Abstract: A network design tool enables users to easily and quickly graphically design a model of a wireless communication network in a process control environment. Specifically, the network design tool may provide an interactive user interface including a canvas that enables users to design network models by way of the users placing and arranging within the canvas symbols representing model devices and links. The tool may dynamically indicate the strengths of communication links at potential locations as the user moves a pointer or cursor around the canvas, and may automatically suggest devices to be added to desired locations. After a desired device has been selected, the tool may automatically connect the selected device to other devices in the model based on an analysis of the plant environment, real-world positions of the existing devices and the new device, and signaling attributes of the existing devices and the new device.

Abstract: A network design tool enables users to easily and quickly graphically design a model of a wireless communication network in a process control environment. Specifically, the network design tool may provide an interactive user interface including a canvas that enables users to design network models by way of the users placing and arranging within the canvas symbols representing model devices and links. The tool may dynamically indicate the strengths of communication links at potential locations as the user moves a pointer or cursor around the canvas, and may automatically suggest devices to be added to desired locations. After a desired device has been selected, the tool may automatically connect the selected device to other devices in the model based on an analysis of the plant environment, real-world positions of the existing devices and the new device, and signaling attributes of the existing devices and the new device.

Abstract: A bi-layer anti-reflective coating for use in photolithographic applications, and specifically, for use in ultraviolet photolithographic processes. The bi-layered anti-reflective coating is used to minimize pattern distortion due to reflections from neighboring features in the construction of microcircuits. The bi-layer anti-reflection coating features a first layer, an absorption layer, disposed on a second layer, a dielectric layer, which is then disposed between a substrate and a photoresist layer. The dielectric/absorption layer comprises one combination selected from Ta/Al2O3, Ta/SiO2, Ta/TiO2, Ta/Ta2O5, Ta/Cr2O3, Ta/Si3N4, Ti/Al2O3, Ti/SiO2, Ti/TiO2, Ti/Ta2O5, Ti/Cr2O3, Ti/Si3N4, Cr/Al2O3, Cr/SiO2, Cr/TiO2, Cr/Ta2O5, Cr/Cr2O3, Cr/Si3N4, Al/Al2O3, Al/TiO2, Al/Ta2O5, Al/Cr2O3, Al/Si3N4, Ni/Al2O3, Ni/SiO2, Ni/TiO2, Ni/Ta2O5, Ni/Cr2O3, Ni/Si3N4, Ir/Al2O3, Ir/SiO2, Ir/TiO2, Ir/Ta2O5, Ir/Cr2O3, and Ir/Si3N4. At least the absorption and dielectric layers can be formed using vacuum deposition.