Patents by Inventor Chuangxin ZHAO

Chuangxin ZHAO has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Radiation source, lithographic apparatus device manufacturing method, sensor system and sensing method
    Patent number: 10222701
    Abstract: A radiation source for a lithographic apparatus, in particular a laser-produced plasma source includes a fan unit surrounding but not obstructing the collected radiation beam that is operated to generate a flow in a buffer gas away from the optical axis. The fan unit can include a plurality of flat or curved blades generally parallel to the optical axis and driven to rotate about the optical axis.
    Type: Grant
    Filed: September 18, 2014
    Date of Patent: March 5, 2019
    Assignee: ASML Netherlands B.V.
    Inventors: Chuangxin Zhao, Sander Baltussen, Pär Mårten Lukas Broman, Richard Joseph Bruls, Cristian Bogdan Craus, Jan Groenewold, Dzmitry Labetski, Kerim Nadir, Hendrikus Gijsbertus Schimmel, Christian Felix Wählisch
  • Device for monitoring a radiation source, radiation source, method of monitoring a radiation source, device manufacturing method
    Patent number: 10042260
    Abstract: Capacitive measurements for monitoring vapor or deposits from a vapor in a radiation source for a lithography apparatus. The measurements may be used to control operation of the radiation source. In one particular arrangement measurements from a plurality of capacitors are used to distinguish between changes in capacitance caused by the vapor and changes in capacitance caused by deposits from the vapor.
    Type: Grant
    Filed: August 11, 2015
    Date of Patent: August 7, 2018
    Assignee: ASML Netherlands B.V.
    Inventors: Erik Willem Bogaart, Chuangxin Zhao
  • Device For Monitoring A Radiation Source, Radiation Source, Method Of Monitoring A Radiation Source, Device Manufacturing Method
    Publication number: 20170307978
    Abstract: Capacitive measurements for monitoring vapor or deposits from a vapor in a radiation source for a lithography apparatus. The measurements may be used to control operation of the radiation source. In one particular arrangement measurements from a plurality of capacitors are used to distinguish between changes in capacitance caused by the vapor and changes in capacitance caused by deposits from the vapor.
    Type: Application
    Filed: August 11, 2015
    Publication date: October 26, 2017
    Applicant: ASML Netherlands B.V.
    Inventors: Erik Willem BOGAART, Chuangxin ZHAO
  • RADIATION SOURCE, LITHOGRAPHIC APPARATUS DEVICE MANUFACTURING METHOD, SENSOR SYSTEM AND SENSING METHOD
    Publication number: 20160209753
    Abstract: A radiation source for a lithographic apparatus, in particular a laser-produced plasma source includes a fan unit surrounding but not obstructing the collected radiation beam that is operated to generate a flow in a buffer gas away from the optical axis. The fan unit can include a plurality of flat or curved blades generally parallel to the optical axis and driven to rotate about the optical axis.
    Type: Application
    Filed: September 18, 2014
    Publication date: July 21, 2016
    Applicant: ASML Netherlands B.V.
    Inventors: Chuangxin ZHAO, Pär Mårten Lukas BROMAN, Richard Joseph BRULS, Cristian Bogdan CRAUS, Jan GROENEWOLD, Dzmitry LABETSKI, Kerim NADIR, Hendrikus Gijsbertsu SCHIMMEL, Christian Felix WäHLISCH