Patents by Inventor Chung-Heon Lee

Chung-Heon Lee has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • PREPARING METHOD OF CATALYST FOR PREPARING LOW-DIAMETER CARBON NANOTUBE AND PREPARING METHOD OF CARBON NANOTUBE USING SAME
    Publication number: 20240132357
    Abstract: An embodiment of the present specification provides a method for preparing a catalyst for preparing a carbon nanotube, comprising: (a) dissolving a main catalyst precursor, a support precursor, a cocatalyst precursor and a precipitation inhibitor in a solvent to prepare a precursor solution; and (b) pyrolyzing the precursor solution by spraying the precursor solution into a reactor, wherein a mole fraction of the precipitation inhibitor to the cocatalyst precursor is 0.1 to 1.5.
    Type: Application
    Filed: October 19, 2023
    Publication date: April 25, 2024
    Applicant: KOREA KUMHO PETROCHEMICAL CO., LTD.
    Inventors: Myung Hoon JEONG, Hyun Tae KIM, Sang Hyo RYU, Chung Heon JEONG, Wan Sung LEE, Woo Ram JUNG, Chang Gu KANG
  • CATHODE ACTIVE MATERIAL FOR ALL-SOLID-STATE BATTERY WITH CONTROLLED PARTICLE SIZE AND PREPARATION METHOD THEREOF
    Publication number: 20240120475
    Abstract: The present disclosure relates to a cathode active material for an all-solid-state battery with a controlled particle size and a method for preparing the same. In particular, the cathode active material includes lithium and a transition metal, wherein the cathode active material has a single peak in the range of 1 ?m to 10 ?m as a result of particle size distribution (PSD) analysis.
    Type: Application
    Filed: May 4, 2023
    Publication date: April 11, 2024
    Inventors: Sung Woo NOH, Hong Seok MIN, Sang Heon LEE, Jeong Hyun SEO, Im Sul SEO, Chung Bum LIM, Ju Yeong SEONG, Je Sik PARK
  • Monomer for hardmask composition and hardmask composition including the monomer and method of forming patterns using the hardmask composition
    Patent number: 10345706
    Abstract: A monomer for a hardmask composition is represented by the following Chemical Formula 1,
    Type: Grant
    Filed: April 22, 2014
    Date of Patent: July 9, 2019
    Assignee: CHEIL INDUSTRIES, INC.
    Inventors: Hyun-Ji Song, Yun-Jun Kim, Go-Un Kim, Young-Min Kim, Hea-Jung Kim, Joon-Young Moon, Yo-Choul Park, Yu-Shin Park, You-Jung Park, Seung-Wook Shin, Yong-Woon Yoon, Chung-Heon Lee, Yoo-Jeong Choi, Seung-Hee Hong
  • Method of producing layer structure, layer structure, and method of forming patterns
    Patent number: 10312074
    Abstract: A method of producing a layer structure includes forming a first organic layer by applying a first composition including an organic compound on a substrate having a plurality of patterns, applying a solvent on the first organic layer to remove a part of the first organic layer, and applying a second composition including an organic compound on a remaining part of the first organic layer and forming a second organic layer through a curing process.
    Type: Grant
    Filed: June 16, 2015
    Date of Patent: June 4, 2019
    Assignee: SAMSUNG SDI CO., LTD.
    Inventors: Min-Soo Kim, Hyun-Ji Song, Sun-Hae Kang, Sung-Min Kim, Sung-Hwan Kim, Young-Min Kim, Yun-Jun Kim, Hea-Jung Kim, Youn-Hee Nam, Jae-Yeol Baek, Byeri Yoon, Yong-Woon Yoon, Chung-Heon Lee, Seulgi Jeong, Yeon-Hee Jo, Seung-Hee Hong, Sun-Min Hwang, Won-Jong Hwang, Songse Yi, MyeongKoo Kim, Naery Yu
  • Hardmask composition and method of forming patterns using the hardmask composition
    Patent number: 10018914
    Abstract: A hardmask composition includes a polymer including a moiety represented by the following Chemical Formula 1 and a solvent. *-A-B—*??[Chemical Formula 1] In the Chemical Formula 1, A and B are the same as defined in the detailed description.
    Type: Grant
    Filed: April 13, 2015
    Date of Patent: July 10, 2018
    Assignee: Samsung SDI Co., Ltd.
    Inventors: Youn-Hee Nam, Mi-Young Kim, You-Jung Park, Yun-Jun Kim, Hea-Jung Kim, Joon-Young Moon, Hyun-Ji Song, Chung-Heon Lee, Yoo-Jeong Choi
  • MONOMER FOR A HARDMASK COMPOSITION, HARDMASK COMPOSITION COMPRISING THE MONOMER, AND METHOD FOR FORMING A PATTERN USING THE HARDMASK COMPOSITION
    Publication number: 20170327640
    Abstract: Disclosed are a monomer for a hardmask composition represented by the following Chemical Formula 1, a hardmask composition including the monomer, and a method of forming a pattern using the same. In Chemical Formula 1, A, A?, L and n are the same as in the detailed description.
    Type: Application
    Filed: August 3, 2017
    Publication date: November 16, 2017
    Inventors: Yun-Jun KIM, Hwan-Sung CHEON, Youn-Jin CHO, Yong-Woon YOON, Chung-Heon LEE, Hyo-Young KWON, Yoo-Jeong CHOI
  • Monomer for a hardmask composition, hardmask composition comprising the monomer, and method for forming a pattern using the hardmask composition
    Patent number: 9725389
    Abstract: Disclosed are a monomer for a hardmask composition represented by the following Chemical Formula 1, a hardmask composition including the monomer, and a method of forming a pattern using the same. In Chemical Formula 1, A, A?, L and n are the same as in the detailed description.
    Type: Grant
    Filed: November 29, 2012
    Date of Patent: August 8, 2017
    Assignee: Cheil Industries, Inc.
    Inventors: Yun-Jun Kim, Hwan-Sung Cheon, Youn-Jin Cho, Yong-Woon Yoon, Chung-Heon Lee, Hyo-Young Kwon, Yoo-Jeong Choi
  • Monomer for hardmask composition, hardmask composition including the monomer, and method of forming patterns using the hardmask composition
    Patent number: 9683114
    Abstract: A monomer for a hardmask composition, a hardmask composition, and a method of forming patterns, the monomer being represented by the following Chemical Formula 1:
    Type: Grant
    Filed: January 30, 2015
    Date of Patent: June 20, 2017
    Assignee: SAMSUNG SDI CO., LTD.
    Inventors: Hea-Jung Kim, Sung-Hwan Kim, Youn-Hee Nam, Yun-Jun Kim, Joon-Young Moon, Hyun-Ji Song, Yong-Woon Yoon, Chung-Heon Lee
  • Hardmask composition, method of forming patterns using the hardmask composition and semiconductor integrated circuit device including the patterns
    Patent number: 9665003
    Abstract: A hardmask composition includes a monomer represented by the following Chemical Formula 1, a polymer including a moiety represented by the following Chemical Formula 2, a polymer including a moiety represented by the following Chemical Formula 3, or a combination thereof, and a solvent,
    Type: Grant
    Filed: April 28, 2014
    Date of Patent: May 30, 2017
    Assignee: Cheil Industries, Inc.
    Inventors: Yoo-Jeong Choi, Yun-Jun Kim, Go-Un Kim, Young-Min Kim, Hea-Jung Kim, Joon-Young Moon, Yo-Choul Park, Yu-Shin Park, You-Jung Park, Hyun-Ji Song, Seung-Wook Shin, Yong-Woon Yoon, Chung-Heon Lee, Seung-Hee Hong
  • Monomer, hardmask composition including monomer, and method for forming pattern by using hardmask composition
    Patent number: 9556094
    Abstract: Disclosed are a monomer represented by the following Chemical Formula 1 for a hardmask composition, a hardmask composition including the monomer, and a method of forming patterns using the hardmask composition. In the above Chemical Formula 1, A1 to A3, X1 to X3, L1, L2, n and m are the same as described in the detailed description.
    Type: Grant
    Filed: June 4, 2013
    Date of Patent: January 31, 2017
    Assignee: Cheil Industries, Inc.
    Inventors: Yun-Jun Kim, Hyo-Young Kwon, Hea-Jung Kim, Chung-Heon Lee, Youn-Jin Cho, Yoo-Jeong Choi
  • Hard mask composition and method for forming pattern using same
    Patent number: 9529257
    Abstract: Disclosed are a polymer represented by the Chemical Formula 1, a monomer represented by the Chemical Formula 2, and a solvent, wherein the monomer is included in the same or a higher amount than the polymer, and a method of forming patterns using the same.
    Type: Grant
    Filed: September 2, 2013
    Date of Patent: December 27, 2016
    Assignee: CHEIL INDUSTRIES, INC.
    Inventors: Chul-Ho Lee, You-Jung Park, Yong-Woon Yoon, Sung-Jae Lee, Youn-Jin Cho, Young-Min Kim, Chung-Heon Lee
  • Hardmask composition and method of forming patterns using the hardmask composition
    Patent number: 9371444
    Abstract: A hardmask composition and a method of forming patterns, the composition including a solvent; and a polymer including a moiety represented by the following Chemical Formula 1,
    Type: Grant
    Filed: January 22, 2015
    Date of Patent: June 21, 2016
    Assignee: SAMSUNG SDI CO., LTD.
    Inventors: Yoo-Jeong Choi, Yun-Jun Kim, Young-Min Kim, Joon-Young Moon, Yu-Shin Park, Hyun-Ji Song, Yong-Woon Yoon, Chung-Heon Lee
  • Monomer for hardmask composition, hardmask composition including monomer, and pattern forming method using hardmask composition
    Patent number: 9359276
    Abstract: Disclosed are a monomer for a hardmask composition represented by the Chemical Formula 1, a hardmask composition including the monomer, and a method of forming a pattern.
    Type: Grant
    Filed: November 21, 2012
    Date of Patent: June 7, 2016
    Assignee: CHEIL INDUSTRIES, INC.
    Inventors: Yoo-Jeong Choi, Hyo-Young Kwon, Youn-Jin Cho, Yun-Jun Kim, Young-Min Kim, Yong-Woon Yoon, Chung-Heon Lee
  • METHOD OF PRODUCING LAYER STRUCTURE, LAYER STRUCTURE, AND METHOD OF FORMING PATTERNS
    Publication number: 20160126088
    Abstract: A method of producing a layer structure includes forming a first organic layer by applying a first composition including an organic compound on a substrate having a plurality of patterns, applying a solvent on the first organic layer to remove a part of the first organic layer, and applying a second composition including an organic compound on a remaining part of the first organic layer and forming a second organic layer through a curing process.
    Type: Application
    Filed: June 16, 2015
    Publication date: May 5, 2016
    Inventors: Min-Soo KIM, Hyun-Ji SONG, Sun-Hae KANG, Sung-Min KIM, Sung-Hwan KIM, Young-Min KIM, Yun-Jun KIM, Hea-Jung KIM, Youn-Hee NAM, Jae-Yeol BAEK, Byeri YOON, Yong-Woon YOON, Chung-Heon LEE, Seulgi JEONG, Yeon-Hee JO, Seung-Hee HONG, Sun-Min HWANG, Won-Jong HWANG, Songse YI, MyeongKoo KIM, Naery YU
  • Monomer for hardmask composition and hardmask composition including the monomer and method of forming patterns using the hardmask composition
    Patent number: 9284245
    Abstract: A monomer for a hardmask composition represented by the following Chemical Formula 1,
    Type: Grant
    Filed: November 19, 2013
    Date of Patent: March 15, 2016
    Assignee: CHEIL INDUSTRIES, INC.
    Inventors: Sung-Jae Lee, Hwan-Sung Cheon, Youn-Jin Cho, Chul-Ho Lee, Chung-Heon Lee
  • HARDMASK COMPOSITION AND METHOD OF FORMING PATTERNS USING THE HARDMASK COMPOSITION
    Publication number: 20150332931
    Abstract: A hardmask composition includes a polymer including a moiety represented by the following Chemical Formula 1 and a solvent. *-A-B-* ??[Chemical Formula 1] In the Chemical Formula 1, A and B are the same as defined in the detailed description.
    Type: Application
    Filed: April 13, 2015
    Publication date: November 19, 2015
    Inventors: Youn-Hee NAM, Mi-Young KIM, You-Jung PARK, Yun-Jun KIM, Hea-Jung KIM, Joon-Young MOON, Hyun-Ji SONG, Chung-Heon LEE, Yoo-Jeong CHOI
  • HARDMASK COMPOSITION AND METHOD OF FORMING PATTERNS USING THE HARDMASK COMPOSITION
    Publication number: 20150329718
    Abstract: A hardmask composition and a method of forming patterns, the composition including a solvent; and a polymer including a moiety represented by the following Chemical Formula 1,
    Type: Application
    Filed: January 22, 2015
    Publication date: November 19, 2015
    Inventors: Yoo-Jeong CHOI, Yun-Jun KIM, Young-Min KIM, Joon-Young MOON, Yu-Shin PARK, Hyun-Ji SONG, Yong-Woon YOON, Chung-Heon LEE
  • MONOMER, HARDMASK COMPOSITION INCLUDING MONOMER, AND METHOD FOR FORMING PATTERN BY USING HARDMASK COMPOSITION
    Publication number: 20150274622
    Abstract: Disclosed are a monomer represented by the following Chemical Formula 1 for a hardmask composition, a hardmask composition including the monomer, and a method of forming patterns using the hardmask composition. In the above Chemical Formula 1, A1 to A3, X1 to X3, L1, L2, n and m are the same as described in the detailed description.
    Type: Application
    Filed: June 4, 2013
    Publication date: October 1, 2015
    Applicant: CHEIL INDUSTRIES INC.
    Inventors: Yun-Jun Kim, Hyo-Young Kwon, Hea-Jung Kim, Chung-Heon Lee, Youn-Jin Cho, Yoo-Jeong Choi
  • MONOMER FOR HARDMASK COMPOSITION, HARDMASK COMPOSITION INCLUDING THE MONOMER, AND METHOD OF FORMING PATTERNS USING THE HARDMASK COMPOSITION
    Publication number: 20150268558
    Abstract: A monomer for a hardmask composition, a hardmask composition, and a method of forming patterns, the monomer being represented by the following Chemical Formula 1:
    Type: Application
    Filed: January 30, 2015
    Publication date: September 24, 2015
    Inventors: Hea-Jung KIM, Sung-Hwan KIM, Youn-Hee NAM, Yun-Jun KIM, Joon-Young MOON, Hyun-Ji SONG, Yong-Woon YOON, Chung-Heon LEE
  • HARD MASK COMPOSITION AND METHOD FOR FORMING PATTERN USING SAME
    Publication number: 20150205198
    Abstract: Disclosed are a polymer represented by the Chemical Formula 1, a monomer represented by the Chemical Formula 2, and a solvent, wherein the monomer is included in the same or a higher amount than the polymer, and a method of forming patterns using the same.
    Type: Application
    Filed: September 2, 2013
    Publication date: July 23, 2015
    Applicant: Cheil Industries Inc.
    Inventors: Chul-Ho Lee, You-Jung Park, Yong-Woon Yoon, Sung-Jae Lee, Youn-Jin Cho, Young-Min Kim, Chung-Heon Lee