Patents by Inventor Christopher J. Tucker

Christopher J. Tucker has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20130274165
    Abstract: Described are stripper compositions, comprising an acidic microemulsion, said microemulsion comprising C1-4 carboxylic acid, a poorly water soluble solvent, a salt, a surfactant, and water, wherein the stripper composition comprises less than 40% of methyl benzoate, cyclic ketone, or a mixture thereof, and wherein the stripper composition is capable of removing a removable coating.
    Type: Application
    Filed: December 12, 2011
    Publication date: October 17, 2013
    Applicant: DOW GLOBAL TECHNOLOGIES LLC
    Inventors: Caroline Woelfle, Christopher J. Tucker
  • Publication number: 20130163203
    Abstract: The disclosure is directed to a thermally-stable dielectric fluid. The dielectric fluid includes (a) an oil, (b) a substituted, hindered phenolic antioxidant having at least two substituted cresol groups being covalently bonded to each other through a methylene bridge, and (c) a substituted, diphenyl amine antioxidant having at least two substituted phenyl groups being covalently bonded to each other through an amine bridge.
    Type: Application
    Filed: September 15, 2011
    Publication date: June 27, 2013
    Applicant: DOW GLOBAL TECHNOILOGIES INC.
    Inventors: Suh Joon Han, Dale C. Schmidt, Christopher J. Tucker
  • Publication number: 20130142907
    Abstract: Described are methods of providing a shelf-stable probiotic-containing food or beverage, comprising forming a semi-permeable microsphere, said microsphere comprising a probiotic, a high molecular weight polymer, and an effective amount of bacteriostatic agent.
    Type: Application
    Filed: September 6, 2011
    Publication date: June 6, 2013
    Applicant: DOW GLOBAL TECHNOLOGIES LLC
    Inventors: Liang Hong, Kathy L. Lichtenwald, Krishna Madduri, Syed A. Shah, Christopher J. Tucker, Caroline Woelfle
  • Patent number: 8440097
    Abstract: A chemical mechanical polishing composition useful for chemical mechanical polishing a semiconductor wafer containing an interconnect metal is provided, comprising, as initial components: water; an azole inhibitor; an alkali metal organic surfactant; a hydrotrope; a phosphorus containing agent; optionally, a non-saccharide water soluble polymer; optionally, a water soluble acid compound of formula I, wherein R is selected from a hydrogen and a C1-5 alkyl group, and wherein x is 1 or 2; optionally, a complexing agent; optionally, an oxidizer; optionally, an organic solvent; and, optionally, an abrasive.
    Type: Grant
    Filed: March 3, 2011
    Date of Patent: May 14, 2013
    Assignee: Rohm and Haas Electronic Materials CMP Holdings, Inc.
    Inventors: Hamed Lakrout, Jinjie Shi, Joseph Letizia, Xu Li, Thomas H. Kalantar, Francis Kelley, J. Keith Harris, Christopher J. Tucker
  • Patent number: 8435896
    Abstract: A chemical mechanical polishing composition useful for chemical mechanical polishing a semiconductor wafer containing an interconnect metal is provided, comprising, as initial components: water; an azole inhibitor; an alkali metal organic surfactant; a hydrotrope; a phosphorus containing agent; a water soluble cellulose; optionally, a non-saccharide water soluble polymer; optionally, a water soluble acid compound of formula I, wherein R is selected from a hydrogen and a C1-5 alkyl group, and wherein x is 1 or 2; optionally, a complexing agent; optionally, an oxidizer; optionally, an organic solvent; and, optionally, an abrasive.
    Type: Grant
    Filed: March 3, 2011
    Date of Patent: May 7, 2013
    Assignee: Rohm and Haas Electronic Materials CMP Holdings, Inc.
    Inventors: Hamed Lakrout, Jinjie Shi, Joseph Letizia, Xu Li, Thomas H. Kalantar, Francis Kelley, J. Keith Harris, Christopher J. Tucker
  • Publication number: 20130101531
    Abstract: The present invention relates to an ethanol-free, non-fatty, non-sticky perfumed aqueous cosmetic microemulsion composition, including one or more fragrance materials, a solvent, an aqueous medium, and optionally, one or more surfactants; wherein the solvent in the microemulsion is a vicinal diol such as 1,2-hexanediol.
    Type: Application
    Filed: November 29, 2012
    Publication date: April 25, 2013
    Inventors: Reed A. Shick, Christopher J. Tucker, Christian Piechocki, Letha A. Gatz
  • Patent number: 8343521
    Abstract: The present invention relates to an ethanol-free, non-fatty, non-sticky perfumed aqueous cosmetic microemulsion composition, including one or more fragrance materials, a solvent, an aqueous medium, and optionally, one or more surfactants; wherein the solvent in the microemulsion is a vicinal diol such as 1,2-hexanediol.
    Type: Grant
    Filed: April 21, 2005
    Date of Patent: January 1, 2013
    Inventors: Reed A. Shick, Christian Piechocki, Christopher J. Tucker, Letha A. Gatz
  • Publication number: 20120225556
    Abstract: A chemical mechanical polishing composition useful for chemical mechanical polishing a semiconductor wafer containing an interconnect metal is provided, comprising, as initial components: water; an azole inhibitor; an alkali metal organic surfactant; a hydrotrope; a phosphorus containing agent; optionally, a non-saccharide water soluble polymer; optionally, a water soluble acid compound of formula I, wherein R is selected from a hydrogen and a C1-5 alkyl group, and wherein x is 1 or 2; optionally, a complexing agent; optionally, an oxidizer; optionally, an organic solvent; and, optionally, an abrasive.
    Type: Application
    Filed: March 3, 2011
    Publication date: September 6, 2012
    Applicant: Rohm and Haas Electronic Materials CMP Holdings, Inc.
    Inventors: Hamed Lakrout, Jinjie Shi, Joseph Letizia, Xu Li, Thomas H. Kalantar, Francis Kelley, J. Keith Harris, Christopher J. Tucker
  • Publication number: 20120225555
    Abstract: A chemical mechanical polishing composition useful for chemical mechanical polishing a semiconductor wafer containing an interconnect metal is provided, comprising, as initial components: water; an azole inhibitor; an alkali metal organic surfactant; a hydrotrope; a phosphorus containing agent; a water soluble cellulose; optionally, a non-saccharide water soluble polymer; optionally, a water soluble acid compound of formula I, wherein R is selected from a hydrogen and a C1-5 alkyl group, and wherein x is 1 or 2; optionally, a complexing agent; optionally, an oxidizer; optionally, an organic solvent; and, optionally, an abrasive.
    Type: Application
    Filed: March 3, 2011
    Publication date: September 6, 2012
    Applicant: Rohm and Haas Electronic Materials CMP Holdings, Inc.
    Inventors: Hamed Lakrout, Jinjie Shi, Joseph Letizia, Xu Li, Thomas H. Kalantar, Francis Kelley, J. Keith Harris, Christopher J. Tucker
  • Publication number: 20120165242
    Abstract: A detergent composition having at least two components. The first component is from 14 to 50 wt % surfactants. The second component is from 0.05 to 4 wt % of a polymer which has polymerized residues of 40 to 65 wt % C1-C18 alkyl (meth)acrylates and 25 to 55 wt % C3-C6 carboxylic acid monomers.
    Type: Application
    Filed: December 19, 2011
    Publication date: June 28, 2012
    Inventors: Sze-Sze Ng, Qichun Wan, Christopher J. Tucker, Eric C. Greyson, Marianne Creamer, Joseph Manna, Jan Edward Shulman
  • Publication number: 20110141539
    Abstract: A multi-phase liquid composition comprising a conductive liquid and a non-conductive liquid, said liquids being non miscible, wherein the conductive liquid comprises more than 90% up to 99.9% by weight of a first component having a surface tension above 45 mN/m and comprising water, salt and at least one freezing point lowering agent, and from 0.01% to less than 10% by weight of a second component having a surface tension below 30 mN/m and comprising at least one first compound, wherein said at least one first compound is a non ionic surfactant.
    Type: Application
    Filed: August 6, 2009
    Publication date: June 16, 2011
    Applicant: VARIOPTIC
    Inventors: Mathieu Maillard, Liana Moreau, Christopher J. Tucker, Caroline Woelfle-Gupta, Daniel Lawrence Dermody
  • Publication number: 20100160452
    Abstract: A foamable aqueous composition having alcohol and at least one water soluble polymer.
    Type: Application
    Filed: October 2, 2007
    Publication date: June 24, 2010
    Inventors: Molly I-Chin Busby, Christopher J. Tucker
  • Publication number: 20080097038
    Abstract: Silane crosslinkable polymer compositions comprise (i) at least one silane crosslinkable polymer, e.g., ethylene-silane copolymer, and (ii) a catalytic amount of at least one polysubstituted aromatic sulfonic acid (PASA). The PASA catalysts are of the formula: HSO3Ar—R1(Rx)m Where: m is 0 to 3; R1 is (CH2)nCH3, and n is 0 to 3 or greater than 20; Each Rx is the same or different than R1; and Ar is an aromatic moiety.
    Type: Application
    Filed: August 1, 2005
    Publication date: April 24, 2008
    Inventors: Michael B. Biscoglio, John Klier, Bharat I. Chaudhary, Michael J. Mullins, Christopher J. Tucker
  • Publication number: 20080085935
    Abstract: A composition comprising at least one bisdithiocarbamate fungicide and at least one zinc additive is provided. Processes related thereto are also provided.
    Type: Application
    Filed: October 4, 2007
    Publication date: April 10, 2008
    Applicant: Dow AgroSciences LLC
    Inventors: Norman R. Pearson, Daniel L. Dermody, Melissa A. Mushrush, Christopher J. Tucker
  • Publication number: 20080085934
    Abstract: A composition comprising at least one bisdithiocarbamate fungicide and at least one zinc additive is provided. Processes related thereto are also provided.
    Type: Application
    Filed: October 4, 2007
    Publication date: April 10, 2008
    Applicant: Dow AgroSciences LLC
    Inventors: Norman R. Pearson, Daniel L. Dermody, Melissa A. Mushrush, Christopher J. Tucker
  • Patent number: 6916864
    Abstract: The present invention refers to a high internal phase polyelectrolyte emulsions which are useful for the manufacture of superabsorbent polymers having two phases: i) a continuous oil phase and the ii) a dispersed aqueous phase containing the aqueous monomer solution prior to polymerization and the polyelectrolyte in water-soluble, or water-swellable or very slightly crosslinked form after polymerization, wherein the polymerization occurs in the dispersed aqueous phase and wherein the dispersed aqueous phase contains a high concentration of polyelectrolyte. The present invention also refers to a process for preparing such emulsions and for inverting these emulsions so as to form films or other patterns of the superabsorbent polymer. Absorbent structures containing SAP films or other patterns prepared by the present invention are also contemplated.
    Type: Grant
    Filed: May 18, 2004
    Date of Patent: July 12, 2005
    Assignee: Dow Global Technologies Inc.
    Inventors: Herbert A. Gartner, Steven W. Mork, Heike Herr, Reed A. Shick, John Klier, Christopher J. Tucker
  • Patent number: 6835783
    Abstract: The present invention refers to a high internal phase polyclectrolyte emulsions which are useful for the manufacture of superabsorbent polymers having two phases: i) a continuous oil phase and the ii) a dispersed aqueous phase containing the aqueous monomer solution prior to polymerization and the polyelectrolyte in water-soluble, or water-swellable or very slightly crosslinked form after polymerization, wherein the polymerization occurs in the dispersed aqueous phase and wherein the dispersed aqueous phase contains a high concentration of polyclectrolyte. The present invention also refers to a process for preparing such emulsions and for inverting these emulsions so as to form films or other patterns of the superabsorbent polymer. Absorbent structures containing SAP films or other patterns prepared by the present invention are also contemplated.
    Type: Grant
    Filed: August 15, 2001
    Date of Patent: December 28, 2004
    Assignee: Dow Global Technologies Inc.
    Inventors: Herbert A. Gartner, Steven W. Mork, Heike Herr, Reed A. Shick, John Klier, Christopher J. Tucker
  • Publication number: 20040214961
    Abstract: The present invention refers to a high internal phase polyelectrolyte emulsions which are useful for the manufacture of superabsorbent polymers having two phases: i) a continuous oil phase and the ii) a dispersed aqueous phase containing the aqueous monomer solution prior to polymerization and the polyelectrolyte in water-soluble, or water-swellable or very slightly crosslinked form after polymerization, wherein the polymerization occurs in the dispersed aqueous phase and wherein the dispersed aqueous phase contains a high concentration of polyelectrolyte.
    Type: Application
    Filed: May 18, 2004
    Publication date: October 28, 2004
    Inventors: Herbert A. Gartner, Steven W. Mork, Heike Herr, Reed A. Shick, John Klier, Christopher J. Tucker
  • Patent number: 6759550
    Abstract: The present invention pertains to an improved method of oxidizing substituted aromatic compounds (such as p xylene) to their corresponding aromatic acids (such as terephthalic acid). The improvement involves carrying out the oxidation reaction in an aqueous medium, wherein the aqueous medium contains at least 30 percent water, preferably up to 30 percent surfactant and preferably a low molecular weight material containing a hydrophilic end group as a co-surfactant. The reaction is carried out at a pH of less than 3.0.
    Type: Grant
    Filed: November 13, 2002
    Date of Patent: July 6, 2004
    Assignee: The Dow Chemical Company
    Inventors: John Klier, Christopher J. Tucker, Thomas H. Kalantar, Kenneth A. Burdett, Daniel Patrick Green, Luciano Piras, Sergio Schena, Guo-shuh John Lee
  • Patent number: 6750966
    Abstract: A method for determining the percent of a solid material dissolved into a liquid medium is disclosed. The method comprises the steps of combining the solid material and the liquid medium; determining the initial solid concentration (i); determining the dynamic solid concentration (d) using a light scattering technique; and calculating the percent dissolved material according to the formula: [(i−d)/i]×100. Methods for determining dissolution rate and particle size using turbidity measurements are also disclosed.
    Type: Grant
    Filed: August 6, 2002
    Date of Patent: June 15, 2004
    Assignee: Dow Global Technologies Inc.
    Inventor: Christopher J. Tucker