Abstract: A distance measurement system includes two or more line pattern generators (LPGs), a camera, and a processor. Each LPG emits a line pattern having a first set of dark portions separated by a respective first set of bright portions. A first line pattern has a first angular distance between adjacent bright portions, and a second line pattern has a second angular distance between adjacent bright portions. The camera captures at least one image of the first line pattern and the second line pattern. The camera is a first distance from the first LPG and a second distance from the second LPG. The processor identifies a target object illuminated by the first and second line patterns and determines a distance to the target object based on the appearance of the target object as illuminated by the first and second line patterns.

Abstract: A distance measurement system includes two or more line pattern generators (LPGs), a camera, and a processor. Each LPG emits a line pattern having a first set of dark portions separated by a respective first set of bright portions. A first line pattern has a first angular distance between adjacent bright portions, and a second line pattern has a second angular distance between adjacent bright portions. The camera captures at least one image of the first line pattern and the second line pattern. The camera is a first distance from the first LPG and a second distance from the second LPG. The processor identifies a target object illuminated by the first and second line patterns and determines a distance to the target object based on the appearance of the target object as illuminated by the first and second line patterns.

Abstract: A distance measurement system includes two or more line pattern generators (LPGs), a camera, and a processor. Each LPG emits a line pattern having a first set of dark portions separated by a respective first set of bright portions. A first line pattern has a first angular distance between adjacent bright portions, and a second line pattern has a second angular distance between adjacent bright portions. The camera captures at least one image of the first line pattern and the second line pattern. The camera is a first distance from the first LPG and a second distance from the second LPG. The processor identifies a target object illuminated by the first and second line patterns and determines a distance to the target object based on the appearance of the target object as illuminated by the first and second line patterns.

Abstract: A wavelength converting structure is disclosed, the wavelength converting structure including a spinel type SWIR phosphor material having emission wavelengths in the range of 1000 to 1700 nm, the SWIR phosphor material including AE1-x-zAz+0.5(x-y)D2+0.5(x-y)-z-u EzO4:Niy,Cru where AE=Mg, Zn, Co, or Be, or mixtures thereof, A=Li, Na, Cu, or Ag, or mixtures thereof, D=Ga, Al, B, In, or Sc, or mixtures thereof, and E=Si, Ge, Sn, Ti, Zr, or Hf, or mixtures thereof; where 0?x?1, 0<y?0.1, 0?z?1, 0?u?0.2.

Abstract: A distance measurement system includes two or more line pattern generators (LPGs), a camera, and a processor. Each LPG emits a line pattern having a first set of dark portions separated by a respective first set of bright portions. A first line pattern has a first angular distance between adjacent bright portions, and a second line pattern has a second angular distance between adjacent bright portions. The camera captures at least one image of the first line pattern and the second line pattern. The camera is a first distance from the first LPG and a second distance from the second LPG. The processor identifies a target object illuminated by the first and second line patterns and determines a distance to the target object based on the appearance of the target object as illuminated by the first and second line patterns.

Abstract: Disclosed is a lithographic apparatus comprising a member susceptible to deformation and a deformation sensor for measuring a deformation of said member. The deformation sensor comprises a first birefringence sensing element arranged to be subjected to stress in dependency of the deformation of said member and a light system configured to transmit polarized light through the first birefringence sensing element, wherein said polarized light has a first polarization state prior to being transmitted through the first birefringence sensing element. The deformation sensor further comprises a detector for detecting a second polarization state of the polarized light after being transmitted through the first birefringence sensing element and a calculation unit to determine the deformation of said member based on the first and second polarization state.