Abstract: An illumination circuit includes a series circuit including light sources connected in series between a high voltage node and a low voltage node, and break-protecting circuits. Each break-protecting circuit includes a control circuit and a bypass circuit. The bypass circuit is connected in parallel to at least one corresponding light source of the light sources.

Abstract: An exemplary digital photo frame includes an image memory configured for storing a display image, a display device configured for reading and displaying the display image, an infrared sensor configured for detecting infrared light, generating a first detecting signal when the infrared light is detected, generating a second detecting signal when the detected infrared light is no longer detectable, and a camera control circuit including a reference image therein. The camera control circuit generates an instant image and compares the instant image with the reference image when the first detecting signal is generated. The digital photo frame is configured to operate in a monitor mode or a display mode according to a comparing result when the infrared light is detected.

Abstract: An illumination circuit includes a series circuit including light sources connected in series between a high voltage node and a low voltage node, and break-protecting circuits. Each break-protecting circuit includes a control circuit and a bypass circuit. The bypass circuit is connected in parallel to at least one corresponding light source of the light sources.

Abstract: A liquid crystal display panel (21) includes a display area (210) and an image sensing system (23). The image sensing system is arranged in the display area. The image sensing system is capable of sensing ambient light and converting the ambient light into image signals. The display area is capable of displaying images corresponding to the image signals.

Abstract: An exemplary digital photo frame includes an image memory configured for storing a display image, a display device configured for reading and displaying the display image, an infrared sensor configured for detecting infrared light, generating a first detecting signal when the infrared light is detected, generating a second detecting signal when the detected infrared light is no longer detectable, and a camera control circuit including a reference image therein. The camera control circuit generates an instant image and compares the instant image with the reference image when the first detecting signal is generated. The digital photo frame is configured to operate in a monitor mode or a display mode according to a comparing result when the infrared light is detected.

Abstract: An active layer of a P-type low temperature polysilicon thin film transistor and a bottom electrode of a storage capacitor are first formed. Then, a P-type source/drain is formed and the bottom electrode is doped with dopants. A gate insulator, a gate electrode, a capacitor dielectric, and a top electrode are thereafter formed. Finally, a source interconnect, a drain interconnect, and a pixel electrode of the liquid crystal display are formed.

Abstract: Electronic devices with electrostatic discharge protection are provided. The electronic devices can comprise an array substrate with electrostatic discharge (ESD) protection, having a substrate, a plurality of conductive lines overlying the substrate along a first direction and at least one conductive segment overlying the substrate between every two conductive lines, wherein each conductive segment is electrically isolated from the conductive lines.

Abstract: The present invention provides a method of forming a liquid crystal display (LCD). Active layers of N-type and P-type low temperature polysilicon thin film transistors and a bottom electrode of a storage capacitor are formed first. Then a N-type source/drain is formed and the bottom electrode is doped with dopants. A gate insulator, a gate electrode, a capacitor dielectric, and a top electrode are thereafter formed. After that, a P-type source/drain is formed. Finally, a source interconnect, a drain interconnect, and a pixel electrode of the liquid crystal display are formed.

Abstract: An active layer of a P-type low temperature polysilicon thin film transistor and a bottom electrode of a storage capacitor are first formed. Then, a P-type source/drain is formed and the bottom electrode is doped with dopants. A gate insulator, a gate electrode, a capacitor dielectric, and a top electrode are thereafter formed. Finally, a source interconnect, a drain interconnect, and a pixel electrode of the liquid crystal display are formed.

Abstract: A semiconductor method for a liquid crystal display that includes providing a substrate, providing a layer of insulating material over the substrate, depositing a layer of amorphous silicon over the layer of insulating material, crystallizing the layer of amorphous silicon to form a layer of polysilicon, treating the layer of polysilicon to change the properties of a surface of the layer of polysilicon, and smoothing the surface of the layer of polysilicon.

Abstract: A method of fabricating a polysilicon film by an excimer laser annealing process is introduced. First, an amorphous silicon film is deposited on a substrate composed of glass. The amorphous silicon film includes a first region, which is located in the center, with a first thickness, and a second region, which is located in the periphery, with a slant sidewall. The thickness of the amorphous silicon film is measured so as to obtain the profile of the sidewall in the second region. According to the profile of the sidewall, a pre-cursor region is determined for performing an excimer laser annealing process wherein a second thickness in the boundary of the pre-curser regionis smaller than the first thickness so as to increase area of produced polysilicon film.

Abstract: The present invention provides a method of forming a liquid crystal display (LCD). Active layers of N-type and P-type low temperature polysilicon thin film transistors and a bottom electrode of a storage capacitor are formed first. Then a N-type source/drain is formed and the bottom electrode is doped with dopants. A gate insulator, a gate electrode, a capacitor dielectric, and a top electrode are thereafter formed. After that, a P-type source/drain is formed. Finally, a source interconnect, a drain interconnect, and a pixel electrode of the liquid crystal display are formed.

Abstract: A six mask-steps method for fabricating liquid crystal display is described. A driving area and a pixel area are defined by a first mask step. Gates on the driving/pixel area and upper electrodes of capacitors on the pixel area are defined by a second mask step. Then, using the gates and the upper electrodes as a mask, a source/drain, channel region and lower electrode are formed in the driving/pixel area by an ion-doping process. A second insulation layer is formed and covers the insulation substrate. A plurality of first openings is formed by the third mask step and the gate and the source/drain are exposed. A second conductive layer is formed and covers the second insulation layer and the first opening is filled. Then, the second conductive layer is patterned, and a source/drain line is formed and contacts electrically with the source/drain by the fourth mask step. A dielectric layer is formed and covers the second insulation layer and the second conductive layer; the dielectric layer has a planar surface.

Abstract: A liquid crystal display device that includes a pixel electrode, a liquid crystal layer, a first dielectric layer formed between the pixel electrode and the liquid crystal layer having a first index of refraction and a first optical thickness, and a second dielectric layer formed between the first dielectric layer and the liquid crystal layer having a second index of refraction and a second optical thickness, wherein the second index of refraction is larger than the first index of refraction and the second optical thickness is larger than the first optical thickness.

Abstract: A method for fabricating a thin film transistor array and driving circuit comprising the steps of: providing a substrate; patterning a polysilicon layer and an N+ thin film over the substrate to form a plurality of islands; patterning the islands to form P+ doped regions; patterning out source/drain terminals and the lower electrode of a storage capacitor; etching back the N+ thin film; patterning out a gate and the upper electrode of the storage capacitor and patterning a passivation layer and a conductive layer to form pixel electrodes and a wiring layout.

Abstract: A method of silicon crystallization that includes providing an insulated substrate, depositing a layer of amorphous silicon over the substrate, crystallizing the layer of amorphous silicon in an oxygen environment for a reduced surface roughness on the layer of crystallized silicon, and oxidizing the layer of amorphous silicon simultaneously with crystallizing the layer of amorphous silicon to form a layer of gate insulator.

Abstract: A method of fabricating a polysilicon film by an excimer laser annealing process is introduced. First, an amorphous silicon film is deposited on a substrate composed of glass. The amorphous silicon film includes a first region, which is located in the center, with a first thickness, and a second region, which is located in the periphery, with a slant sidewall. The thickness of the amorphous silicon film is measured so as to obtain the profile of the sidewall in the second region. According to the profile of the sidewall, a pre-curser region is determined for performing an excimer laser annealing process wherein a second thickness in the boundary of the pre-curser region is smaller than the first thickness so as to increase area of produced polysilicon film.

Abstract: A liquid crystal display includes a reflective pixel electrode, a transparent electrode, a liquid crystal layer and a transparent conductive layer. The transparent electrode cooperates with the reflective pixel electrode to provide a driving voltage. The liquid crystal layer includes a plurality of liquid crystal molecules and is sandwiched between the reflective pixel electrode and the transparent electrode to align in a predetermined manner in response to the driving voltage. The transparent conductive layer is disposed between the reflective pixel electrode and the liquid crystal layer for protecting the reflective pixel electrode and enhancing the reflectivity of the pixel electrode without undesirably consuming the driving voltage.

Abstract: A six mask-steps method for fabricating liquid crystal display is described. A driving area and a pixel area are defined by a first mask step. Gates on the driving/pixel area and upper electrodes of capacitors on the pixel area are defined by a second mask step. Then, using the gates and the upper electrodes as a mask, a source/drain, channel region and lower electrode are formed in the driving/pixel area by an ion-doping process. A second insulation layer is formed and covers the insulation substrate. A plurality of first openings is formed by the third mask step and the gate and the source/drain are exposed. A second conductive layer is formed and covers the second insulation layer and the first opening is filled. Then, the second conductive layer is patterned, and a source/drain line is formed and contacts electrically with the source/drain by the fourth mask step. A dielectric layer is formed and covers the second insulation layer and the second conductive layer; the dielectric layer has a planar surface.

Abstract: An organic backlight device for liquid crystal display application is provided. The organic backlight device has organic light emitting layers, which are arranged in such as linear arrangement and controlled by a driving circuit, to emit light at least three different bandwidths by turns, for example, in red, green and blue bandwidths. By emitting light with a high frequency by turns, persistence of color vision is produced to a viewer. A thin and light backlight source with high brightness and uniformity is therefore obtained.