Patents by Inventor Christine Heckle

Christine Heckle has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Synthetic silica glass optical material having high resistance to optically induced index change
    Publication number: 20050112380
    Abstract: Disclosed is a synthetic silica glass optical material having high resistance to optical damage by ultraviolet radiation in the ultraviolet wavelength range, particularly in the wavelength region of less than about 250 nm and particularly, exhibiting a low laser induced density change. The synthetic silica glass optical material of the present invention contains at least about 0.1 ppm of aluminum and H2 concentration levels greater than about 0.5×1017 molecules/cm2. Additionally, the synthetic silica optical material of the present invention exhibits an H2 to Al ratio of greater than about 1.2, as measured in ×1017/cm3 molecules H2 per ppm Al.
    Type: Application
    Filed: November 24, 2004
    Publication date: May 26, 2005
    Inventors: Heather Boek, Christine Heckle, Johannes Moll, Charlene Smith