Patents by Inventor Curtis Hall

Curtis Hall has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9270487
    Abstract: A full bisection bandwidth network, having a plurality of nodes and a plurality of paths among the nodes, is divided into a plurality of Virtual Local Area Networks (“VLANs”) by assigning paths to the VLANs such that each VLAN satisfies a spanning tree protocol and all paths are active in at least one VLAN.
    Type: Grant
    Filed: October 13, 2009
    Date of Patent: February 23, 2016
    Assignee: Teradata US, Inc.
    Inventors: Chinh Kim Nguyen, Curtis Hall Stehley
  • Patent number: 7250358
    Abstract: The present invention is directed to a wafer device method for processing same. A wafer for epitaxial deposition is backside sealed with a dopant seal layer (protection layer comprised of silicon dioxide or silicon nitride. Then, a layer of polysilicon is formed coextensively over the dopant seal layer. The polysilicon layer acts as a seed layer for potentially nodule forming gasses present during epitaxial deposition. During CVD epitaxy, the epitaxial layer is deposited on the primary surface with optimal resistivity uniformity. The fugitive gasses from the epitaxial process which diffuse to the wafer periphery and backside deposit as a film on the seed layer instead of in nodules. The polysilicon layer acts as a continuous seed layer which eliminates the preferential deposition at seal layer pinholes or island seed sites.
    Type: Grant
    Filed: August 6, 2004
    Date of Patent: July 31, 2007
    Assignee: GlobiTech Incorporated
    Inventor: Curtis Hall
  • Publication number: 20060029817
    Abstract: The present invention is directed to a wafer device method for processing same. A wafer for epitaxial deposition is backside sealed with a dopant seal layer (protection layer comprised of silicon dioxide or silicon nitride. Then, a layer of polysilicon is formed coextensively over the dopant seal layer. The polysilicon layer acts as a seed layer for potentially nodule forming gasses present during epitaxial deposition. During CVD epitaxy, the epitaxial layer is deposited on the primary surface with optimal resistivity uniformity. The fugitive gasses from the epitaxial process which diffuse to the wafer periphery and backside deposit as a film on the seed layer instead of in nodules. The polysilicon layer acts as a continuous seed layer which eliminates the preferential deposition at seal layer pinholes or island seed sites.
    Type: Application
    Filed: August 6, 2004
    Publication date: February 9, 2006
    Applicant: GlobiTech Incorporated
    Inventor: Curtis Hall
  • Patent number: 6921943
    Abstract: The present invention is directed to a built-in solution for soft error protection by forming an epitaxial layer with a graded dopant concentration. By grading a dopant concentration, starting from a first dopant concentration and ending with a second dopant concentration at the device layer, usually determined by the characteristics of the device to be built in the device layer, a constant electric field (?-field) results from the changing dopant concentration. The creation of this ?-field influences the stray, unwanted charges (or transient charges) away from critical device components. Charges that are created in the epitaxial layer are sweep downward, toward, and sometimes into, the substrate where they are absorbed, thus unable to cause a soft error in the device.
    Type: Grant
    Filed: September 17, 2003
    Date of Patent: July 26, 2005
    Assignee: GlobiTech Incorporated
    Inventors: Danny Kenney, Keith Lindberg, Curtis Hall, G. R. Mohan Rao
  • Publication number: 20040063288
    Abstract: The present invention is directed to a built-in solution for soft error protection by forming an epitaxial layer with a graded dopant concentration. By grading a dopant concentration, starting from a first dopant concentration and ending with a second dopant concentration at the device layer, usually determined by the characteristics of the device to be built in the device layer, a constant electric field (&egr;-field) results from the changing dopant concentration. The creation of this &egr;-field influences the stray, unwanted charges (or transient charges) away from critical device components. Charges that are created in the epitaxial layer are sweep downward, toward, and sometimes into, the substrate where they are absorbed, thus unable to cause a soft error in the device.
    Type: Application
    Filed: September 17, 2003
    Publication date: April 1, 2004
    Inventors: Danny Kenney, Keith Lindberg, Curtis Hall, G. R. Mohan Rao
  • Patent number: 5959994
    Abstract: An enhanced ATM switch with CPU node interconnect functionality and peripheral interconnect functionality and network functionality. The ATM switch provides low latency transfer between computer nodes and performs input/output operations with peripherals through the ATM network. SCSI Fibre Channel protocol (FCP) commands are implemented according to ATM standards to provide communication with peripherals. A segmentation and reassembly (SAR) unit is provided for performing ATM segmentation and reassembly. The SAR includes functional units which allow direct connection of an application agent to the core of the switch once the cell characteristics are determined by the application agent and provides ATM cell translation to and from available kernel buffers. The transmission media in the ATM network comprises digital optical links. The enhanced ATM switch may also include a synchronous optical network (SONET) interface for providing SONET transmission over the digital optical links in the ATM network.
    Type: Grant
    Filed: August 19, 1996
    Date of Patent: September 28, 1999
    Assignee: NCR Corporation
    Inventors: Gary Lee Boggs, Robert Samuel Cooper, Gene Robert Erickson, Douglas Edward Hundley, Gregory H. Milby, P. Keith Muller, Curtis Hall Stehley, Donald G. Tipon
  • Patent number: D569310
    Type: Grant
    Filed: March 9, 2007
    Date of Patent: May 20, 2008
    Inventors: Alan Ainsworth, Bruce Renfrew, Balraj Ghataore, Barry Curtis Hall
  • Patent number: D569311
    Type: Grant
    Filed: March 9, 2007
    Date of Patent: May 20, 2008
    Inventors: Alan Ainsworth, Bruce Renfrew, Balraj Ghataore, Barry Curtis Hall
  • Patent number: D598814
    Type: Grant
    Filed: October 8, 2007
    Date of Patent: August 25, 2009
    Assignee: Barry Hall Sport & Leisure Direct.com Ltd.
    Inventors: Alan Ainsworth, Bruce Renfrew, Balraj Ghataore, Barry Curtis Hall