Patents by Inventor Chun-Yao Ko
Chun-Yao Ko has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240107755Abstract: Various embodiments of the present disclosure are directed towards a semiconductor structure including a first well region disposed within a substrate and comprising a first doping type. A conductive structure overlies the first well region. A pair of first doped regions is disposed within the first well region on opposing sides of the conductive structure. The pair of first doped regions comprise a second doping type opposite the first doping type. A pair of second doped regions is disposed within the first well region on the opposing sides of the conductive structure. The pair of second doped regions comprise the second doping type and are laterally offset from the pair of first doped regions by a non-zero distance.Type: ApplicationFiled: December 11, 2023Publication date: March 28, 2024Inventors: Shih-Hsien Chen, Chun-Yao Ko, Felix Ying-Kit Tsui
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Patent number: 11844213Abstract: Various embodiments of the present disclosure are directed towards an integrated chip including a first well region and a second well region disposed within a substrate. A gate electrode overlies the first well region and the second well region. A first memory active region is disposed within the second well region. A second memory active region is disposed within the second well region and is laterally offset from the first memory active region by a non-zero distance.Type: GrantFiled: June 30, 2022Date of Patent: December 12, 2023Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Shih-Hsien Chen, Chun-Yao Ko, Felix Ying-Kit Tsui
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Publication number: 20220336482Abstract: Various embodiments of the present disclosure are directed towards an integrated chip including a first well region and a second well region disposed within a substrate. A gate electrode overlies the first well region and the second well region. A first memory active region is disposed within the second well region.Type: ApplicationFiled: June 30, 2022Publication date: October 20, 2022Inventors: Shih-Hsien Chen, Chun-Yao Ko, Felix Ying-Kit Tsui
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Publication number: 20220320124Abstract: A memory device is disclosed. The memory device includes: a first memory cell, including: a first transistor; a second transistor; and a first capacitor; a second memory cell, including: a third transistor; a fourth transistor; and a second capacitor; a third memory cell, including: a fifth transistor; a sixth transistor; and a third capacitor; and a fourth memory cell, including: a seventh transistor; an eighth transistor; and a fourth capacitor; wherein an electrode of the first capacitor, an electrode of the second capacitor, an electrode of the third capacitor, and an electrode of the fourth capacitor are electrically connected to a conductor. An associated manufacturing method is also disclosed.Type: ApplicationFiled: June 16, 2022Publication date: October 6, 2022Inventors: HAU-YAN LU, CHUN-YAO KO, FELIX YING-KIT TSUI
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Patent number: 11387242Abstract: An integrated chip includes a first well region, second well region, and third well region disposed within a substrate. The second well region is laterally between the first and third well regions. An isolation structure is disposed within the substrate and laterally surrounds the first, second, and third well regions. A floating gate overlies the substrate and laterally extends from the first well region to the third well region. A dielectric structure is disposed under the floating gate. A bit line write region is disposed within the second well region and includes source/drain regions disposed on opposite sides of the floating gate. A bit line read region is disposed within the second well region, is laterally offset from the bit line write region by a non-zero distance, and includes source/drain regions disposed on the opposite sides of the floating gate.Type: GrantFiled: October 13, 2020Date of Patent: July 12, 2022Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Shih-Hsien Chen, Chun-Yao Ko, Felix Ying-Kit Tsui
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Patent number: 11367731Abstract: A memory device is disclosed. The memory device includes: a first memory cell, including: a first transistor; a second transistor; and a first capacitor; a second memory cell, including: a third transistor; a fourth transistor; and a second capacitor; a third memory cell, including: a fifth transistor; a sixth transistor; and a third capacitor; and a fourth memory cell, including: a seventh transistor; an eighth transistor; and a fourth capacitor; wherein an electrode of the first capacitor, an electrode of the second capacitor, an electrode of the third capacitor, and an electrode of the fourth capacitor are electrically connected to a conductor. An associated manufacturing method is also disclosed.Type: GrantFiled: September 20, 2018Date of Patent: June 21, 2022Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.Inventors: Hau-Yan Lu, Chun-Yao Ko, Felix Ying-Kit Tsui
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Patent number: 11152383Abstract: A memory cell may include first and second storage transistors. A first capacitor includes a first capacitor active region disposed within a substrate and a capacitor plate comprised of a first floating gate portion of a floating gate. A second capacitor includes a second capacitor active region disposed within the substrate and a capacitor plate comprised of a second floating gate portion of the floating gate. The first storage transistor includes source/drain regions disposed within a bit line write region and a first gate electrode comprised of a third floating gate portion of the floating gate. The second storage transistor includes source/drain regions disposed within a bit line read region and a second gate electrode comprised of a fourth floating gate portion of the floating gate. The bit line read and write regions are offset from one another by a non-zero distance.Type: GrantFiled: March 3, 2020Date of Patent: October 19, 2021Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Shih-Hsien Chen, Chun-Yao Ko, Felix Ying-Kit Tsui
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Publication number: 20210280592Abstract: Various embodiments of the present disclosure are directed towards an integrated chip including a first well region, second well region, and third well region disposed within a substrate. The second well region is laterally between the first and third well regions. An isolation structure is disposed within the substrate and laterally surrounds the first, second, and third well regions. A floating gate overlies the substrate and laterally extends from the first well region to the third well region. A dielectric structure is disposed under the floating gate. A bit line write region is disposed within the second well region and comprises source/drain regions disposed on opposite sides of the floating gate. A bit line read region is disposed within the second well region, is laterally offset from the bit line write region by a non-zero distance, and comprises source/drain regions disposed on the opposite sides of the floating gate.Type: ApplicationFiled: October 13, 2020Publication date: September 9, 2021Inventors: Shih-Hsien Chen, Chun-Yao Ko, Felix Ying-Kit Tsui
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Publication number: 20210280591Abstract: Various embodiments of the present disclosure are directed towards a memory cell including first and second storage transistors. A first capacitor includes a first capacitor active region disposed within a substrate and a capacitor plate comprised of a first floating gate portion of a floating gate. A second capacitor includes a second capacitor active region disposed within the substrate and a capacitor plate comprised of a second floating gate portion of the floating gate. The first storage transistor includes source/drain regions disposed within a bit line write region and a first gate electrode comprised of a third floating gate portion of the floating gate. The second storage transistor includes source/drain regions disposed within a bit line read region and a second gate electrode comprised of a fourth floating gate portion of the floating gate. The bit line read and write regions are offset from one another by a non-zero distance.Type: ApplicationFiled: March 3, 2020Publication date: September 9, 2021Inventors: Shih-Hsien Chen, Chun-Yao Ko, Felix Ying-Kit Tsui
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Patent number: 10784276Abstract: A semiconductor device is provided. The semiconductor device comprises a first active region, a second active region and a third active region, a first poly region, a second poly region, a third poly region, a first doped region and a second doped region. The first active region, the second active region and the third active region are separated and parallel with each other. The first poly region is arranged over the first and second active regions. The second poly region is arranged over the first and second active regions. The third poly region is arranged over the second and third active regions. The first doped region is in the second active region and between the first poly region and the second poly region. The second doped region is in the second active region and between the second poly region and the third poly region.Type: GrantFiled: November 26, 2018Date of Patent: September 22, 2020Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.Inventors: Hau-Yan Lu, Shih-Hsien Chen, Chun-Yao Ko, Felix Ying-Kit Tsui
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Patent number: 10727222Abstract: A memory system is provided. The memory system includes a number of memory cells and a number of bit lines. The memory cells are interlocked with each other in rows and columns. The memory cells include respective capacitors, respective first transistors and respective second transistors. Respective upper plates of the respective capacitors are electrically connected to respective gates of the respective first transistors, and respective drains of the respective second transistors are connected to respective sources of the respective first transistors. The bit lines are arranged along an extending direction of the rows. Respective bit lines are connected to the respective first transistors through respective bit-line contacts, and each of the respective bit-line contacts is shared by two adjacent memory cells of the extending direction of the rows.Type: GrantFiled: April 20, 2017Date of Patent: July 28, 2020Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventors: Hau-Yan Lu, Shih-Hsien Chen, Chun-Yao Ko, Felix Ying-Kit Tsui
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Patent number: 10553597Abstract: A memory cell includes a first transistor coupled to a source line, wherein the first transistor is in a first well. The memory cell further includes a second transistor coupled to the first transistor and a bit line, wherein the second transistor is in the first well. The memory cell further includes a first capacitor coupled to a word line and the second transistor, wherein the first capacitor is in a second well. The memory cell further includes a second capacitor coupled to the second transistor and an erase gate, wherein the second capacitor is in the second well. In some embodiments, the first well contacts the second well on a first side of the first well.Type: GrantFiled: December 24, 2018Date of Patent: February 4, 2020Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Shih-Hsien Chen, Liang-Tai Kuo, Hau-Yan Lu, Chun-Yao Ko
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Publication number: 20190164982Abstract: A memory device is disclosed. The memory device includes: a first memory cell, including: a first transistor; a second transistor; and a first capacitor; a second memory cell, including: a third transistor; a fourth transistor; and a second capacitor; a third memory cell, including: a fifth transistor; a sixth transistor; and a third capacitor; and a fourth memory cell, including: a seventh transistor; an eighth transistor; and a fourth capacitor; wherein an electrode of the first capacitor, an electrode of the second capacitor, an electrode of the third capacitor, and an electrode of the fourth capacitor are electrically connected to a conductor. An associated manufacturing method is also disclosed.Type: ApplicationFiled: September 20, 2018Publication date: May 30, 2019Inventors: HAU-YAN LU, CHUN-YAO KO, FELIX YING-KIT TSUI
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Publication number: 20190131312Abstract: A memory cell includes a first transistor coupled to a source line, wherein the first transistor is in a first well. The memory cell further includes a second transistor coupled to the first transistor and a bit line, wherein the second transistor is in the first well. The memory cell further includes a first capacitor coupled to a word line and the second transistor, wherein the first capacitor is in a second well. The memory cell further includes a second capacitor coupled to the second transistor and an erase gate, wherein the second capacitor is in the second well. In some embodiments, the first well contacts the second well on a first side of the first well.Type: ApplicationFiled: December 24, 2018Publication date: May 2, 2019Inventors: Shih-Hsien CHEN, Liang-Tai KUO, Hau-Yan LU, Chun-Yao KO
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Publication number: 20190096903Abstract: A semiconductor device is provided. The semiconductor device comprises a first active region, a second active region and a third active region, a first poly region, a second poly region, a third poly region, a first doped region and a second doped region. The first active region, the second active region and the third active region are separated and parallel with each other. The first poly region is arranged over the first and second active regions. The second poly region is arranged over the first and second active regions. The third poly region is arranged over the second and third active regions. The first doped region is in the second active region and between the first poly region and the second poly region. The second doped region is in the second active region and between the second poly region and the third poly region.Type: ApplicationFiled: November 26, 2018Publication date: March 28, 2019Inventors: Hau-Yan LU, Shih-Hsien CHEN, Chun-Yao KO, Felix Ying-Kit TSUI
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Patent number: 10163920Abstract: A memory device includes at least one memory cell. The memory cell includes first and second transistors, and first and second capacitors. The first transistor is coupled to a source line. The second transistor is coupled to the first transistor and a bit line. The first capacitor is coupled to a word line and the second transistor. The second capacitor is coupled to the second transistor and an erase gate.Type: GrantFiled: March 22, 2017Date of Patent: December 25, 2018Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Shih-Hsien Chen, Liang-Tai Kuo, Hau-Yan Lu, Chun-Yao Ko
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Patent number: 10141323Abstract: A semiconductor device is provided. The semiconductor device comprises a first active region, a second active region and a third active region, a first poly region, a second poly region, a third poly region, a first doped region and a second doped region. The first active region, the second active region and the third active region are separated and parallel with each other. The first poly region is arranged over the first and second active regions. The second poly region is arranged over the first and second active regions. The third poly region is arranged over the second and third active regions. The first doped region is in the second active region and between the first poly region and the second poly region. The second doped region is in the second active region and between the second poly region and the third poly region.Type: GrantFiled: January 4, 2016Date of Patent: November 27, 2018Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Hau-Yan Lu, Shih-Hsien Chen, Chun-Yao Ko, Felix Ying-Kit Tsui
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Publication number: 20180308847Abstract: A memory system is provided. The memory system includes a number of memory cells and a number of bit lines. The memory cells are interlocked with each other in rows and columns. The memory cells include respective capacitors, respective first transistors and respective second transistors. Respective upper plates of the respective capacitors are electrically connected to respective gates of the respective first transistors, and respective drains of the respective second transistors are connected to respective sources of the respective first transistors. The bit lines are arranged along an extending direction of the rows. Respective bit lines are connected to the respective first transistors through respective bit-line contacts, and each of the respective bit-line contacts is shared by two adjacent memory cells of the extending direction of the rows.Type: ApplicationFiled: April 20, 2017Publication date: October 25, 2018Inventors: Hau-Yan LU, Shih-Hsien CHEN, Chun-Yao KO, Felix Ying-Kit TSUI
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Patent number: 9837458Abstract: The present disclosure provides an image sensor semiconductor device. The semiconductor device includes a semiconductor substrate having a first type of dopant; a semiconductor layer having a second type of dopant different from the first type of dopant and disposed on the semiconductor substrate; a photo-sensitive structure formed in the semiconductor layer; a multi-layer interconnect (MLI) structure disposed on the semiconductor layer; a color filter disposed on the MLI structure and disposed above the photo-sensitive structure; and a microlens disposed over the color filter and disposed above the photo-sensitive structure.Type: GrantFiled: October 17, 2016Date of Patent: December 5, 2017Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.Inventors: Chung-Wei Chang, Han-Chi Liu, Chun-Yao Ko, Shou-Gwo Wuu
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Patent number: 9711516Abstract: A non-volatile memory structure includes a semiconductor substrate and a first layer of a first dopant type in the semiconductor substrate. The non-volatile memory structure further includes a first well region of a second dopant type over the first layer, a second well region of the second dopant type over the first layer and spaced apart from the first well region, and a third well region of the first dopant type disposed between the first well region and the second well region and extending downward to the first layer.Type: GrantFiled: October 30, 2015Date of Patent: July 18, 2017Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.Inventors: Shih-Hsien Chen, Hau-Yan Lu, Liang-Tai Kuo, Chun-Yao Ko, Felix Ying-Kit Tsui