Patents by Inventor Christoph Rene Konrad Cebull HENNERKES

Christoph Rene Konrad Cebull HENNERKES has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • METHODS AND PATTERNING DEVICES AND APPARATUSES FOR MEASURING FOCUS PERFORMANCE OF A LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD
    Publication number: 20220091517
    Abstract: Disclosed is a method for selecting a structure for focus monitoring. The method comprises: simulating a Bossung response with focus of a focus dependent parameter, for one or more different structures; and selecting a structure for focus monitoring in a manufacturing process based on the results of said simulating step. The simulating step may be performed using a computational lithography simulation.
    Type: Application
    Filed: December 5, 2019
    Publication date: March 24, 2022
    Applicant: ASML Netherlands B.V.
    Inventors: Frank STAALS, Christoph Rene Konrad Cebull HENNERKES