Patents by Inventor Chul-Hwan Choi

Chul-Hwan Choi has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11967269
    Abstract: A scan driver includes: a first transistor having a first electrode coupled to an output scan line, a second electrode coupled to a first power line, and a gate electrode coupled to a first node; a second transistor having a first electrode coupled to a first clock line, a second electrode coupled to the output scan line, and a gate electrode coupled to a second node; a third transistor having a first electrode coupled to the first node, a second electrode coupled to a first input scan line, and a gate electrode coupled to a second clock line; and a fourth transistor having a first electrode coupled to the second node and a second electrode and a gate electrode, which are coupled to a second input scan line, wherein the first input scan line and the second input scan line are different from each other.
    Type: Grant
    Filed: October 4, 2022
    Date of Patent: April 23, 2024
    Assignee: Samsung Display Co., Ltd.
    Inventors: Chul Kyu Kang, Sung Hwan Kim, Soo Hee Oh, Dong Sun Lee, Sang Moo Choi
  • Patent number: 10982782
    Abstract: A valve apparatus includes a valve block with a main flow path, a first valve installed on the valve block and connected to the main flow path so that when the first valve turns on, a first fluid is supplied from the main flow path to a process chamber via the first valve, and a second valve installed on the valve block and connected to the main flow path so that when the first valve turns off and the second valve turns on, a second fluid is supplied from the main flow path to a waste gas treatment system via the second valve. The main flow path is disposed parallel to a central axis passing through a center of the valve block and two opposing surfaces of the valve block perpendicularly thereto. The main flow path is disposed to be offset from the central axis toward the first valve.
    Type: Grant
    Filed: August 19, 2019
    Date of Patent: April 20, 2021
    Assignee: SAMSUNG ELECTRONICS CO., LTD.
    Inventors: Dae Wee Kong, Se Jin Kyung, Chul Hwan Choi
  • Publication number: 20200149642
    Abstract: A valve apparatus includes a valve block with a main flow path, a first valve installed on the valve block and connected to the main flow path so that when the first valve turns on, a first fluid is supplied from the main flow path to a process chamber via the first valve, and a second valve installed on the valve block and connected to the main flow path so that when the first valve turns off and the second valve turns on, a second fluid is supplied from the main flow path to a waste gas treatment system via the second valve. The main flow path is disposed parallel to a central axis passing through a center of the valve block and two opposing surfaces of the valve block perpendicularly thereto. The main flow path is disposed to be offset from the central axis toward the first valve.
    Type: Application
    Filed: August 19, 2019
    Publication date: May 14, 2020
    Inventors: Dae Wee KONG, Se Jin KYUNG, Chul Hwan CHOI
  • Patent number: 10522379
    Abstract: A substrate transfer apparatus includes: a chamber including a lower surface, an upper surface opposing the lower surface, and a side surface extending between the lower surface and the upper surface; and a fan filter unit disposed on the upper surface of the chamber and configured to introduce air into the chamber. The chamber includes an inclined surface extending from the upper surface to the side surface and positioned to a side of the fan filter unit.
    Type: Grant
    Filed: September 18, 2017
    Date of Patent: December 31, 2019
    Assignee: Samsung Electronics Co., Ltd.
    Inventors: Dae Wee Kong, Kang Min Park, Chul Hwan Choi, Yong Joon Hong, Kang Soo Kim, Sang Ho Roh, Heok Jae Lee, Sang Jin Choi
  • Publication number: 20180122676
    Abstract: A substrate transfer apparatus includes: a chamber including a lower surface, an upper surface opposing the lower surface, and a side surface extending between the lower surface and the upper surface; and a fan filter unit disposed on the upper surface of the chamber and configured to introduce air into the chamber. The chamber includes an inclined surface extending from the upper surface to the side surface and positioned to a side of the fan filter unit.
    Type: Application
    Filed: September 18, 2017
    Publication date: May 3, 2018
    Inventors: Dae Wee Kong, Kang Min Park, Chul Hwan Choi, Yong Joon Hong, Kang Soo Kim, Sang-Ho Roh, Heok Jae Lee, Sang Jin Choi
  • Patent number: 9871159
    Abstract: Disclosed are a solar cell apparatus and a method of fabricating the same. The solar cell apparatus includes a substrate, a back electrode layer on the substrate, a light absorbing layer on the back electrode layer, a first window layer including a first oxide on the light absorbing layer, and a second window layer provided on the first window layer and including a second oxide having a composition ratio of oxygen higher than a composition ratio of oxygen contained in the first oxide.
    Type: Grant
    Filed: April 27, 2011
    Date of Patent: January 16, 2018
    Assignee: LG INNOTEK CO., LTD.
    Inventor: Chul Hwan Choi
  • Patent number: 9735294
    Abstract: A solar cell according to an embodiment includes a substrate; a barrier layer of a nano rod structure on the substrate; a back electrode layer disposed on the barrier layer; a light absorbing layer disposed on the back electrode layer; a buffer layer disposed on the light absorbing layer, and a window layer disposed on the buffer layer.
    Type: Grant
    Filed: April 6, 2012
    Date of Patent: August 15, 2017
    Assignee: LG INNOTEK CO., LTD.
    Inventor: Chul Hwan Choi
  • Publication number: 20170107616
    Abstract: Provided are a method of fabricating a semiconductor The method of fabricating a semiconductor device includes: transporting a substrate having a carbon-based sacrificial layer pattern to a processing chamber; forming a mask material layer on the substrate; removing the substrate from the processing chamber; and removing at least a part of a carbon-based material layer formed inside the processing chamber.
    Type: Application
    Filed: September 12, 2016
    Publication date: April 20, 2017
    Inventors: Bo-young SHIM, Eun-sung KIM, Chul-hwan CHOI, Chung-hwan KIM
  • Patent number: 9603014
    Abstract: A power system is provided. The power system includes a power device group including a power device, at least one communication device mutually connected through a short range communication network, and a monitoring/controlling device connected to the communication device in a wired manner and transmitting and receiving state information data and control data of the power device through the communication device. The communication device includes a first communication unit connecting the communication devices through the shore range communication network, and a second communication unit connected to the monitoring/controlling device in a wired manner.
    Type: Grant
    Filed: February 11, 2015
    Date of Patent: March 21, 2017
    Assignee: LSIS CO., LTD.
    Inventors: Won Seok Choi, Chul Hwan Choi, Jong Ho Park
  • Publication number: 20150312756
    Abstract: A power system is provided. The power system includes a power device group including a power device, at least one communication device mutually connected through a short range communication network, and a monitoring/controlling device connected to the communication device in a wired manner and transmitting and receiving state information data and control data of the power device through the communication device. The communication device includes a first communication unit connecting the communication devices through the shore range communication network, and a second communication unit connected to the monitoring/controlling device in a wired manner.
    Type: Application
    Filed: February 11, 2015
    Publication date: October 29, 2015
    Applicant: LSIS CO., LTD.
    Inventors: Won Seok CHOI, CHUL HWAN CHOI, JONG HO PARK
  • Patent number: 8829341
    Abstract: There is provided a solar cell comprising: a substrate; a rear electrode layer disposed on the substrate; a light absorption layer disposed on the rear electrode layer; and a window layer disposed on the light absorption layer, wherein the window layer includes a plurality of conductive particles. The conductive particles improve the optical and electrical properties of the window layer.
    Type: Grant
    Filed: April 27, 2011
    Date of Patent: September 9, 2014
    Assignee: LG Innotek Co., Ltd.
    Inventor: Chul Hwan Choi
  • Publication number: 20140090706
    Abstract: A solar cell apparatus according to the embodiment includes a substrate; a back electrode layer on the substrate; a light absorbing layer on the back electrode layer; a first buffer layer including CdS on the light absorbing layer; a second buffer layer including Zn on the first buffer layer; and a window layer on the second buffer layer.
    Type: Application
    Filed: May 31, 2012
    Publication date: April 3, 2014
    Applicants: CHUNG-ANG UNIVERSITY INDUSTRY-ACADEMY COOPERATION FOUNDATION, LG INNOTEK CO., LTD.
    Inventors: Chul Hwan CHOI, In Hwan CHOI
  • Publication number: 20140048132
    Abstract: A solar cell includes a substrate, a back electrode layer provided on the substrate, a light absorbing layer provided on the back electrode layer, a buffer layer including ZnS and provided on the light absorbing layer, and a window layer provided on the buffer layer.
    Type: Application
    Filed: April 26, 2012
    Publication date: February 20, 2014
    Applicants: CHUNG-ANG UNIVERSITY INDUSTRY-ACADEMY COOPERATION FOUNDATION, LG INNOTEK CO., LTD.
    Inventors: Chul Hwan Choi, In Hwan Choi
  • Publication number: 20140026958
    Abstract: A solar cell according to an embodiment includes a substrate; a barrier layer of a nano rod structure on the substrate; a back electrode layer disposed on the barrier layer; a light absorbing layer disposed on the back electrode layer; a buffer layer disposed on the light absorbing layer, and a window layer disposed on the buffer layer.
    Type: Application
    Filed: April 6, 2012
    Publication date: January 30, 2014
    Applicant: LG INNOTEK CO., LTD.
    Inventor: Chul Hwan Choi
  • Patent number: 8535488
    Abstract: There is provided a method for a purification of trichlorosilane, the method including: performing a pretreatment for separating a chlorosilane mixture from reaction products of a trichlorosilane production reaction; performing a first purification for separating the chlorosilane mixture into a first top stream and a first bottom stream; performing a second purification for separating the first top stream into a second top stream and a second bottom stream; and performing a third purification for separating the second bottom stream into a third top stream and a third bottom stream, wherein the performing of the third purification is carried out under pressure conditions higher than those of the performing of the second purification, and a heat exchange is generated between the second bottom stream and the third top stream.
    Type: Grant
    Filed: December 13, 2011
    Date of Patent: September 17, 2013
    Assignee: LG Chem, Ltd.
    Inventors: Chul-Hwan Choi, Jeong-Seok Lee, Kwang-Wook Choi, Joon-Ho Shin, Dong-Kyu Kim
  • Publication number: 20130220398
    Abstract: Disclosed are a solar cell and a method for manufacturing the same. The solar cell includes a plurality of cells. Each cell includes a substrate, a back electrode layer on the substrate, a light absorbing layer on the back electrode layer, a buffer layer on the light absorbing layer, and a window layer on the buffer layer. When a width of each cell is W1, and a thickness of the window layer is W2, the width of each cell and the thickness of the window layer satisfy an equation of W2=A×W1, in which the A has a value in a range of about 1×10?4 to 1.7×10?4.
    Type: Application
    Filed: October 6, 2011
    Publication date: August 29, 2013
    Applicant: LG INNOTEK CO., LTD.
    Inventor: Chul Hwan Choi
  • Publication number: 20130112269
    Abstract: There is provided a solar cell comprising: a substrate; a rear electrode layer disposed on the substrate; a light absorption layer disposed on the rear electrode layer; and a window layer disposed on the light absorption layer, wherein the window layer includes a plurality of conductive particles. The conductive particles improve the optical and electrical properties of the window layer.
    Type: Application
    Filed: April 27, 2011
    Publication date: May 9, 2013
    Applicant: LG INNOTEK CO., LTD.
    Inventor: Chul Hwan Choi
  • Publication number: 20130092220
    Abstract: Disclosed are a solar cell apparatus and a method of fabricating the same. The solar cell apparatus includes a substrate, a back electrode layer on the substrate, a light absorbing layer on the back electrode layer, a first window layer including a first oxide on the light absorbing layer, and a second window layer provided on the first window layer and including a second oxide having a composition ratio of oxygen higher than a composition ratio of oxygen contained in the first oxide.
    Type: Application
    Filed: April 27, 2011
    Publication date: April 18, 2013
    Applicant: LG INNOTEK CO., LTD.
    Inventor: Chul Hwan Choi
  • Publication number: 20130048072
    Abstract: Disclosed are a solar cell and a method of fabricating the same. The solar cell includes a back electrode layer; a light absorbing layer on the back electrode layer; a protrusion pattern on the light absorbing layer; a first anti-reflective layer having a first thickness on the protrusion pattern; and a second anti-reflective layer having a second thickness smaller than the first thickness on the protrusion pattern.
    Type: Application
    Filed: March 30, 2011
    Publication date: February 28, 2013
    Applicant: LG INNOTEK CO., LTD.
    Inventor: Chul Hwan Choi
  • Publication number: 20130025624
    Abstract: According to example embodiments, there is provided a method of cleaning a semiconductor device manufacturing apparatus. In the method, a fluorine-containing gas is provided into a chamber to clean a byproduct formed on a surface of a chamber during formation of a layer structure therein. A material is provided into the chamber to chemisorb the material on the surface of the chamber. The material is substantially similar to or the same as a source gas for forming the layer structure. A plasma is generated in the chamber, and the chamber is purged.
    Type: Application
    Filed: July 11, 2012
    Publication date: January 31, 2013
    Inventors: Jeon-Ho Kim, Chul-Hwan Choi, Seung-Tae Lee, Yong-Gyu Lim, Kyung-Tae Kim, Jae-Min Kim