Abstract: The invention relates to a device for stirring a liquid in a reactor and for injecting a gas into the said liquid in order to form a gas-liquid dispersion, comprising a) a drive device (1) positioned above the reactor, provided with a vertical output shaft (2) fitted at its lower end with at least one axial flow rotor (4) immersed in the liquid, b) means for introducing gas (3 and 7) above the axial flow rotor (4), c) a deflector (5) placed above the axial flow rotor (4) preventing the gas-liquid dispersion from rising, and d) a deflector (6) placed below the axial flow rotor (4) converting the axial flow of the said axial flow rotor into a radial flow. This device may be used in shallow basins.

Abstract: The invention relates to a device for stirring a liquid in a reactor and for injecting a gas into the said liquid in order to form a gas-liquid dispersion, comprising a) a drive device (1) positioned above the reactor, provided with a vertical output shaft (2) fitted at its lower end with at least one axial flow rotor (4) immersed in the liquid, b) means for introducing gas (3 and 7) above the axial flow rotor (4), c) a deflector (5) placed above the axial flow rotor (4) preventing the gas-liquid dispersion from rising, and d) a deflector (6) placed below the axial flow rotor (4) converting the axial flow of the said axial flow rotor into a radial flow. This device may be used in shallow basins.

Abstract: The invention relates to a method for cooling a plasma processing system for processing a mixture of particularly gaseous fluids, which comprises a means for coupling a source of microwave power to a mixture of particularly gaseous fluids flowing in a dielectric tube at the level of the coupling means adapted for transferring a portion of the microwave energy to the fluid mixture in order to generate therein a plasma for initiating the breaking of at least some chemical bonds of the fluid molecules, wherein said dielectric tube is at least partially cooled down by a coolant flow in thermal contact with the outer wall of the tube to be cooled.

Abstract: The invention relates to a microwave plasma exciter device which includes a waveguide (23) for concentrating the microwaves; and a plasma generator (110, 120) for forming a plasma, which are disposed in a microwave concentration zone.

Abstract: The invention concerns a system for treating gases such as PFC or HFC with plasma, comprising: (6) pumping means (6) whereof the outlet is at a pressure substantially equal to atmospheric pressure, plasma generator (8), at the pump output, to produce a plasma at atmospheric pressure.

Abstract: The invention relates to a method for destroying effluents issuing from a reactor, the said effluents being transported through at least one pump towards plasma means capable of destroying at least certain bonds in the molecules of the PFC or HFC type between the fluorine and the other elements of these molecules of the PFC or HFC type, in order to generate first species which are then converted to second gaseous, liquid or solid species before interaction of these second species with dry or wet purifying means. According to the invention, at least one reducing agent is injected upstream and/or downstream of the plasma, but upstream of the purifying means, in order to react with the first species created.

Abstract: The invention relates to a microwave plasma exciter device comprising: a waveguide containing means (23) for concentrating the microwaves; and means (110, 120) for forming a plasma, which are disposed in a microwave concentration zone.

Abstract: The invention relates to a device for stirring a liquid in a reactor and for injecting a gas into the said liquid in order to form a gas-liquid dispersion, comprising a) a drive device (1) positioned above the reactor, provided with a vertical output shaft (2) fitted at its lower end with at least one axial flow rotor (4) immersed in the liquid, b) means for introducing gas (3 and 7) above the axial flow rotor (4), c) a deflector (5) placed above the axial flow rotor (4) preventing the gas-liquid dispersion from rising, and d) a deflector (6) placed below the axial flow rotor (4) converting the axial flow of the said axial flow rotor into a radial flow. This device may be used in shallow basins.

Abstract: The invention concerns a system for treating gases such as PFC or HFC with plasma, comprising: (6) pumping means (6) thereof the outlet is at a pressure substantially equal to atmospheric pressure, means (8), at the pump output, to produce a plasmas at atmospheric pressure.

Abstract: A portable device for administering a gas. The device can supply at least one nostril of a user with at least part of a gas. The device includes at least one gas distribution nozzle and a support, with which the at least one gas distribution nozzle is supported or held in position on the face of the user. The at least one gas distribution nozzle is held along at least part of the outer wall or surface of the nose or cheeks of the user, when the device is positioned on the head or the face of the user. The at least one nozzle is outside the user's nostrils.

Abstract: A method for filling a gas-insulated electric current transmission line with gas using an insulating gas mixture, which line comprises an outer tubular sheath, at least one conductor internal to the sheath and coaxial with this sheath, and a space lying between the at least one conductor and the outer sheath, comprising the steps of: a) applying at least one purging cycle to the space comprising: a pumping step, down to a first vacuum level; a purge step comprising introducing a purge gas and obtaining a first internal atmosphere including the purge gas; b) applying to the space a filling cycle comprising: a pumping step, down to a second vacuum level; a filling step using the insulating gas to obtain a second internal atmosphere.

Abstract: The invention relates to a process for the dry surface treatment of at least one metal surface portion, according to which the portion is treated at a pressure close to atmospheric pressure by a gaseous treatment atmosphere comprising excited or unstable species and substantially devoid of electrically charged species, obtained from a primary gaseous mixture and if necessary an adjacent gaseous mixture, the primary gaseous mixture being obtained at the gas outlet of at least one device for the production of excited or unstable gaseous species, in which an initial gaseous mixture comprising an inert gas and/or a reducing gas and/or an oxidizing gas has been converted, the adjacent mixture not having passed through the device.

Abstract: The gas mixture leaving the laser apparatus (1) is recycled to a permeator (45) which separates it into two flows. The discharge from the permeator is expanded in an expansion turbine (27) coupled to a compressor (35) for exerting suction on the recycled mixture, which makes it possible to obtain the desired reduced pressure in the laser apparatus. Applications to power laser apparatuses with nitrogen/carbon dioxide mixture, intended for cutting materials.

Abstract: A device for spreading a flame, comprises at least one principal nozzle (35) delivering a jet of combustible gas or combustion supporting gas (6); at least one secondary nozzle (8) delivering a jet of combustion supporting gas or combustible gas (12) which flows next to the principal jet and which has a substantially constant thickness. At least one curved surface (9) is disposed tangentially to the jet of secondary gas so as to deflect it by the Coanda effect, to draw in the principal jet of gas (6) and to mix the gas of the secondary jet (12) and the gas of the principal jet (6) to form a flame.

Abstract: Apparatus for the formation of excited or unstable gaseous molecules, comprising a tubular gas passage (5) having an axis, formed between a first electrode (1) and a dielectric tube (3) coaxial to the first electrode and supporting a second electrode (4), the electrodes being connected to a high voltage high frequency source (13). The first electrode (1) surrounds the dielectric tube (3) and comprises an elongated gas inlet (7) and outlet (8) parallel to the axis and diametrically opposed to each other on opposite sides of the dielectric tube (3). The second electrode (4) is a layer of metal applied to the internal wall of the dielectric tube (3). The second electrode (4)is formed by metallization of the internal wall of the dielectric tube (3). The gas inlet (7) and outlet (8) have a height not exceeding the radial thickness (e) of the gas passage (5). The external wall of the dielectric tube is covered with a thin layer (21) of enamel.

Abstract: Mixing power laser apparatus, comprising a generator of a flow of excited nitrogen (1), and structure (6; 19) to introduce a flow of CO.sub.2 into the flow of excited nitrogen. The generator (1) is of the cold corona electric discharge type operating at a pressure greater than 0.3.times.10.sup.5 Pa, and is coupled to a waveguide (2) with mirrors (3, 4) opposed along a principal direction of the waveguide. For use particularly in cutting material.

Abstract: A power laser has a cavity (2) delimited at its opposite ends by a first partially transmitting window (3) and a second reflecting window ( 4). The first window (3) is constituted by at least one diamond wafer (5) with uncoated flat parallel surfaces, having a controlled thickness whose variations do not exceed 0.2 micron. The diamond wafer (5; 6) is mounted in an annular support (9; 10) of material which is a good heat conductor and is provided with a cooler (11; 12). The window (3) can comprise two parallel wafers (5.sub.A, 5.sub.B) of diamond separated by a calibrated distance (14) which is an uneven multiple of .lambda./4n, .lambda. being the laser wavelength and n the index of refraction of the medium between the wafers. Or the second window (4) can also be constituted by a diamond wafer (6) with a reflective metallic coating (60). A sweeping gas can be blown over the internal surface of at least one of the windows.

Abstract: Silicon hydrides are produced by acid hydrolysis of ternary silicon alloys. According to the process there are made to react an industrial ternary alloy of the formula M.sub.x M.sup.2.sub.y Si.sub.z, in which M.sup.1 is a reducing metal, M.sup.2 is an alkali alkaline-earth metal, with a dilute acid selected from hydracids and orthophosphoric acid, at a concentration of 2N to 6N, by adding the ternary alloy in the form of fine powder to the acid, the reaction being preformed between ambient temperature and 90.degree. C. The various hydrides are condensed, and separated by fractional evaporation under partial vacuum. The silicon hydrides--silane, disilane and higher polysilanes--after purification can be used as silicon vectors, depending on their chemical nature, particularly in the industries of electronic components, photovolaitic cells, photocopier drums and for frosting light bulbs by the dry method.