Abstract: The present disclosure relates to methods, systems, and apparatus for monitoring temperature at multiple sites within a substrate processing chamber. A system for processing substrates includes: a process chamber comprising a processing volume, a first window at a first perimeter of the processing volume, a substrate support within the processing volume; and a first multi-wavelength pyrometer configured to measure: a first temperature at a first site proximal the first window, and a second temperature at a second site proximal the substrate support.

Abstract: A method and apparatus for calibrating a temperature within a processing chamber are described. The method includes determining an etch rate of a layer within the processing chamber. The processing chamber is a deposition chamber configured for use during semiconductor manufacturing. The etch rate is utilized to determine a temperature within the processing chamber. The temperature within the processing chamber is then subsequently compared to a calibrated temperature to determine a temperature offset. The etch rate is determined using any one of a pyrometer, a reflectometer, a camera, or a mass sensor.

Abstract: A device for completing a social network using an artificial neural network includes: a neural network unit configured to receive a target network having unrevealed missing nodes as input, infer the connections of the missing nodes with a neural network, and output multiple candidate complete networks according to various node sequences; and a selection unit configured to select one of the candidate complete networks outputted by the neural network unit, where the neural network unit outputs the candidate complete networks by using weights of a graph-generating neural network that has learned graph structures of reference networks having attributes similar to those of the target network, and the selection unit uses connection probability vectors obtained from the learned graph-generating neural network to select the candidate complete network probabilistically having a structure closest to that of the target network based on the connection probability vectors.

Abstract: Thin-film devices, for example electrochromic devices for windows, and methods of manufacturing are described. Particular focus is given to methods of patterning optical devices. Various edge deletion and isolation scribes are performed, for example, to ensure the optical device has appropriate isolation from any edge defects. Methods described herein apply to any thin-film device having one or more material layers sandwiched between two thin film electrical conductor layers. The described methods create novel optical device configurations.

Abstract: Thin-film devices, for example electrochromic devices for windows, and methods of manufacturing are described. Particular focus is given to methods of patterning optical devices. Various edge deletion and isolation scribes are performed, for example, to ensure the optical device has appropriate isolation from any edge defects. Methods described herein apply to any thin-film device having one or more material layers sandwiched between two thin film electrical conductor layers. The described methods create novel optical device configurations.

Abstract: A method and device for completing a social network using an artificial neural network are disclosed. The disclosed device includes: a neural network unit configured to receive a target network having unrevealed missing nodes as input, infer the connections of the missing nodes with a neural network, and output multiple candidate complete networks according to various node sequences; and a selection unit configured to select one of the candidate complete networks outputted by the neural network unit, where the neural network unit outputs the candidate complete networks by using weights of a graph-generating neural network that has learned graph structures of reference networks having attributes similar to those of the target network, and the selection unit uses connection probability vectors obtained from the learned graph-generating neural network to select the candidate complete network probabilistically having a structure closest to that of the target network based on the connection probability vectors.

Abstract: Thin-film devices, for example electrochromic devices for windows, and methods of manufacturing are described. Particular focus is given to methods of patterning optical devices. Various edge deletion and isolation scribes are performed, for example, to ensure the optical device has appropriate isolation from any edge defects. Methods described herein apply to any thin-film device having one or more material layers sandwiched between two thin film electrical conductor layers. The described methods create novel optical device configurations.

Abstract: A time-varying current from a DC voltage-source, flows through a primary winding of a magnetic circuit containing permanent magnets, induces more inductive voltages across different windings. The windings are wrapped around the main, sub-magnetic paths of different forms and constructions of the Tran-generators. The invention when combined with any one of recovering the utilized electric charge, using the (hybrid) soft magnetic wires, applying the Voltage-Doubler circuits, and using the transfer of high-potential electric charge to generate more electric energy, make the tran-generators useful.

Abstract: Thin-film devices, for example electrochromic devices for windows, and methods of manufacturing are described. Particular focus is given to methods of patterning optical devices. Various edge deletion and isolation scribes are performed, for example, to ensure the optical device has appropriate isolation from any edge defects. Methods described herein apply to any thin-film device having one or more material layers sandwiched between two thin film electrical conductor layers. The described methods create novel optical device configurations.

Abstract: A time-varying current from a DC voltage-source, flows through a primary winding of a magnetic circuit containing permanent magnets, induces more inductive voltages across different windings. The windings are wrapped around the main, sub-magnetic paths of different forms and constructions of the Tran-generators. The invention when combined with any one of recovering the utilized electric charge, using the (hybrid) soft magnetic wires, applying the Voltage-Doubler circuits, and using the transfer of high-potential electric charge to generate more electric energy, make the tran-generators useful.

Abstract: The present application discloses methods, systems and devices for using charged particle beam tools to inspect and perform lithography on a substrate using a combination of vectoring to move a beam to features to be imaged, and raster scanning to obtain an image of the feature(s). The inventors have discovered that it is highly advantageous to use an extra step, a fast raster scan to image the substrate at a lower resolution, to determine which features receive priority for inspection; this extra step can reduce total inspection time, enhance inspection results, and improve beam alignment and manufacturing yield. Using multiple beam-producing columns, with multiple control computers local to the columns, provides various synergies. Preferably, miniature, non-magnetic, electrostatically-driven columns are used.

Abstract: Thin-film devices, for example electrochromic devices for windows, and methods of manufacturing are described. Particular focus is given to methods of patterning optical devices. Various edge deletion and isolation scribes are performed, for example, to ensure the optical device has appropriate isolation from any edge defects. Methods described herein apply to any thin-film device having one or more material layers sandwiched between two thin film electrical conductor layers. The described methods create novel optical device configurations.

Abstract: The present application discloses methods, systems and devices for using charged particle beam tools to inspect and perform lithography on a substrate using a combination of vectoring to move a beam to features to be imaged, and raster scanning to obtain an image of the feature(s). The inventors have discovered that it is highly advantageous to use an extra step, a fast raster scan to image the substrate at a lower resolution, to determine which features receive priority for inspection; this extra step can reduce total inspection time, enhance inspection results, and improve beam alignment and manufacturing yield. Using multiple beam-producing columns, with multiple control computers local to the columns, provides various synergies. Preferably, miniature, non-magnetic, electrostatically-driven columns are used.

Abstract: The present application discloses methods, systems and devices for using charged particle beam tools to pattern and inspect a substrate. The inventors have discovered that it is highly advantageous to use write and inspection tools that share the same or substantially the same stage and the same or substantially the same designs for respective arrays of multiple charged particle beam columns, and that access the same design layout database to target and pattern or inspect features. By using design-matched charged particle beam tools, correlation of defectivity is preserved between inspection imaging and the design layout database. As a result, image-based defect identification and maskless design correction, of random and systematic errors, can be performed directly in the design layout database, enabling a fast yield ramp.

Abstract: The present application discloses methods, systems and devices for using charged particle beam tools to pattern and inspect a substrate. The inventors have discovered that it is highly advantageous to use write and inspection tools that share the same or substantially the same stage and the same or substantially the same designs for respective arrays of multiple charged particle beam columns, and that access the same design layout database to target and pattern or inspect features. By using design-matched charged particle beam tools, correlation of defectivity is preserved between inspection imaging and the design layout database. As a result, image-based defect identification and maskless design correction, of random and systematic errors, can be performed directly in the design layout database, enabling a fast yield ramp.

Abstract: The present application discloses methods, systems and devices for using charged particle beam tools to pattern and inspect a substrate. The inventors have discovered that it is highly advantageous to use write and inspection tools that share the same or substantially the same stage and the same or substantially the same designs for respective arrays of multiple charged particle beam columns, and that access the same design layout database to target and pattern or inspect features. By using design-matched charged particle beam tools, correlation of defectivity is preserved between inspection imaging and the design layout database. As a result, image-based defect identification and maskless design correction, of random and systematic errors, can be performed directly in the design layout database, enabling a fast yield ramp.

Abstract: The present application discloses methods, systems and devices for using charged particle beam tools to pattern and inspect a substrate. The inventors have discovered that it is highly advantageous to use write and inspection tools that share the same or substantially the same stage and the same or substantially the same designs for respective arrays of multiple charged particle beam columns, and that access the same design layout database to target and pattern or inspect features. By using design-matched charged particle beam tools, correlation of defectivity is preserved between inspection imaging and the design layout database. As a result, image-based defect identification and maskless design correction, of random and systematic errors, can be performed directly in the design layout database, enabling a fast yield ramp.

Abstract: A dye donor, such as a transfer ribbon, comprises a supporting substrate and a relatively thick dye layer consisting of a dye dispersed within a dye binder. A heater, such as a modulated scanning laser beam, heats selected pixel regions of the ribbon and causes dye to diffuse from the heated regions to a receiver sheet and print a number of pixels thereon which build up to form an image. In order to allow the donor to be reused, it is passed between a pair of heated rollers to cause dye in the dye layer to diffuse to an even density whereby the regions depleted of dye during the print process are replenished. Instead of the replenishment dye coming from the body of the donor, it may be supplied by a separate source.