Patents by Inventor Christopher K. Ober
Christopher K. Ober has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20230243794Abstract: Polymer nanostructures and compositions, devices, and systems comprising polymer nanostructures. In various examples, a composition, a device, or a system comprises a plurality of polymer nanostructures. The polymer nanostructures are disposed on a surface of a substrate. In various examples, the polymer nanostructures are disposed in pre-determined pattern on a surface of a substrate. In various examples, the polymer nanostructures are self-supporting. In various examples, a polymer nanostructure comprises a polypeptide group or the like. In various examples, a polymer nanostructure comprises an end group, such as, for example, a fluorescent end group, or the like. In various examples, a system is a sensor, which can be used to analyze a sample. In various examples, a composition, a device, or a system is used to analyze samples, such as, for example, samples comprising one or more volatile organic compound(s).Type: ApplicationFiled: January 30, 2023Publication date: August 3, 2023Inventors: Yuming Huang, Christopher K. Ober
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Publication number: 20210181627Abstract: A pattern-forming method includes: applying directly or indirectly on a substrate a radiation-sensitive composition containing a complex and an organic solvent to form a film; exposing the film to an ultraviolet ray, a far ultraviolet ray, an extreme ultraviolet ray, or an electron beam; and developing the film exposed, wherein the complex is represented by formula (1). [MmLnQp]??(1) In the formula (1), M represents a zinc atom, a cobalt atom, a nickel atom, a hafnium atom, a zirconium atom, a titanium atom, an iron atom, a chromium atom, a manganese atom, or an indium atom; and L represents a ligand derived from a compound represented by formula (2). R1—CHR3—R2 ??(2) In the formula (2), R1 and R2 each independently represent —C(?O)—RA, —C(?O)—ORB, or —CN.Type: ApplicationFiled: February 16, 2021Publication date: June 17, 2021Applicants: JSR CORPORATION, CORNELL UNIVERSITYInventors: Kazunori SAKAI, Vasiliki KOSMA, Christopher K. OBER, Emmanuel P. GIANNELIS
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Publication number: 20200387068Abstract: A radiation-sensitive composition including: a compound having a metal atom and a ligand; and a solvent. The ligand is derived from a first compound represented by the following formula (1), a second compound represented by the following formula (2), or a combination thereof. In the following formula (1), X1 represents a substituted or unsubstituted ethenyl group or a substituted or unsubstituted ethynyl group; Y1 represents —NRARB or —COOH. In the following formula (2), X2 represents a monovalent halogenated hydrocarbon group having 1 to 20 carbon atoms, a monovalent oxyorganic group having 1 to 20 carbon atoms, a substituted or unsubstituted aryl group having 6 to 20 carbon atoms, a cyano group, or a halogen atom; and Y2 represents —NRARB or —COOH.Type: ApplicationFiled: June 5, 2020Publication date: December 10, 2020Applicants: JSR CORPORATION, CORNELL UNIVERSITYInventors: Kazunori Sakai, Christopher K. Ober
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Publication number: 20190258162Abstract: A radiation-sensitive composition includes: a plurality of particles including a metal oxide as a principal component; and an organic solvent. A ratio (D90/D50) of a 90% cumulative diameter (D90) to a 50% cumulative diameter (D50) of the particles is no less than 1.0 and no greater than 1.3 as determined by a volumetric particle size distribution measurement according to dynamic light scattering with a 1% by mass dispersion at 25° C. prepared by dispersing the plurality of particles in propylene glycol monomethyl ether acetate.Type: ApplicationFiled: February 22, 2019Publication date: August 22, 2019Applicants: JSR CORPORATION, CORNELL UNIVERSITYInventors: Kazunori Sakai, Hong Xu, Christopher K. Ober, Emmanuel P. Giannelis
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Publication number: 20190033713Abstract: A radiation-sensitive composition includes a metal-containing component and an organic solvent. The metal-containing component includes particles including a metal oxide as a principal component. The metal-containing component includes at least two metal atoms which are different from one another, and a percentage content of the at least two metal atoms with respect to an entirety of metal atoms and metalloid atoms in the composition is no less than 50 atom %. The metal-containing component preferably includes: a first metal atom that is at least one selected from a titanium atom, a zirconium atom, a hafnium atom, a zinc atom, a tin atom and an indium atom; and a second metal atom that is at least one selected from a lanthanum atom and an yttrium atom.Type: ApplicationFiled: September 28, 2018Publication date: January 31, 2019Applicants: JSR CORPORATION, CORNELL UNIVERSITYInventors: Kazuki KASAHARA, Vasiliki Kosma, Mufei Yu, Emmanuel P. Giannelis, Christopher K. Ober
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Patent number: 10155903Abstract: The present inventive concepts provide metal etchant compositions and methods of fabricating a semiconductor device using the same. The metal etchant composition includes an organic peroxide in a range of about 0.1 wt % to about 20 wt %, an organic acid in a range of about 0.1 wt % to about 70 wt %, and an alcohol-based solvent in a range of about 10 wt % to about 99.8 wt %. The metal etchant composition may be used in an anhydrous system.Type: GrantFiled: March 21, 2016Date of Patent: December 18, 2018Assignees: Samsung Electronics Co., Ltd., Cornell UniversityInventors: Hyosan Lee, Yongsun Ko, Kyoungseob Kim, Kuntack Lee, Jihoon Jeong, Chen Lin, Christopher K. Ober
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Patent number: 10120277Abstract: A radiation-sensitive composition includes particles including a metal oxide as a principal component, and an organic solvent. A metal atom constituting the metal oxide includes a first metal atom that is a zinc atom, a boron atom, an aluminum atom, a gallium atom, a thallium atom, a germanium atom, an antimony atom, a bismuth atom, a tellurium atom, or a combination thereof. A percentage content of the first metal atom with respect to total metal atoms in the radiation-sensitive composition is no less than 50 atomic %. A pattern-forming method includes applying the radiation-sensitive composition to form a film on a substrate, exposing the film, and developing the film exposed.Type: GrantFiled: February 17, 2017Date of Patent: November 6, 2018Assignees: JSR CORPORATION, Cornell UniversityInventors: Kazuki Kasahara, Vasiliki Kosma, Jeremy Odent, Hong Xu, Mufei Yu, Emmanuel P. Giannelis, Christopher K. Ober
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Publication number: 20170242337Abstract: A radiation-sensitive composition includes particles including a metal oxide as a principal component, and an organic solvent. A metal atom constituting the metal oxide includes a first metal atom that is a zinc atom, a boron atom, an aluminum atom, a gallium atom, a thallium atom, a germanium atom, an antimony atom, a bismuth atom, a tellurium atom, or a combination thereof. A percentage content of the first metal atom with respect to total metal atoms in the radiation-sensitive composition is no less than 50 atomic %. A pattern-forming method includes applying the radiation-sensitive composition to form a film on a substrate, exposing the film, and developing the film exposed.Type: ApplicationFiled: February 17, 2017Publication date: August 24, 2017Applicants: JSR CORPORATION, CORNELL UNIVERSITYInventors: KAZUKI KASAHARA, VASILIKI KOSMA, JEREMY ODENT, HONG XU, MUFEI YU, EMMANUEL P. GIANNELIS, CHRISTOPHER K. OBER
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Patent number: 9541830Abstract: Block copolymers and methods of making patterns of organic thin films using the block copolymers. The block copolymers comprise a fluorinated block. Thin films of the block copolymers have microdomains that can be aligned. As a result the patterns of organic thin films having smaller dimensions than the pattern of incident deep-UV or e-beam radiation can be formed. For example, the block copolymers can be used in lithography, filtration, and templating applications.Type: GrantFiled: September 6, 2012Date of Patent: January 10, 2017Assignee: Cornell UniversityInventors: Christopher K. Ober, Rina Maeda, Nam-ho You, Teruaki Hayakawa
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Patent number: 9500952Abstract: An orthogonal process for photolithographic patterning organic structures is disclosed. The disclosed process utilizes fluorinated solvents or supercritical CO2 as the solvent so that the performance of the organic conductors and semiconductors would not be adversely affected by other aggressive solvent. One disclosed method may also utilize a fluorinated photoresist together with the HFE solvent, but other fluorinated solvents can be used. In one embodiment, the fluorinated photoresist is a resorcinarene, but various fluorinated polymer photoresists and fluorinated molecular glass photoresists can be used as well. For example, a copolymer perfluorodecyl methacrylate (FDMA) and 2-nitrobenzyl methacrylate (NBMA) is a suitable orthogonal fluorinated photoresist for use with fluorinated solvents and supercritical carbon dioxide in a photolithography process.Type: GrantFiled: December 11, 2015Date of Patent: November 22, 2016Assignee: Cornell UniversityInventors: Christopher K. Ober, George Malliaras, Jin-Kyun Lee, Alexander Zakhidov, Margarita Chatzichristidi, Priscilla Dodson
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Publication number: 20160204001Abstract: The present inventive concepts provide metal etchant compositions and methods of fabricating a semiconductor device using the same. The metal etchant composition includes an organic peroxide in a range of about 0.1 wt % to about 20 wt %, an organic acid in a range of about 0.1 wt % to about 70 wt %, and an alcohol-based solvent in a range of about 10 wt % to about 99.8 wt %. The metal etchant composition may be used in an anhydrous system.Type: ApplicationFiled: March 21, 2016Publication date: July 14, 2016Inventors: Hyosan Lee, Yongsun Ko, Kyoungseob Kim, Kuntack Lee, Jihoon Jeong, Chen Lin, Christopher K. Ober
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Patent number: 9389511Abstract: A method for forming patterns of organic polymer materials. The method can be used to form a layer with two patterned organic polymer materials. The photoresist and solvents used in the photoresist deposition and removal steps do not substantially affect the organic polymer materials.Type: GrantFiled: March 19, 2012Date of Patent: July 12, 2016Assignee: Cornell UniversityInventors: Evan L. Schwartz, Wei Min Chan, Jin-Kyun Lee, Sandip Tiwari, Christopher K. Ober
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Publication number: 20160097977Abstract: An orthogonal process for photolithographic patterning organic structures is disclosed. The disclosed process utilizes fluorinated solvents or supercritical CO2 as the solvent so that the performance of the organic conductors and semiconductors would not be adversely affected by other aggressive solvent. One disclosed method may also utilize a fluorinated photoresist together with the HFE solvent, but other fluorinated solvents can be used. In one embodiment, the fluorinated photoresist is a resorcinarene, but various fluorinated polymer photoresists and fluorinated molecular glass photoresists can be used as well. For example, a copolymer perfluorodecyl methacrylate (FDMA) and 2-nitrobenzyl methacrylate (NBMA) is a suitable orthogonal fluorinated photoresist for use with fluorinated solvents and supercritical carbon dioxide in a photolithography process.Type: ApplicationFiled: December 11, 2015Publication date: April 7, 2016Inventors: Christopher K. Ober, George Malliaras, Jin-Kyun Lee, Alexander Zakhidov, Margarita Chatzichristidi, Priscilla Dodson
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Publication number: 20150368557Abstract: The present inventive concepts provide metal etchant compositions and methods of fabricating a semiconductor device using the same. The metal etchant composition includes an organic peroxide in a range of about 0.1 wt % to about 20 wt %, an organic acid in a range of about 0.1 wt % to about 70 wt %, and an alcohol-based solvent in a range of about 10 wt % to about 99.8 wt %. The metal etchant composition may be used in an anhydrous system.Type: ApplicationFiled: June 23, 2014Publication date: December 24, 2015Inventors: Hyosan Lee, Yongsun Ko, Kyoungseob Kim, Kuntack Lee, Jihoon Jeong, Chen Lin, Christopher K. Ober
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Patent number: 9213238Abstract: An orthogonal process for photolithographic patterning organic structures is disclosed. The disclosed process utilizes fluorinated solvents or supercritical CO2 as the solvent so that the performance of the organic conductors and semiconductors would not be adversely affected by other aggressive solvent. One disclosed method may also utilize a fluorinated photoresist together with the HFE solvent, but other fluorinated solvents can be used. In one embodiment, the fluorinated photoresist is a resorcinarene, but various fluorinated polymer photoresists and fluorinated molecular glass photoresists can be used as well. For example, a copolymer perfluorodecyl methacrylate (FDMA) and 2-nitrobenzyl methacrylate (NBMA) is a suitable orthogonal fluorinated photoresist for use with fluorinated solvents and supercritical carbon dioxide in a photolithography process.Type: GrantFiled: August 28, 2014Date of Patent: December 15, 2015Assignee: Cornell UniversityInventors: Christopher K. Ober, George Malliaras, Jin-Kyun Lee, Alexander Zakhidov, Margarita Chatzichristidi, Priscilla Dodson
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Publication number: 20150234272Abstract: The invention provides new nanoparticles that include a Group 4 metal oxide core and a coating surrounding the core, where the coating contains a ligand according to Formula (I), or a carboxylate thereof. The invention also provides new photoresist compositions that include a photoacid generator and a ligand acid or carboxylate thereof, where pKaPAG is lower than pKaLA. Methods for patterning a substrate using the inventive photoresist composition are also provided.Type: ApplicationFiled: February 14, 2014Publication date: August 20, 2015Applicants: Intel Corporation, Cornell UniversityInventors: Chandrasekhar SARMA, Christopher K. OBER, Emmanuel P. GIANNELIS, Souvik CHAKRABARTY
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Publication number: 20150205206Abstract: An orthogonal process for photolithographic patterning organic structures is disclosed. The disclosed process utilizes fluorinated solvents or supercritical CO2 as the solvent so that the performance of the organic conductors and semiconductors would not be adversely affected by other aggressive solvent. One disclosed method may also utilize a fluorinated photoresist together with the HFE solvent, but other fluorinated solvents can be used. In one embodiment, the fluorinated photoresist is a resorcinarene, but various fluorinated polymer photoresists and fluorinated molecular glass photoresists can be used as well. For example, a copolymer perfluorodecyl methacrylate (FDMA) and 2-nitrobenzyl methacrylate (NBMA) is a suitable orthogonal fluorinated photoresist for use with fluorinated solvents and supercritical carbon dioxide in a photolithography process.Type: ApplicationFiled: August 28, 2014Publication date: July 23, 2015Inventors: Christopher K. OBER, George MALLIARAS, Jin-Kyun LEE, Alexander ZAKHIDOV, Margarita CHATZICHRISTIDI, Priscilla DODSON
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Publication number: 20140370442Abstract: Block copolymers and methods of making patterns of organic thin films using the block copolymers. The block copolymers comprise a fluorinated block. Thin films of the block copolymers have microdomains that can be aligned. As a result the patterns of organic thin films having smaller dimensions than the pattern of incident deep-UV or e-beam radiation can be formed. For example, the block copolymers can be used in lithography, filtration, and templating applications.Type: ApplicationFiled: September 6, 2012Publication date: December 18, 2014Applicant: CORNELL UNIVERSITYInventors: Christopher K. Ober, Rina Maeda, Nam-ho You, Teruaki Hayakawa
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Patent number: 8846301Abstract: An orthogonal process for photolithographic patterning organic structures is disclosed. The disclosed process utilizes fluorinated solvents or supercritical CO2 as the solvent so that the performance of the organic conductors and semiconductors would not be adversely affected by other aggressive solvent. One disclosed method may also utilize a fluorinated photoresist together with the HFE solvent, but other fluorinated solvents can be used. In one embodiment, the fluorinated photoresist is a resorcinarene, but various fluorinated polymer photoresists and fluorinated molecular glass photoresists can be used as well. For example, a copolymer perfluorodecyl methacrylate (FDMA) and 2-nitrobenzyl methacrylate (NBMA) is a suitable orthogonal fluorinated photoresist for use with fluorinated solvents and supercritical carbon dioxide in a photolithography process.Type: GrantFiled: May 21, 2009Date of Patent: September 30, 2014Assignee: Cornell UniversityInventors: Christopher K. Ober, George Malliaras, Jin-Kyun Lee, Alexander Zakhidov, Margarita Chatzichristidi, Priscilla Taylor
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Publication number: 20140205818Abstract: A method for forming patterns of organic polymer materials. The method can be used to form a layer with two patterned organic polymer materials. The photoresist and solvents used in the photoresist deposition and removal steps do not substantially affect the organic polymer materials.Type: ApplicationFiled: March 19, 2012Publication date: July 24, 2014Applicant: Conrnell UniversityInventors: Evan L. Schwartz, Wei Min Chan, Jin-Kyun Lee, Sandip Tiwari, Christopher K. Ober