Patents by Inventor Cornelis Henricus Van De Vin

Cornelis Henricus Van De Vin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20110109889
    Abstract: A method is provided for positioning at least one target portion of a substrate with respect to a focal plane of a projection system. The method comprises performing height measurements of at least part of the substrate to generate height data, using predetermined correction heights to compute corrected height data for the height data. The method further comprises positioning the target portion of the substrate with respect to the focal plane of the projection system at least partially based on the corrected height data.
    Type: Application
    Filed: October 5, 2010
    Publication date: May 12, 2011
    Applicant: ASML Netherlands B.V.
    Inventors: CORNELIS HENRICUS VAN DE VIN, RALPH BRINKHOF, ARTHUR WINFRIED EDUARDUS MINNAERT, ALEX VAN ZON
  • Patent number: 7889357
    Abstract: A method is provided for positioning at least one target portion of a substrate with respect to a focal plane of a projection system. The method comprises performing height measurements of at least part of the substrate to generate height data, using predetermined correction heights to compute corrected height data for the height data. The method further comprises positioning the target portion of the substrate with respect to the focal plane of the projection system at least partially based on the corrected height data.
    Type: Grant
    Filed: June 7, 2010
    Date of Patent: February 15, 2011
    Assignee: ASML Netherlands B.V.
    Inventors: Cornelis Henricus Van De Vin, Ralph Brinkhof, Arthur Winfried Eduardus Minnaert, Alex Van Zon
  • Publication number: 20100245798
    Abstract: A method is provided for positioning at least one target portion of a substrate with respect to a focal plane of a projection system. The method comprises performing height measurements of at least part of the substrate to generate height data, using predetermined correction heights to compute corrected height data for the height data. The method further comprises positioning the target portion of the substrate with respect to the focal plane of the projection system at least partially based on the corrected height data.
    Type: Application
    Filed: June 7, 2010
    Publication date: September 30, 2010
    Applicant: ASML Netherlands B.V.
    Inventors: Cornelis Henricus VAN DE VIN, Ralph Brinkhof, Arthur Winfried, Eduardus Minnaert, Alex Van Zon
  • Patent number: 7746484
    Abstract: A method is provided for positioning at least one target portion of a substrate with respect to a focal plane of a projection system. The method comprises performing height measurements of at least part of the substrate to generate height data, using predetermined correction heights to compute corrected height data for the height data. The method further comprises positioning the target portion of the substrate with respect to the focal plane of the projection system at least partially based on the corrected height data.
    Type: Grant
    Filed: May 23, 2007
    Date of Patent: June 29, 2010
    Assignee: ASML Netherlands B.V.
    Inventors: Cornelis Henricus Van De Vin, Ralph Brinkhof, Arthur Winfried Eduardus Minnaert, Alex Van Zon
  • Publication number: 20080151204
    Abstract: A method is provided for positioning a target portion of a substrate with respect to a focal plane of a projection system. The substrate may include one or more target portions. The method includes performing height measurements of at least part of the substrate to generate height data. The at least part of the substrate is at least partially outside the target portion that is to be positioned with respect to the projection system. The method further includes using predetermined correction heights to compute corrected height data for the height data corresponding to the at least part of the substrate outside the target portion, and positioning the target portion of the substrate with respect to the focal plane of the projection system at least partially based on the corrected height data.
    Type: Application
    Filed: December 21, 2006
    Publication date: June 26, 2008
    Applicant: ASML Netherlands B.V.
    Inventors: Cornelis Henricus Van De Vin, Ralph Brinkhof, Arthur Winfried Eduardus Minnaert, Alex Van Zon
  • Publication number: 20080151265
    Abstract: A method is provided for positioning at least one target portion of a substrate with respect to a focal plane of a projection system. The method comprises performing height measurements of at least part of the substrate to generate height data, using predetermined correction heights to compute corrected height data for the height data. The method further comprises positioning the target portion of the substrate with respect to the focal plane of the projection system at least partially based on the corrected height data.
    Type: Application
    Filed: May 23, 2007
    Publication date: June 26, 2008
    Applicant: ASML Netherlands B.V.
    Inventors: Cornelis Henricus Van De Vin, Ralph Brinkhof, Arthur Winfried Eduardus Minnaert, ALex Van Zon