Patents by Inventor Chun-Che Lee
Chun-Che Lee has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240101847Abstract: A quantum dot oil-based ink is provided. The quantum dot oil-based ink includes a quantum dot material, a dispersing solvent, a viscosity modifier, and a surface tension modifying solution. The dispersing solvent includes a linear alkane having 6 to 14 carbon atoms. The viscosity modifier includes an aromatic hydrocarbon having 10 to 18 carbon atoms or a linear olefin having 16 to 20 carbon atoms. The surface tension modifying solution includes a hydrophobic polymer material and a nonpolar solvent.Type: ApplicationFiled: November 29, 2022Publication date: March 28, 2024Inventors: Chun Che LIN, Chong-Ci HU, Yi-Ting TSAI, Ching-Yi CHEN, Yu-Chun LEE
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Publication number: 20220359361Abstract: A semiconductor substrate and a manufacturing method thereof are provided. The semiconductor substrate includes a dielectric layer, a circuit layer, a first protection layer and a plurality of conductive posts. The dielectric layer has a first surface and a second surface that are opposite to each other. The circuit layer is embedded in the dielectric layer and is exposed from the first surface. The first protection layer covers a portion of the first circuit layer and defines a plurality of holes that expose a remaining portion of the first circuit layer. The conductive posts are formed in the holes.Type: ApplicationFiled: July 25, 2022Publication date: November 10, 2022Applicant: Advanced Semiconductor Engineering, Inc.Inventors: Chun-Che LEE, Ming-Chiang LEE, Yuan-Chang SU, Tien-Szu CHEN, Chih-Cheng LEE, You-Lung YEN
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Patent number: 11398421Abstract: A semiconductor substrate and a manufacturing method thereof are provided. The semiconductor substrate includes a dielectric layer, a circuit layer, a first protection layer and a plurality of conductive posts. The dielectric layer has a first surface and a second surface that are opposite to each other. The circuit layer is embedded in the dielectric layer and is exposed from the first surface. The first protection layer covers a portion of the first circuit layer and defines a plurality of holes that expose a remaining portion of the first circuit layer. The conductive posts are formed in the holes.Type: GrantFiled: January 14, 2019Date of Patent: July 26, 2022Assignee: ADVANCED SEMICONDUCTOR ENGINEERING, INC.Inventors: Chun-Che Lee, Ming-Chiang Lee, Yuan-Chang Su, Tien-Szu Chen, Chih-Cheng Lee, You-Lung Yen
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Publication number: 20190148280Abstract: A semiconductor substrate and a manufacturing method thereof are provided. The semiconductor substrate includes a dielectric layer, a circuit layer, a first protection layer and a plurality of conductive posts. The dielectric layer has a first surface and a second surface that are opposite to each other. The circuit layer is embedded in the dielectric layer and is exposed from the first surface. The first protection layer covers a portion of the first circuit layer and defines a plurality of holes that expose a remaining portion of the first circuit layer. The conductive posts are formed in the holes.Type: ApplicationFiled: January 14, 2019Publication date: May 16, 2019Applicant: ADVANCED SEMICONDUCTOR ENGINEERING, INC.Inventors: Chun-Che Lee, Ming-Chiang Lee, Yuan-Chang Su, Tien-Szu Chen, Chih-Cheng Lee, You-Lung Yen
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Patent number: 10181438Abstract: A semiconductor substrate and a manufacturing method thereof are provided. The semiconductor substrate includes a dielectric layer, a circuit layer, a first protection layer and a plurality of conductive posts. The dielectric layer has a first surface and a second surface that are opposite to each other. The circuit layer is embedded in the dielectric layer and is exposed from the first surface. The first protection layer covers a portion of the first circuit layer and defines a plurality of holes that expose a remaining portion of the first circuit layer. The conductive posts are formed in the holes.Type: GrantFiled: October 24, 2014Date of Patent: January 15, 2019Assignee: ADVANCED SEMICONDUCTOR ENGINEERING, INC.Inventors: Chun-Che Lee, Ming-Chiang Lee, Yuan-Chang Su, Tien-Szu Chen, Chih-Cheng Lee, You-Lung Yen
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Patent number: 10049976Abstract: A semiconductor substrate includes an insulating layer and a conductive circuit layer embedded at a surface of the insulating layer. The conductive circuit layer includes a first portion and a second portion. The first portion includes a bonding pad and one portion of a conductive trace, and the second portion includes another portion of the conductive trace. An upper surface of the first portion is not coplanar with an upper surface of the second portion. A semiconductor packaging structure includes the semiconductor substrate.Type: GrantFiled: January 26, 2016Date of Patent: August 14, 2018Assignee: ADVANCED SEMICONDUCTOR ENGINEERING, INC.Inventors: Tien-Szu Chen, Chun-Che Lee, Sheng-Ming Wang, Kuang-Hsiung Chen, Yu-Ying Lee
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Patent number: 9748594Abstract: A polymer of fluorine-containing sulfonated poly(arylene ether)s and a manufacturing method thereof are provided. The polymer is formed by processing a nucleophilic polycondensation between a fluorine-containing monomer having an electron-withdrawing group and a multi-phenyl monomer. A main structure of the polymer of fluorine-containing sulfonated poly(arylene ether)s has a first portion with fluoro or trifluoromethyl substituted phenyl groups, and a second portion with sulfonated phenyl groups.Type: GrantFiled: April 5, 2017Date of Patent: August 29, 2017Assignee: National Sun Yat-sen UniversityInventors: Wen-yao Huang, Hsu-feng Lee, Benjamin Britton, Chun-che Lee, Steven Holdcroft, Jun-jie Pang, Yi-yun Hsu, Yu-chao Tseng
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Publication number: 20170214075Abstract: A polymer of fluorine-containing sulfonated poly(arylene ether)s and a manufacturing method thereof are provided. The polymer is formed by processing a nucleophilic polycondensation between a fluorine-containing monomer having an eletron-withdrawing group and a multi-phenyl monomer. A main structure of the polymer of fluorine-containing sulfonated poly(arylene ether)s has a first portion with fluoro or trifluoromethyl substituted phenyl groups, and a second portion with sulfonated phenyl groups.Type: ApplicationFiled: April 5, 2017Publication date: July 27, 2017Inventors: Wen-yao HUANG, Hsu-feng LEE, Benjamin BRITTON, Chun-che LEE, Steven HOLDCROFT, Jun-jie PANG, Yi-yun HSU, Yu-chao TSENG
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Patent number: 9644069Abstract: A polymer of fluorine-containing sulfonated poly(arylene ether)s and a manufacturing method thereof are provided. The polymer is formed by processing a nucleophilic polycondensation between a fluorine-containing monomer having an electron-withdrawing group and a multi-phenyl monomer. A main structure of the polymer of fluorine-containing sulfonated poly(arylene ether)s has a first portion with fluoro or trifluoromethyl substituted phenyl groups, and a second portion with sulfonated phenyl groups.Type: GrantFiled: July 7, 2015Date of Patent: May 9, 2017Assignee: NATIONAL SUN YAT-SEN UNIVERSITYInventors: Wen-yao Huang, Hsu-feng Lee, Benjamin Britton, Chun-che Lee, Steven Holdcroft, Jun-jie Pang, Yi-yun Hsu, Yu-chao Tseng
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Publication number: 20170009016Abstract: A polymer of fluorine-containing sulfonated poly(arylene ether)s and a manufacturing method thereof are provided. The polymer is formed by processing a nucleophilic polycondensation between a fluorine-containing monomer having an electron-withdrawing group and a multi-phenyl monomer. A main structure of the polymer of fluorine-containing sulfonated poly(arylene ether)s has a first portion with fluoro or trifluoromethyl substituted phenyl groups, and a second portion with sulfonated phenyl groups.Type: ApplicationFiled: July 7, 2015Publication date: January 12, 2017Inventors: Wen-yao HUANG, Hsu-feng LEE, Benjamin BRITTON, Chun-che LEE, Steven HOLDCROFT, Jun-jie PANG, Yi-yun HSU, Yu-chao TSENG
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Patent number: 9437532Abstract: A semiconductor package substrate includes a core portion, an upper circuit layer and a plurality of pillars. The pillars are disposed on and project upward from the upper circuit layer. Top surfaces of the pillars are substantially coplanar. The pillars provide an electrical interconnect to a semiconductor die. Solder joint reliability as between the substrate and the semiconductor die is improved.Type: GrantFiled: December 16, 2015Date of Patent: September 6, 2016Assignee: Advanced Semiconductor Engineering, Inc.Inventors: Tien-Szu Chen, Chun-Che Lee, Sheng-Ming Wang
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Publication number: 20160225708Abstract: A semiconductor substrate includes an insulating layer and a conductive circuit layer embedded at a surface of the insulating layer. The conductive circuit layer includes a first portion and a second portion. The first portion includes a bonding pad and one portion of a conductive trace, and the second portion includes another portion of the conductive trace. An upper surface of the first portion is not coplanar with an upper surface of the second portion. A semiconductor packaging structure includes the semiconductor substrate.Type: ApplicationFiled: January 26, 2016Publication date: August 4, 2016Inventors: Tien-Szu CHEN, Chun-Che LEE, Sheng-Ming WANG, Kuang-Hsiung CHEN, Yu-Ying LEE
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Patent number: 9406658Abstract: An embedded component device includes an electronic component including an electrical contact, an upper patterned conductive layer, a dielectric layer between the upper patterned conductive layer and the electronic component, a first electrical interconnect, a lower patterned conductive layer, a conductive via, and a second electrical interconnect. The dielectric layer has a first opening exposing the electrical contact, and a second opening extending from the lower patterned conductive layer to the upper patterned conductive layer. The first electrical interconnect extends from the electrical contact to the upper patterned conductive layer, and fills the first opening. The second opening has an upper portion exposing the upper patterned conductive layer and a lower portion exposing the lower patterned conductive layer. The conductive via is located at the lower portion of the second opening. The second electrical interconnect fills the upper portion of the second opening.Type: GrantFiled: December 17, 2010Date of Patent: August 2, 2016Assignee: ADVANCED SEMICONDUCTOR ENGINEERING, INC.Inventors: Chun-Che Lee, Yuan-Chang Su, Ming Chiang Lee, Shih-Fu Huang
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Publication number: 20160104667Abstract: A semiconductor package substrate includes a core portion, an upper circuit layer and a plurality of pillars. The pillars are disposed on and project upward from the upper circuit layer. Top surfaces of the pillars are substantially coplanar. The pillars provide an electrical interconnect to a semiconductor die. Solder joint reliability as between the substrate and the semiconductor die is improved.Type: ApplicationFiled: December 16, 2015Publication date: April 14, 2016Applicant: ADVANCED SEMICONDUCTOR ENGINEERING, INC.Inventors: Tien-Szu Chen, Chun-Che Lee, Sheng-Ming Wang
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Patent number: 9224707Abstract: A semiconductor package substrate includes a core portion, an upper circuit layer and a plurality of pillars. The pillars are disposed on and project upward from the upper circuit layer. Top surfaces of the pillars are substantially coplanar. The pillars provide an electrical interconnect to a semiconductor die. Solder joint reliability as between the substrate and the semiconductor die is improved.Type: GrantFiled: October 8, 2014Date of Patent: December 29, 2015Assignee: ADVANCED SEMICONDUCTOR ENGINEERING, INC.Inventors: Tien-Szu Chen, Chun-Che Lee, Sheng-Ming Wang
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Patent number: 9209472Abstract: A polymer of sulfonated poly(arylene ether)s (PAEs) and a manufacturing method thereof are provided. A main structure of the PAEs has a first side formed by multi-phenyl glycol monomer and a second side formed by multi-phenyl dihalo monomer with an electron-withdrawing group. The glycol monomer and the dihalo monomer are reacted with each other by a nucleophilic displacement reaction, so as to form the main structure of the PAEs. A film made of the PAEs has a better size stability under a high water uptake.Type: GrantFiled: March 26, 2015Date of Patent: December 8, 2015Assignee: National Sun Yat-sen UniversityInventors: Wen-yao Huang, Chun-Che Lee, Hsu-feng Lee, Steven Holdcroft
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Patent number: 9117697Abstract: The present disclosure relates to a semiconductor substrate and a method for making the same. The semiconductor substrate includes an insulation layer, a first circuit layer, a second circuit layer, a plurality of conductive vias and a plurality of bumps. The first circuit layer is embedded in a first surface of the insulation layer, and exposed from the first surface of the insulation layer. The second circuit layer is located on a second surface of the insulation layer and electrically connected to the first circuit layer through the conductive vias. The bumps are directly located on part of the first circuit layer, where the lattice of the bumps is the same as that of the first circuit layer.Type: GrantFiled: June 12, 2014Date of Patent: August 25, 2015Assignee: Advanced Semiconductor Engineering, Inc.Inventors: Chun-Che Lee, Yuan-Chang Su, Wen-Chi Cheng, Guo-Cheng Liao, Yi-Chuan Ding
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Publication number: 20150200411Abstract: A polymer of suifonated poly(arylene ether)s (PAEs) and a manufacturing method thereof are provided. A main structure of the PAEs has a first side formed by multi-phenyl glycol monomer and a second side formed by multi-phenyl dihalo monomer with an electron-withdrawing group. The glycol monomer and the dihalo monomer are reacted with each other by a nucleophilic displacement reaction, so as to form the main structure of the PAEs. A film made of the PAEs has a better size stability under a high water uptake.Type: ApplicationFiled: March 26, 2015Publication date: July 16, 2015Inventors: Wen-yao HUANG, Chun-Che LEE, Hsu-feng LEE, Steven HOLDCROFT
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Publication number: 20150115469Abstract: A semiconductor substrate and a manufacturing method thereof are provided. The semiconductor substrate includes a dielectric layer, a circuit layer, a first protection layer and a plurality of conductive posts. The dielectric layer has a first surface and a second surface that are opposite to each other. The circuit layer is embedded in the dielectric layer and is exposed from the first surface. The first protection layer covers a portion of the first circuit layer and defines a plurality of holes that expose a remaining portion of the first circuit layer. The conductive posts are formed in the holes.Type: ApplicationFiled: October 24, 2014Publication date: April 30, 2015Inventors: Chun-Che LEE, Ming-Chiang LEE
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Patent number: 9018336Abstract: A polymer of sulfonated poly(arylene ether)s (PAEs) and a manufacturing method thereof are provided. A main structure of the PAEs has a first side formed by multi-phenyl glycol monomer and a second side formed by multi-phenyl dihalo monomer with an electron-withdrawing group. The glycol monomer and the dihalo monomer are reacted with each other by a nucleophilic displacement reaction, so as to form the main structure of the PAEs. A film made of the PAEs has a better size stability under a high water uptake.Type: GrantFiled: January 26, 2014Date of Patent: April 28, 2015Assignee: National Sun Yat-sen UniversityInventors: Wen-yao Huang, Chun-Che Lee, Hsu-feng Lee, Steven Holdcroft