Abstract: The invention relates to a method of manufacturing a patterned media Ni stamper comprising depositing a perfluorodecyltrichlorosilane release layer. The release layer eliminates bonding at the master-stamper interface. A permanent master for manufacturing a patterned media stamper is also provided.

Abstract: The invention relates to a method of manufacturing a patterned media Ni stamper comprising depositing a perfluorodecyltrichlorosilane release layer. The release layer eliminates bonding at the master-stamper interface. A permanent master for manufacturing a patterned media stamper is also provided.

Abstract: Embodiments of the invention generally provide an electron beam substrate processing system. In one embodiment, the present invention provides an electron beam substrate processing system where a spindle shaft used to rotate substrates during processing includes two encoder wheels. One encoder wheel is configured to provide a rotational speed data signal to a rotational speed control system. Another encoder wheel is configured to provide a pattern generator clock signal at a higher frequency than the rotational speed data signal to a pattern generator. In one embodiment of the present invention, at least one of the encoder wheels is positioned adjacent the substrate to minimize torsional and differential movements between the at least one encoder wheel and the substrate.

Abstract: A stamper/imprinter for use in performing thermal imprint lithography of a substrate/workpiece surface to form a pattern of features in first portions of the surface intended to receive the pattern, without incurring random formation of undesired, disordered features in second portions of the substrate/workpiece surface not intended to receive the pattern, comprising an imprinting surface configured to substantially prevent formation of gaps between the imprinting surface and the second portions of the surface during stamping/imprinting. Embodiments include stampers/imprinters with a multilevel imprinting surface comprises a first portion having a first level for forming the pattern of features in the first portions of the surface and a second portion having a second level for substantially preventing formation of gaps between the imprinting surface and the second portions of the surface during stamping/imprinting.

Abstract: In a beam lithography operation the relative motion between a work piece and the exposure beam produces variations in linear speed at different regions of the work piece surface. For example, if a disk work piece rotates with a constant angular velocity (CAV) relative to the beam, the linear surface speed relative to the beam impact point increases in proportion to increasing radial distance of that point from the center of the disk. To provide uniform exposure dose, the duty cycle of pulses of the exposure beam are varied in accord with radial distance.