Abstract: Provided is a method for treating cancer by administering to a subject in need thereof with a pharmaceutical composition including a benzenesulfonamide derivative in combination with a cancer immunotherapeutic agent such as the immune check point inhibitor (ICI).

Abstract: Provided is a pharmaceutical composition for treating malignant peripheral nerve sheath (MPNST), including a benzenesulfonamide derivative and a pharmaceutically acceptable carrier. Also provided is a method for treating canine MPNST by administering the pharmaceutical composition to a subject in need thereof.

Abstract: A button structure and an electronic device are provided. The electronic device includes a housing and a button structure disposed at the housing. The button structure includes a button body and an elastic body. The button body includes a keycap and a pillar portion. The keycap is connected to one end of the pillar portion. The elastic body is sleeved on the pillar portion, and one end of the elastic body includes a first engaging portion. The first engaging portion is capable of being engaged with a part of the housing.

Abstract: An elastic buckling element includes a base and an elastic buckling portion. The base includes a bearing surface, and the bearing surface defines a horizontal direction parallel to the bearing surface and a vertical direction perpendicular to the bearing surface, one end of the elastic buckling portion is fixed on the bearing surface of the base, and the elastic buckling portion and the base have a first height in the vertical direction, and the elastic buckling portion is arranged along the horizontal direction and has a horizontal extension length in the horizontal direction, wherein the horizontal extension length is greater than the first height.

Abstract: A quick-release cover structure includes a casing and a cover. The casing includes a through slot, a protrusion and an engagement hole. The protrusion protrudes from a first slot wall of the through slot. The engagement hole is arranged on a second slot wall of the through slot. The cover is assembled to cover the through slot, and includes a plate, an engagement member, an elastic hook and a handle. The engagement member and the elastic hook respectively protrudes from the plate and are adjacent to different side edges, the protrusion is adapted to extend through the engagement member, and the elastic hook is adapted to be engaged with the engagement hole. When the handle is moved away from the through slot by an acting force, the elastic hook is deformed and disengaged from the engagement hole, so that the cover is separated from the casing.

Abstract: The present invention discloses an electrical connector and an electrical connector assembly. The electrical connector includes a circuit board, a connection port, and an insulating member. The circuit board has a conductive region, located on a surface of the circuit board. The connection port is arranged on the surface of the circuit board, and the connection port is electrically connected to the circuit board. The insulating member is arranged on the circuit board, and surrounds an outer periphery of the connection port. The insulating member includes a metal layer, arranged on an outer surface of the insulating member.

Abstract: An electronic device with a camera anti-peeping structure includes a main body, a camera and an anti-peeping structure. The anti-peeping structure includes a mounting member, a sliding member and an anti-peeping piece. The sliding member is slidably disposed in a groove of the sliding member. The sliding member includes a first magnet. The anti-peeping piece includes a first end with a second magnet and a second end. The second end is pivotable based on the first end. When the sliding member moves to the first position, the first magnet attracts the second magnet such that the second end of the anti-peeping piece pivots toward the sliding member to expose the camera. When the sliding member moves to the second position, the first magnet repels the second magnet repel such that the second end of the anti-peeping piece pivots away from the sliding member to cover the camera.

Abstract: The present invention discloses an electrical connector and an electrical connector assembly. The electrical connector includes a circuit board, a connection port, and an insulating member. The circuit board has a conductive region, located on a surface of the circuit board. The connection port is arranged on the surface of the circuit board, and the connection port is electrically connected to the circuit board. The insulating member is arranged on the circuit board, and surrounds an outer periphery of the connection port. The insulating member includes a metal layer, arranged on an outer surface of the insulating member.

Abstract: A progressive self-learning (PSL) method is provided for enhancing wafer or mask defect inspection review and classification by identifying a plurality of wafer or mask defects, and by classifying each of the plurality of defects according to an extent of resemblance of each defect. The method having the steps of: performing image processing on a scanned defect image; aligning the scanned defect image with a just-stored digitized defect image; matching the scanned defect image with a just-stored digitized defect image; and classifying the scanned defect image.

Abstract: A back-end method for photomask making generally includes the steps of inspecting a photomask and repairing each defect on the photomask. The step of inspecting the photomask preferably comprises a defect finder mark implementation routine. In general, when inspecting the photomask for defects, the defect finder mark implementation routine deposits a defect finder mark on the photomask via a mark installer (not shown) included with a mask marking inspection system. Deposition of the defect finder mark includes establishing a location that is adjacent to the defect and establishing a size that is detectable by a mask repair device (not shown). By deposition on the photomask, the defect finder mark reliably facilitates location of the corresponding defect despite variations in image resolution and stage movement between the mask marking inspection system and the mask repair device.

Abstract: A progressive self-learning (PSL) method is provided for enhancing wafer or mask defect inspection review and classification by identifying a plurality of wafer or mask defects, and by classifying each of the plurality of defects according to an extent of resemblance of each defect. The method having the steps of: performing image processing on a scanned defect image; aligning the scanned defect image with a just-stored digitized defect image; matching the scanned defect image with a just-stored digitized defect image; and classifying the scanned defect image.

Abstract: The use of dual-focused ion beams for semiconductor image scanning and mask repair is disclosed. A mask is imaged with either a focused negative ion beam, such as a focused oxygen ion beam, or a focused positive ion beam, such as a focused gallium ion beam. Mask imaging is also referred to as image scanning. Defects in the mask are repaired with the ion beam not used in imaging of the mask. Also disclosed is image scanning being performed with the focused negative ion beam to neutralize potential charge buildup, and mask repair being performed with the focused positive ion beam. An apparatus is disclosed that has a negative ion mechanism supplying negative ions, a positive ion mechanism supplying positive ions, a filter to select the desired ratio of the negative to the positive ions, and an aiming mechanism to focus the ions onto the mask.

Abstract: A back-end method for photomask making generally includes the steps of inspecting a photomask and repairing each defect on the photomask. The step of inspecting the photomask preferably comprises a defect finder mark implementation routine. In general, when inspecting the photomask for defects, the defect finder mark implementation routine deposits a defect finder mark on the photomask via a mark installer (not shown) included with a mask marking inspection system. Deposition of the defect finder mark includes establishing a location that is adjacent to the defect and establishing a size that is detectable by a mask repair device (not shown). By deposition on the photomask, the defect finder mark reliably facilitates location of the corresponding defect despite variations in image resolution and stage movement between the mask marking inspection system and the mask repair device.

Abstract: The use of dual-focused ion beams for semiconductor image scanning and mask repair is disclosed. A mask is imaged with either a focused negative ion beam, such as a focused oxygen ion beam, or a focused positive ion beam, such as a focused gallium ion beam. Mask imaging is also referred to as image scanning. Defects in the mask are repaired with the ion beam not used in imaging of the mask. Also disclosed is image scanning being performed with the focused negative ion beam to neutralize potential charge buildup, and mask repair being performed with the focused positive ion beam. An apparatus is disclosed that has a negative ion mechanism supplying negative ions, a positive ion mechanism supplying positive ions, a filter to select the desired ratio of the negative to the positive ions, and an aiming mechanism to focus the ions onto the mask.