Robert-Han Munnig Schmidt, Johannes Petrus Martinus Bernardus Vermeulen, Bartholomeus Catharina Thomas Van Bree
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Publication number: 20140002805Abstract: Disclosed is an electrostatic clamp apparatus (500) constructed to support a patterning device (505) of a lithographic apparatus, comprising a support structure against which said patterning device is supported, clamping electrodes (525) for providing a clamping force between the support structure and patterning device, and an array of capacitive sensors (660) operable to measure the shape of said patterning device.Type: ApplicationFiled: January 18, 2012Publication date: January 2, 2014Applicant: ASML Netherelands B.V.Inventors: Vadim Yevgenyevich Banine, Erik Roelof Loopstra, Theodorus Petrus Maria Cadee, Johannes Antonius Gerardus Akkermans, Luigi Scaccabarozzi, Christiaan Louis Valentin
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Publication number: 20130107241Abstract: A lithographic apparatus arranged to transfer a pattern from a patterning device onto a substrate, the lithographic apparatus including a substrate table constructed to hold a substrate and a gripper arranged to position the substrate on the substrate table. The gripper includes a vacuum clamp arranged to clamp the substrate at a top side thereof. The vacuum clamp may be arranged to clamp at least part of a circumferential outer zone of the substrate top surface. There is also provided a substrate handling method including positioning the substrate using a gripper on a substrate table of a lithographic apparatus, the method including clamping the substrate at a top side thereof using a vacuum clamp of the gripper.Type: ApplicationFiled: October 24, 2012Publication date: May 2, 2013Applicant: ASML NETHERLANDS B.V.Inventors: Raymond Wilhelmus Louis LAFARRE, Hubert Marie Segers, Theodorus Petrus Maria Cadee, Yang-Shan Huang, Christiaan Louis Valentin
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Publication number: 20130077078Abstract: A lithographic apparatus comprises a substrate table constructed to hold a substrate and a gripper arranged to position the substrate on the substrate table. The gripper includes an electrostatic clamp arranged to clamp the substrate at a top side thereof. The electrostatic clamp is arranged to clamp at least part of a circumferential outer zone of a top surface of the substrate. The invention provides a substrate handling method including positioning the substrate by means of a gripper on a substrate table of a lithographic apparatus. The substrate is clamped at a top side thereof by using an electrostatic clamp of the gripper.Type: ApplicationFiled: August 29, 2012Publication date: March 28, 2013Applicant: ASML Netherlands B.V.Inventors: Raymond Wilhelmus Louis LAFARRE, Sjoerd Nicolaas Lambertus Donders, Antonius Franciscus Johannes De Groot, Hubert Marie Segers, Johannes Petrus Martinus Bernardus Vermeulen, Raimond Visser, Johannes Charles Adrianus Van Den Berg, Jan Steven Christiaan Westerlaken, Yang-Shan Huang, Christiaan Louis Valentin