Abstract: A pattern sorting method used in OPC verification, comprises the following steps: obtaining sizes of comparison areas of patterns and extracting pattern boundaries; processing pattern boundaries; cutting off all the pattern edges outside comparison areas; setting grid sizes for filtering; setting directions for pattern boundaries; pattern division processing: dividing each pattern into 4 blocks of an equal size; recalculating the apexes of pattern boundaries in each block; implementing coordinate transformation for each block; calculating block characteristic values for each block; implementing rotating, upward and downward mirroring or leftward and rightward mirroring adjustment for blocks in accordance with corresponding block characteristic values; calculating overall characteristic values of patterns in accordance with various block characteristic values.

Abstract: A pattern sorting method used in OPC verification, comprises the following steps: obtaining sizes of comparison areas of patterns and extracting pattern boundaries; processing pattern boundaries; cutting off all the pattern edges outside comparison areas; setting grid sizes for filtering; setting directions for pattern boundaries; pattern division processing: dividing each pattern into 4 blocks of an equal size; recalculating the apexes of pattern boundaries in each block; implementing coordinate transformation for each block; calculating block characteristic values for each block; implementing rotating, upward and downward mirroring or leftward and rightward mirroring adjustment for blocks in accordance with corresponding block characteristic values; calculating overall characteristic values of patterns in accordance with various block characteristic values.

Abstract: A method of identifying repeating design cells in a layout is disclosed. The method includes: providing a layout including a plurality of first leaf cells and a plurality of second leaf cells; identifying a plurality of groups each consisting of overlapping first and second leaf cells; for each of the groups, selecting a first or second leaf cell as an observational cell and establishing a coordinate system originated at a single reference position of the observational cell, thereby obtaining a plurality of coordinates of the overlapping first and second cells; for each of the groups, sorting the coordinates and generating a hash; and identifying ones of the groups having identical hashes as repeating design cells.

Abstract: A sampling method and apparatus applied to optical proximity correction of a lithography layout are provided in the present disclosure. The sampling method includes: performing wavelet decomposition to a pattern in the layout to be corrected, to acquire wavelet matrixes of different orders; and performing wavelet reconstruction according to the wavelet matrixes of the different orders for discrete sampling, wherein results of the discrete sampling are applied to simulation in the OPC. The sampling method and apparatus can improve the accuracy and efficiency of sampling of the layout to be corrected in a conventional technology.

Abstract: A sampling method and apparatus applied to optical proximity correction of a lithography layout are provided in the present disclosure. The sampling method includes: performing wavelet decomposition to a pattern in the layout to be corrected, to acquire wavelet matrixes of different orders; and performing wavelet reconstruction according to the wavelet matrixes of the different orders for discrete sampling, wherein results of the discrete sampling are applied to simulation in the OPC. The sampling method and apparatus can improve the accuracy and efficiency of sampling of the layout to be corrected in a conventional technology.

Abstract: A method of identifying repeating design cells in a layout is disclosed. The method includes: providing a layout including a plurality of first leaf cells and a plurality of second leaf cells; identifying a plurality of groups each consisting of overlapping first and second leaf cells; for each of the groups, selecting a first or second leaf cell as an observational cell and establishing a coordinate system originated at a single reference position of the observational cell, thereby obtaining a plurality of coordinates of the overlapping first and second cells; for each of the groups, sorting the coordinates and generating a hash; and identifying ones of the groups having identical hashes as repeating design cells.