Patents by Inventor Christof G. Krautschik

Christof G. Krautschik has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Cleaning organic residues from EUV optics and masks
    Patent number: 8764905
    Abstract: A method and system for cleaning lithography components including contacting a substrate having residue including organic compounds and graphitic carbon deposited on a surface thereof with hydrogen peroxide vapor. The hydrogen peroxide vapor is irradiated with electromagnetic radiation having a wavelength in the range of 100 nm to 350 nm forming hydroxyl radicals. The hydroxyl radicals react with the residue to remove the residue from the surface of the substrate.
    Type: Grant
    Filed: March 14, 2013
    Date of Patent: July 1, 2014
    Assignee: Intel Corporation
    Inventors: Paul A. Zimmerman, Christof G. Krautschik
  • Transition radiation apparatus
    Patent number: 7214950
    Abstract: In one embodiment of the present invention, thermal deformation or bending of membranes in a transition radiation emitting structure can be reduced by providing flex regions in the membranes or the membrane support structures. In a second embodiment, deformation of membranes is compensated for by fabricating the membranes to cooperatively bend in a similar manner and direction. In a third embodiment, deformation of the membrane is reduced by fabricating the membranes with an intrinsic tensile or compressive stress.
    Type: Grant
    Filed: August 13, 2004
    Date of Patent: May 8, 2007
    Assignee: Intel Corporation
    Inventors: Sang H. Lee, Yashesh A. Shroff, Christof G. Krautschik