Patents by Inventor Christian Felix WäHLISCH

Christian Felix WäHLISCH has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Radiation source, lithographic apparatus device manufacturing method, sensor system and sensing method
    Patent number: 10459342
    Abstract: A radiation source for a lithographic apparatus, in particular a laser-produced plasma source includes a fan unit surrounding but not obstructing the collected radiation beam that is operated to generate a flow in a buffer gas away from the optical axis. The fan unit can include a plurality of flat or curved blades generally parallel to the optical axis and driven to rotate about the optical axis.
    Type: Grant
    Filed: January 14, 2019
    Date of Patent: October 29, 2019
    Assignee: ASML Netherlands B.V.
    Inventor: Christian Felix Wählisch
  • RADIATION SOURCE, LITHOGRAPHIC APPARATUS DEVICE MANUFACTURING METHOD, SENSOR SYSTEM AND SENSING METHOD
    Publication number: 20190146350
    Abstract: A radiation source for a lithographic apparatus, in particular a laser-produced plasma source includes a fan unit surrounding but not obstructing the collected radiation beam that is operated to generate a flow in a buffer gas away from the optical axis. The fan unit can include a plurality of flat or curved blades generally parallel to the optical axis and driven to rotate about the optical axis.
    Type: Application
    Filed: January 14, 2019
    Publication date: May 16, 2019
    Applicant: ASML Netherlands B.V.
    Inventor: Christian Felix WäHLISCH
  • Radiation source, lithographic apparatus device manufacturing method, sensor system and sensing method
    Patent number: 10222701
    Abstract: A radiation source for a lithographic apparatus, in particular a laser-produced plasma source includes a fan unit surrounding but not obstructing the collected radiation beam that is operated to generate a flow in a buffer gas away from the optical axis. The fan unit can include a plurality of flat or curved blades generally parallel to the optical axis and driven to rotate about the optical axis.
    Type: Grant
    Filed: September 18, 2014
    Date of Patent: March 5, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Chuangxin Zhao, Sander Baltussen, Pär Mårten Lukas Broman, Richard Joseph Bruls, Cristian Bogdan Craus, Jan Groenewold, Dzmitry Labetski, Kerim Nadir, Hendrikus Gijsbertus Schimmel, Christian Felix Wählisch
  • RADIATION SOURCE, LITHOGRAPHIC APPARATUS DEVICE MANUFACTURING METHOD, SENSOR SYSTEM AND SENSING METHOD
    Publication number: 20160209753
    Abstract: A radiation source for a lithographic apparatus, in particular a laser-produced plasma source includes a fan unit surrounding but not obstructing the collected radiation beam that is operated to generate a flow in a buffer gas away from the optical axis. The fan unit can include a plurality of flat or curved blades generally parallel to the optical axis and driven to rotate about the optical axis.
    Type: Application
    Filed: September 18, 2014
    Publication date: July 21, 2016
    Applicant: ASML Netherlands B.V.
    Inventors: Chuangxin ZHAO, Pär Mårten Lukas BROMAN, Richard Joseph BRULS, Cristian Bogdan CRAUS, Jan GROENEWOLD, Dzmitry LABETSKI, Kerim NADIR, Hendrikus Gijsbertsu SCHIMMEL, Christian Felix WäHLISCH