Patents by Inventor Cvetanka Jordanoska

Cvetanka Jordanoska has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method
    Patent number: 8553227
    Abstract: An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent. The radiation that is reflected off the substrate is radially polarized.
    Type: Grant
    Filed: June 17, 2009
    Date of Patent: October 8, 2013
    Assignee: ASML Netherlands B.V.
    Inventor: Cvetanka Jordanoska
  • Inspection Method and Apparatus, Lithographic Apparatus, Lithographic Processing Cell and Device Manufacturing Method
    Publication number: 20100007863
    Abstract: An apparatus and method to determine a property of a substrate by measuring, in the pupil plane of a high numerical aperture lens, an angle-resolved spectrum as a result of radiation being reflected off the substrate. The property may be angle and wavelength dependent. The radiation that is reflected off the substrate is radially polarized.
    Type: Application
    Filed: June 17, 2009
    Publication date: January 14, 2010
    Applicant: ASML Netherlands B.V.
    Inventor: Cvetanka Jordanoska