Patents by Inventor Craig J. Lowrie

Craig J. Lowrie has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5130552
    Abstract: An ion implantation system is modified to allow variation in the size of the aperture of the mass resolving system, thereby allowing more ions of one mass or ion of more than one mass, such as isotopes, to pass through said opening. Including all isotopes of the desired dopant ions to be collected increases beam current, and consequently the throughput of the implantation process, reduces contamination, and improves the dosage control.
    Type: Grant
    Filed: December 17, 1990
    Date of Patent: July 14, 1992
    Assignee: Applied Materials, Inc.
    Inventors: Nicholas Bright, David R. Burgin, Timothy G. Morgan, Craig J. Lowrie, Hiroyuki Ito