Patents by Inventor Chun-Chao Chou

Chun-Chao Chou has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • FET with wrap-around silicide and fabrication methods thereof
    Patent number: 11996483
    Abstract: The present disclosure provides a semiconductor device that includes a semiconductor fin disposed over a substrate, an isolation structure at least partially surrounding the fin, an epitaxial source/drain (S/D) feature disposed over the semiconductor fin, where an extended portion of the epitaxial S/D feature extends over the isolation structure, and a silicide layer disposed on the epitaxial S/D feature, where the silicide layer covers top, bottom, sidewall, front, and back surfaces of the extended portion of the S/D feature.
    Type: Grant
    Filed: December 14, 2022
    Date of Patent: May 28, 2024
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Pei-Hsun Wang, Chih-Chao Chou, Shih-Cheng Chen, Jung-Hung Chang, Jui-Chien Huang, Chun-Hsiung Lin, Chih-Hao Wang
  • TRANSPARENT PANEL AND DISPLAY DEVICE
    Publication number: 20240164121
    Abstract: A transparent panel and a display device are provided. The transparent panel includes a substrate, a touch sensing module, and an organic photovoltaic module. The substrate has a first surface and a second surface opposite to the first surface. The touch sensing module is disposed on the first surface of the substrate. The organic photovoltaic module is disposed on the second surface of the substrate. An average visible transmittance of the transparent panel is greater than 70%.
    Type: Application
    Filed: January 12, 2023
    Publication date: May 16, 2024
    Applicant: NAN YA PLASTICS CORPORATION
    Inventors: Te-Chao Liao, Chun-Che Tsao, Yi-Chen Chou
  • OPTICAL COATING MATERIAL, OPTICAL FILM AND OPTICAL SUBSTRATE
    Publication number: 20240158643
    Abstract: An optical coating material, an optical film and an optical substrate are provided. The optical coating material includes 15 wt % to 40 wt % of resin, 1 wt % to 10 wt % of nano-dispersion solution and 40 wt % to 70 wt % of organic solvent. The resin is at least one selected from a group consisting of polyurethane acrylate resin, epoxy resin, acrylate resin and acrylic polyol resin. The nano-dispersion solution includes nanoparticles. The nanoparticles includes aluminum oxide, zirconium oxide, titanium oxide or silicon oxide.
    Type: Application
    Filed: January 12, 2023
    Publication date: May 16, 2024
    Applicant: NAN YA PLASTICS CORPORATION
    Inventors: Te-Chao Liao, Chun-Che Tsao, Yi-Chen Chou
  • Method for treating a nuclear process off-gas stream
    Patent number: 4447353
    Abstract: Disclosed is a method for selectively removing and recovering the noble gas and other gaseous components typically emitted during nuclear process operations. The method is adaptable and useful for treating dissolver off-gas effluents released during reprocessing of spent nuclear fuels whereby to permit radioactive contaminant recovery prior to releasing the remaining off-gases to the atmosphere. Briefly, the method sequentially comprises treating the off-gas stream to preliminarily remove NO.sub.
    Type: Grant
    Filed: September 11, 1980
    Date of Patent: May 8, 1984
    Assignee: The United States of America as represented by the United States Department of Energy
    Inventors: Dallas T. Pence, Chun-Chao Chou