Abstract: Disclosed is the use of water-soluble graft copolymers prepared by free-radically initiated graft polymerization of 40 to 90% by weight of component (A), selected from the group consisting of monosaccharides, oligosaccharides, polysaccharides and derivatives thereof, with 5 to 40% by weight of monomers (B), selected from the group consisting of ethylenically unsaturated C3-C10 monocarboxylic acids or the alkali or ammonium salts thereof, and 10 to 50% by weight of monomers (C), selected from the group consisting of ethylenically unsaturated N-containing monomers and/or ethylenically unsaturated monomers containing sulfo-groups, in cleaning compositions which, as well as the graft polymer, comprise at least one surfactant component, for hydrophilization and/or improvement of shine retention of hard surfaces which have been brought into contact with these cleaning compositions.

Abstract: Disclosed is the use of water-soluble graft copolymers prepared by free-radically initiated graft polymerization of 40 to 90% by weight of component (A), selected from the group consisting of monosaccharides, oligosaccaharides, polysaccharides and derivatives thereof, with 5 to 40% by weight of monomers (B), selected from the group consisting of ethylenically unsaturated C3-C10 monocarboxylic acids or the alkali or ammonium salts thereof, and 10 to 50% by weight of monomers (C), selected from the group consisting of ethylenically unsaturated N-containing monomers and/or ethylenically unsaturated monomers containing sulfo-groups, in cleaning compositions which, as well as the graft polymer, comprise at least one surfactant component, for hydrophilization and/or improvement of shine retention of hard surfaces which have been brought into contact with these cleaning compositions.

Abstract: The invention relates to the use of compounds of the general formula (I) wherein R, R?=H, C1-5-hydrocarbon radical, —O—C1-5-oxyhydrocarbon radical and are identical or different, R1, R2, R3=H, C1-5-hydrocarbon radical and are identical or different, X, Y=—O—; —O—C(O)—; —(O)C—O— and are identical or different, A=A?=—O—C(O)—O—; A?=R4—CH2C(CH2—)3, A?=—C(H)-isopropyl, R4=R4?=—CH3; R4?=—[CH2—CH(R1)]e—(Y)d—(CH2)c-Ph(R)a, a, b=1 to 5 and are identical or different, c, k=0 to 5 and are identical or different, d, h=0 or 1 and are identical or different, e, g=0 or 1 and are identical or different, f=0 or 1, m=1 to 3, n=0 or 1, as solubilizing agents/solvents for dissolving organic UV filters.

Abstract: Polymers which are suitable for use in cleaning compositions are described. The polymers are comprised of at least three different monomers. The types of monomers and ratios of the monomers in the polymers are further disclosed. Cleaning compositions containing the polymers for treating various surfaces and for use in various applications are also provided.

Abstract: The invention relates to the use of compounds of the general formula (I) wherein R,R??HC1-5-hydrocarbon radical, —O—C1-5-oxyhydrcarbon radical and are identical or different R1, R2, R3?H, C1-5-hydrocarbon radical and are identical or different, X,Y?—O—; —O—C(O)—; —(O)C—O— and are identical or different, A=A?=—O—C(O)—O—; A?=R4—CH2C(CH2—)3, A?=—C(H)isopropyl, R4?R4?=—CH3; R4?=—[CH2—CH(R1)]e-(Y)d—(CH2)c-Ph(R)a, a,b=1 to 5 and are identical or different, c,k=0 to 5 and are identical or different, d,h=0 or 1 and are identical or different, e,g=0 or 1 and are identical or different, f=0 or 1, m=1 to 3, n=0 or 1, as solubilizing agents/solvents for dissolving organic UV filters.