Patents by Inventor Christoph Bittner
Christoph Bittner has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 8676424Abstract: A drive system includes at least two drive devices, at least one of which is electric, that drive at least two drive axles, a power electronics system, an energy storage arrangement, and a control device. The control device includes a drive control module for providing a recuperation limiting value for each electric drive, a recuperation control module for combining the recuperation limiting values to form a maximum recuperation total limiting value, and a brake control module for providing a total braking torque requested by a driver or assistance system, such that it derives a recuperation total torque that is less than the recuperation total limiting value and also derives recuperation partial torques for each electric drive. In the case of a total braking torque that is greater than the recuperation total limiting value, the brake control module generates a hydraulic brake pressure and transmits it to the brake system.Type: GrantFiled: December 18, 2012Date of Patent: March 18, 2014Assignee: Dr. Ing. H.C. F. Porsche AktiengesellschaftInventors: Holger Bartels, Dominik Bender, Christoph Bittner, Florian Fuhr, Markus Gantikow, Heiko Mayer, Tobias Roulet, Nils Sauvlet, Christian Wiedenbruegge, Stefan Wimmer
-
Publication number: 20090197513Abstract: A method for processing a flexographic printing plate on which patterned flexographic material that is uncured or partially cured has been provided, the method comprising mechanically shaping the upper surface of the flexographic material and fully curing the shaped material.Type: ApplicationFiled: January 31, 2008Publication date: August 6, 2009Applicant: FFEI LIMITEDInventors: Martin Philip GOUCH, Christoph BITTNER
-
Publication number: 20090197013Abstract: A method of producing a flexographic printing plate, comprises: a) inkjet printing a layer of flexographic material in a predetermined pattern onto a substrate; b) partially curing at least part of the printed layer of flexographic material so as to immobilize it on the substrate; and c) repeating steps (a) and (b) so as to print and partially cure one or more further layers of flexographic material in the predetermined pattern on the previous layer(s), characterized by additionally curing one or more lower printed layers before or while printing one or more upper layers so as to reduce spreading of the lower printed layer(s).Type: ApplicationFiled: February 4, 2008Publication date: August 6, 2009Applicant: FFEI LIMITEDInventors: Martin Philip GOUCH, Christoph BITTNER
-
Patent number: 7271099Abstract: A method of forming a conductive pattern on a substrate. The method comprising providing a substrate carrying a conductive layer; forming a first portion of the conductive pattern by exposing the conductive layer to a laser and controlling the laser to remove conductive material around the edge(s) of desired conductive region(s) of the first portion; and laying down an etch resistant material on the conductive layer, the etch resistant material defining a second portion of the conductive pattern, removing conductive material from those areas of the second portion not covered by the etch resistant material, and then removing the etch resistant material.Type: GrantFiled: June 6, 2005Date of Patent: September 18, 2007Assignee: FFEI LimitedInventors: Nigel Ingram Bromley, Martin Philip Gouch, Christoph Bittner
-
Publication number: 20060273069Abstract: A method of forming a conductive pattern on a substrate. The method comprising providing a substrate carrying a conductive layer; forming a first portion of the conductive pattern by exposing the conductive layer to a laser and controlling the laser to remove conductive material around the edge(s) of desired conductive region(s) of the first portion; and laying down an etch resistant material on the conductive layer, the etch resistant material defining a second portion of the conductive pattern, removing conductive material from those areas of the second portion not covered by the etch resistant material, and then removing the etch resistant material.Type: ApplicationFiled: June 6, 2005Publication date: December 7, 2006Applicant: FUJIFILM ELECTRONIC IMAGING LTD.Inventors: Nigel Bromley, Martin Gouch, Christoph Bittner
-
Patent number: 7094562Abstract: The invention relates to a method for the examination of cells (20, 38) in a culture medium, in particular for in-situ microscopy in a bio-reactor, whereby cells in a sample volume, the depth (d) of which is defined by windows (14, 16) in the direction of the optical axis of the microscope (18), are microscopically imaged and are automatically recorded and processed by means of an image processing system (30). Said method is characterized in that the depth (d) of the sample volume (12) is adjusted to the size of the cells (20, 38) by successively reducing the separation (d) of the windows while the image size (G) of the cells is simultaneously verified by the image processing system (30) such that a separation value (D) is determined at which the image size (G) of the cells begins to grow, thus corresponding to flattening caused by the contact pressure of the windows (14, 16), and that the separation (d) of the windows (14, 16) is set to said separation value (D) for the examination.Type: GrantFiled: July 7, 2001Date of Patent: August 22, 2006Assignee: Innovatis AGInventor: Christoph Bittner
-
Publication number: 20060114572Abstract: A radiation generating apparatus includes an emitter bar having an array of optical radiation emitters arranged along a line, each emitter causing optical radiation to be emitted in substantially a common direction. The apparatus also includes one or more lenses, positioned adjacent the emitters, so as to collimate the radiation emitted from each emitter and to generate a line of substantially parallel light beams. Each beam is collimated in at least a cross-array direction substantially perpendicular to the plane defined by the line of emitters and the common direction, such that any relative positional deviations from linearity for the light beams in the cross-array direction with respect to their width in that direction, is smaller downstream of the lens(es) with respect to that at the emitters.Type: ApplicationFiled: December 1, 2004Publication date: June 1, 2006Applicant: FUJIFILM ELECTRONIC IMAGING LTD.Inventor: Christoph Bittner
-
Patent number: 6905838Abstract: In a method for characterizing a culture liquid, in particular in a bioreactor, by illuminating the cells (22) contained in the culture liquid the culture liquid is analyzed in situ, microscopic imaging of the cells (22) and by evaluating the image. The illumination is carried out as dark-field illumination, and the image evaluation comprises a comparison of the intensities of the light output by the interior of the cell and by the edge of the cell, by means of which comparison living and dead cells (22) are distinguished in order to determine the vitality of the culture liquid.Type: GrantFiled: October 11, 2000Date of Patent: June 14, 2005Assignee: Innovatis AGInventor: Christoph Bittner
-
Publication number: 20050109961Abstract: Imaging apparatus comprises a record medium support on which a record medium is mounted in use. A radiation beam generator generates a radiation beam modulated with imaging data which is directed towards the support. A system is provided for causing relative scanning movement between the beam and the support. A detection system detects radiation emitted from the support or the record medium in response to incident radiation from the radiation beam generator and having a wavelength different from the incident radiation so as to monitor for a change in intensity of the detected radiation indicative of the passage of the record medium edge.Type: ApplicationFiled: November 20, 2003Publication date: May 26, 2005Applicant: FUJIFILM ELECTRONIC IMAGING LTD.Inventor: Christoph Bittner
-
Publication number: 20040048330Abstract: The invention relates to a method for the examination of cells (20, 38) in a culture medium, in particular for in-situ microscopy in a bio-reactor, whereby cells in a sample volume, the depth (d) of which is defined by windows (14, 16) in the direction of the optical axis of the microscope (18), are microscopically imaged and are automatically recorded and processed by means of an image processing system (30). Said method is characterized in that the depth (d) of the sample volume (12) is adjusted to the size of the cells (20, 38) by successively reducing the separation (d) of the windows while the image size (G) of the cells is simultaneously verified by the image processing system (30) such that a separation value (D) is determined at which the image size (G) of the cells begins to grow, thus corresponding to flattening caused by the contact pressure of the windows (14, 16), and that the separation (d) of the windows (14, 16) is set to said separation value (D) for the examination.Type: ApplicationFiled: June 26, 2003Publication date: March 11, 2004Inventor: Christoph Bittner