Abstract: When replacing a mirror in a projection exposure apparatus, a mirror for replacement is initially removed (41). Position- and orientation data of the removed mirror for replacement are measured (43) by a position -and orientation data measuring device. Furthermore, position- and orientation data of a replacement mirror, to be inserted in place of the mirror for replacement, are measured (46) using the position- and orientation data measuring device. Bearing points of the replacement mirror are reworked (48) on the basis of ascertained differences between, firstly, the position- and orientation data of the mirror for replacement and, secondly, the position- and orientation data of the replacement mirror. The reworked replacement mirror is installed (54). This yields a mirror replacement method, in which an adjustment outlay of the replacement mirror in the projection exposure apparatus is reduced.

Abstract: A method for producing a reflecting optical element for a projection exposure apparatus (1). The element has a substrate (30) with a substrate surface (31), a protection layer (38) and a layer partial system (39) suitable for the EUV wavelength range. The method includes: (a) measuring the substrate surface (31), (b) irradiating the substrate (30) with electrons (36), and (c) tempering the substrate (30). Furthermore, an associated reflective optical element for the EUV wavelength range, a projection lens with a mirror (18, 19, 20) as reflective optical element, and a projection exposure apparatus (1) including such a projection lens.

Abstract: When replacing a mirror in a projection exposure apparatus, a mirror for replacement is initially removed (41). Position- and orientation data of the removed mirror for replacement are measured (43) by a position-and orientation data measuring device. Furthermore, position- and orientation data of a replacement mirror, to be inserted in place of the mirror for replacement, are measured (46) using the position- and orientation data measuring device. Bearing points of the replacement mirror are reworked (48) on the basis of ascertained differences between, firstly, the position- and orientation data of the mirror for replacement and, secondly, the position- and orientation data of the replacement mirror. The reworked replacement mirror is installed (54). This yields a mirror replacement method, in which an adjustment outlay of the replacement mirror in the projection exposure apparatus is reduced.

Abstract: A method for producing a reflecting optical element for a projection exposure apparatus (1). The element has a substrate (30) with a substrate surface (31), a protection layer (38) and a layer partial system (39) suitable for the EUV wavelength range. The method includes: (a) measuring the substrate surface (31), (b) irradiating the substrate (30) with electrons (36), and (c) tempering the substrate (30). Furthermore, an associated reflective optical element for the EUV wavelength range, a projection lens with a mirror (18, 19, 20) as reflective optical element, and a projection exposure apparatus (1) including such a projection lens.

Abstract: A method for changing a shape of a surface of an optical element by particle irradiation includes: modelling the problem of determining a resulting change of the surface shape of the optical element from a control variable; determining a predefinition for the control variable of the particle irradiation from a predefined desired change of a surface shape of the optical element by ascertaining an extremum of a merit function; and radiating particles onto the surface of the optical element with a locally resolved effect distribution corresponding to the determined predefinition for the control variable, for the purpose of producing local surface changes at the surface of the optical element. Ascertaining the extremum corresponds to the solution of an Euler equation. The Euler equation defines an integral operator. The eigenvalues of the integral operator are determined, and the predefinition is a linear combination of a finite number of eigenfunctions of the integral operator.

Abstract: A method for changing a shape of a surface of an optical element by particle irradiation includes: modelling the problem of determining a resulting change of the surface shape of the optical element from a control variable; determining a predefinition for the control variable of the particle irradiation from a predefined desired change of a surface shape of the optical element by ascertaining an extremum of a merit function; and radiating particles onto the surface of the optical element with a locally resolved effect distribution corresponding to the determined predefinition for the control variable, for the purpose of producing local surface changes at the surface of the optical element. Ascertaining the extremum corresponds to the solution of an Euler equation. The Euler equation defines an integral operator. The eigenvalues of the integral operator are determined, and the predefinition is a linear combination of a finite number of eigenfunctions of the integral operator.

Abstract: An illumination system for an EUV projection exposure apparatus is designed for shaping illumination radiation from at least a portion of received EUV radiation. The illumination radiation is directed into an illumination field in an exit plane of the illumination system during exposure operation. An EUV radiation source is arranged in a source module separate from the illumination system. The illumination system includes an alignment state determining system including an alignment detector configured to receive a portion of the EUV radiation emerging from the secondary radiation source and to generate therefrom an alignment detector signal representative of the alignment state.

Abstract: An illumination system for an EUV projection exposure apparatus is designed for shaping illumination radiation from at least a portion of received EUV radiation. The illumination radiation is directed into an illumination field in an exit plane of the illumination system during exposure operation. An EUV radiation source is arranged in a source module separate from the illumination system. The illumination system includes an alignment state determining system including an alignment detector configured to receive a portion of the EUV radiation emerging from the secondary radiation source and to generate therefrom an alignment detector signal representative of the alignment state.

Abstract: A method for determining a corrected variable, which depends on at least one parameter, in a parameter range of the parameter, includes carrying out a measurement, measurement values of the variable being made available in a plurality of separate and non-overlapping subranges of the parameter range; correcting measurement values of the variable using an approximation, in which measurement values of the variable are approximated with a smooth function and with subrange functions of the subranges of the parameter range. The smooth function allows reproduction of the progression of the variable over the parameter range. The subrange functions permit an individual change of the variable in the subranges. Also disclosed are methods for adjusting imaging optics of an optical system, devices for determining a corrected variable, which depends on at least one parameter in a parameter range, and methods for determining a plurality of corrected wavefront errors in an image field.

Abstract: A method for determining a corrected variable, which depends on at least one parameter, in a parameter range of the parameter, includes carrying out a measurement, measurement values of the variable being made available in a plurality of separate and non-overlapping subranges of the parameter range; correcting measurement values of the variable using an approximation, in which measurement values of the variable are approximated with a smooth function and with subrange functions of the subranges of the parameter range. The smooth function allows reproduction of the progression of the variable over the parameter range. The subrange functions permit an individual change of the variable in the subranges. Also disclosed are methods for adjusting imaging optics of an optical system, devices for determining a corrected variable, which depends on at least one parameter in a parameter range, and methods for determining a plurality of corrected wavefront errors in an image field.