Abstract: An exemplary lens holding apparatus includes a pipe, a number of hollow lens holding units, and an air pump. The pipe has an airtight end and an air vent end. The lens holding units each are in communicate with the pipe and each include a number of first portions and a number of second portions. The first and second portions are alternately arranged and each have an inner space for communicating each other. The second portions each have a top wall and a bottom wall. The top wall has a first through hole defined therein and in communicate with the inner space of the second portion. The air pump is connected to the air vent end and configured for pumping air from the pipe, such that lenses received in the first through holes are releasably held in position.

Abstract: A film coating device includes a film coating holder, a film coating cover, and a filter plate. The film coating holder includes a number of through holes defined therein for receiving workpieces to be coated. The film coating cover covers the film coating holder from a top side of the film coating holder. The filter plate is mounted on a bottom of the film coating holder, and defines a number of filter holes for letting vaporized coating material through and blocking impurities.

Abstract: A physical vapor deposition device includes a deposition chamber, a workpiece carrier received in the deposition chamber, at least one cylindrical inner target, and a plurality of cylindrical outer targets. The workpiece carrier is rotatable about a rotation axis thereof. The workpiece carrier includes an inner carrier, and an outer carrier surrounding and being fixed relative to the inner carrier. The inner target is located at a central area of the inner carrier. The outer targets surround the outer carrier.

Abstract: A physical vapor deposition device includes a deposition chamber, a workpiece carrier received in the deposition chamber, a plurality of plate-shaped inner targets, and a plurality of plate-shaped outer targets. The workpiece carrier rotates about a rotation axis thereof. The workpiece carrier includes an inner carrier, and an outer carrier fixed relative to the inner carrier. The outer carrier surround the inner carrier. The inner targets are arranged between the inner carrier and the outer carrier. The outer targets surround the outer carrier.

Abstract: A workpiece carrier includes a first carrier and a second carrier. The first carrier includes a plurality of first posts substantially parallel to each other. Each of the first posts is rotatable about a central axis thereof. The second carrier includes a plurality of second posts substantially parallel to each other. Each of the second posts is rotatable about a central axis thereof. The first carrier surrounds the second carrier therein. The workpiece carrier further includes at least one connecting arm interconnected between the first carrier and the second carrier, such that the first carrier and the second carrier are jointly rotatable about a rotation axis.

Abstract: An exemplary sputtering apparatus includes a deposition chamber, a anode support, a cathode support, and a shield device all received in the deposition chamber. The anode support supports workpieces. The cathode support is positioned opposite to the anode support and supports a target. The shield includes a rotary disk, a first arm, a second arm, a first shield plate and a second shield plate. The first and second arms are securely mounted to the rotary disk along the radial direction of the rotary disk. A radial extending direction of the first arm from the rotary disk is opposite to that of the second arm. The first shield plate is securely mounted to the first arm, and the second shield plate securely mounted to the second arm. The rotary disk rotates the first and second shield plates to selectively expose or shield the target.

Abstract: A conveying device for a deposition device includes a transport device and a carrier. The transport device includes a main body, two wheels, a connection shaft, and a first bevel gear. The connection shaft is mounted on the main body. The two wheels are mounted on two opposite ends of the connection shaft. The first bevel gear is sleeved on the connection shaft. The carrier includes a revolving frame, a rotating shaft, a second bevel gear, and at least one carrying bar. The rotating shaft is mounted on the revolving frame. The second bevel gear is sleeved on one end of the rotating shaft and meshed with the first bevel gear. The revolving frame rotates relative to the rotating shaft. The at least one carrying bar is mounted on the revolving frame and driven by the rotating shaft to rotate. Each carrying bar includes supporting elements for carrying workpieces.

Abstract: A coating method for forming a pattern on a workpiece is provided. First, a workpiece surface is provided. Second, a mask having a shape conforming to a predetermined pattern is provided. Next, the workpiece surface includes a first portion exposed outside and a second portion shielded by the mask. A shielding layer is formed on the exposed first portion of the workpiece surface. The mask is removed from the workpiece to expose the second portion. A coating layer over the shielding layer and the exposed second portion is formed. The coating layer consists of a first part overlaying the shielding layer and a second part overlaying the second portion. The mask is attached onto the coating layer and aligned with the second portion of the workpiece surface. The first part of the coating layer, the shielding layer, and the mask are then removed.

Abstract: A coating method for forming a pattern on a workpiece includes: providing a workpiece constituting a surface; forming a coating layer over the surface using a physical vapor deposition method; providing a mask including a through hole having a shape conforming to a predetermined pattern; attaching the mask to the surface such that a portion of the coating layer is exposed through the through hole, the coating layer consisting of the exposed portion and an unwanted portion surrounding the exposed portion; forming a shielding layer on the exposed portion of the coating layer in the through hole; removing the mask; removing the unwanted portion of the coating layer; and removing the shielding layer to obtain the exposed portion having the predetermined pattern.

Abstract: A coating device includes a main body, a transport device, at least one loader, a driving device. The main body has a top plate, a bottom plate, and a pair of sidewalls connecting the top plate and bottom plate. The sidewalls respectively define an input gate and an output gate. The transport device includes a transport track passing through the input gate and the output gate, and at least one lifting arm mounted on the transport track. Each loader is configured for loading workpieces and includes a rotary shaft, at least one loading frame rotatably connected with the rotary shaft. The driving device is mounted on the top plate. Each lifting arm is configured for clamping a corresponding loader and transporting the corresponding loader to engage with the driving device. The driving device rotates the corresponding loader rotary shaftthrough the rotary shaft of the corresponding loader.

Abstract: A coating method for forming a pattern on a workpiece is provided. The method includes the follow steps: providing a workpiece having a surface, forming a coating layer over the surface using a physical vapor deposition method; providing a mask having a shape conforming to a predetermined pattern; attaching the mask to the surface such that a portion of the coating layer is shielded. The coating layer consists of a shielded portion and an unwanted portion surrounding the shielded portion. Finally, removing the unwanted portion of the coating layer using a magnetic abrasive finishing method, and removing the mask to obtain the shielded portion having the predetermined pattern on the workpiece.

Abstract: A coating method includes following steps. A workpiece having a flat surface is provided. The surface includes a coating region and a pattern region. A tape mask having a through hole, whose shape and size conforms to the pattern region, is attached onto the flat surface of workpiece to cover the coating region, thus exposing the pattern region. A screen printing stencil is placed on the tape mask. Ink is spread over the screen printing stencil printing stencil, and squeezed into the through hole over the pattern region. The ink is solidified. The tape mask is removed from the workpiece. A metallic coating is formed on the coating region of the flat surface and the solidified ink on the pattern region is removed.

Abstract: A method for forming a coating on a plate-shaped workpiece is disclosed. In the method, a plate-shaped workpiece and a masking fixture are provided. The workpiece includes a surface including a coating region and a pattern region. The masking fixture includes a resilient liquid masking applicator having a groove. An outline shape of the groove conforms to the pattern region. The groove is filled with liquid masking material. The workpiece is pressed onto the liquid masking applicator with the pattern region aligned with the groove. The liquid masking material is solidified thereby the solidified liquid masking material is attached to the pattern region of the workpiece. A coating is formed on the coating region. The solidified liquid masking material is removed from the workpiece.

Abstract: An exemplary film coating device includes a film coating holder and a film coating cover. The film coating holder includes a plurality of through holes defined therein for receiving workpieces to be coated. The film coating cover includes a first cover body and a second cover body. The first cover body includes a frame and a plurality of arms. A plurality of shelter pieces is set on the inner side of each arm. Each shelter piece is spatially arranged corresponding to one of the plurality of through holes. The second cover body is configured for covering the first cover body. The height of the second cover body is no less than that of the first cover body.

Abstract: An exemplary sputtering apparatus includes a chamber, a rotatable rack, a gate, two first magnetic elements, and a second magnetic element. A sidewall of the chamber has an opening defined therein. The rotatable rack is provided in a center of the chamber. The gate is provided in the opening. The two first magnetic elements are mounted on the gate. The second magnetic element is mounted inside the chamber. The second magnetic element neighbors one of the two first magnetic elements. A first angle is defined between two imaginary lines running from the rack to each of the two first magnetic elements. A second angle is defined between an imaginary line running from the rack to the second magnetic element and the imaginary line running from the rack to said one of the two first magnetic elements neighboring the second magnetic element. The first angle and the second angle are different.

Abstract: A roll grinding apparatus includes a clamping device, a grinding wheel, a first driver, and a second driver. The clamping device includes a base, a support connected with the base and being movable relative to the base, a first clamping member and a second clamping member coupled to the first clamping member. The first clamping member and the second clamping member are rotatably mounted on the support for cooperating to clamp the workpiece. The first clamping member and the second clamping member are movable relative to the grinding wheel by movement of the support relative to the base so that the rotary axes of the first and second clamping members are adjusted to be parallel to a central axis of the grinding wheel. The first driver is connected with the first clamping member. The second driver is connected with the second clamping member.

Abstract: A sputtering device includes a chamber having a number of targets mounted therein, a supporting frame, and a gas supplying frame. The chamber defines an engaging hole and a gas input hole therein. The supporting frame is capable of having a revolution in the chamber, the supporting frame includes a number of supporting poles for supporting workpieces, and the supporting poles is capable of having a rotation relative to the supporting frame. The gas supplying frame is received in the supporting frame, the gas supplying frame includes a gas input pipe engaging in and extending through the engaging hole of the chamber, and a number of gas guiding pipes are in communication with the gas input pipe and are substantially parallel with the supporting poles. Each of the gas guiding pipes has a number of gas output holes around the workpieces.

Abstract: A sputtering apparatus includes a preheating chamber, a deposition chamber, a passage in communication with the preheating chamber and the deposition chamber, a first support assembly received in the preheating chamber, a second support assembly received in the deposition chamber, a number of posts capable of mounting on each of the first and second support assemblies, a transferring robot arranged in the preheating chamber, and a magnetic assembly fixed on the transferring robot. The transferring robot is configured for demounting the post from the two support assemblies, transferring the demounted post between the preheating chamber and the deposition chamber, and mounting the transferred post on the two support assemblies. The magnetic assembly is configured for collecting iron workpieces dropped on a bottom in the preheating chamber, the deposition chamber, or the passage.

Abstract: A sputtering apparatus for coating workpieces includes a preheating case defining a preheating cavity, a deposition case defining a deposition cavity, a bridge assembly connecting the preheating case to the deposition case, two supporting assemblies, posts for fixing the workpieces, and a transmission assembly positioned in the preheating case. The bridge assembly includes a bridge member defining a passage and a valve moveably connected to the bridge member. The valve communicates the preheating cavity with the deposition cavity through the passage or separates the preheating cavity from the deposition cavity. One supporting assembly is received in the preheating cavity, and the other supporting assembly is received in the deposition cavity. The transmission assembly removes the posts from one of the supporting assemblies and fixes the posts to the other supporting assembly.

Abstract: A sputtering apparatus includes a housing having an enclosure and a plurality of gas-introduction holes defined in the sidewalls of the enclosure, a substrate holder for holding substrates, a plurality of targets surrounding the substrate holder, the targets and the substrate holder are accommodated in the housing, and a driving member for rotating the targets such that the targets can be selectively oriented to face the substrate holder or the gas-introduction holes.